Electron beam furance with material-evaporant equilibrium control
阅读：701发布：2023-02-07
专利汇可以提供Electron beam furance with material-evaporant equilibrium control专利检索，专利查询，专利分析的服务。并且A vacuum coating device having an evaporation chamber and a rod fed electron beam gun, wherein the end (target) of a consumable rod is melted and vaporized by the electron beam; the meniscus of the melt being kept by automatic control at a constant height and in equilibrium with the evaporation rate of the rod material; the control comprising an electric servo motor for advancing the rod at a controlled rate into the evaporation chamber, a photocell subject to radiation from the rod melt, a fixed mask with a graduated aperture for varying the sensed radiation according to varying height of the meniscus, and a control amplifier responsive to the photocell for supplying a rate control voltage to the servo motor.，下面是Electron beam furance with material-evaporant equilibrium control专利的具体信息内容。
1. In an electron beam evaporation system having an evaporation chamber, an electron beam gun and a consumable target composed of material to be evaporated from a melt within the chamber, the method of maintaining an established equilibrium evaporation rate of the mateRial which comprises: a. sensing the intensity of light radiation from the material at the meniscus level of the melt; b. varying the intensity of the sensed radiation in accordance with changes in the meniscus level thereof; and c. supplying the material to the melt at a rate according to the intensity of the sensed radiation for maintaining the meniscus level at the constant equilibrium level.
2. The method as specified in claim 1 wherein the melt at the meniscus is a source of light radiation, and the radiated light for sensing is masked and restricted to a path of graduated cross-sectional area which varies in size with variations in the meniscus level.
3. In an electron beam evaporation system having an evaporation chamber, an electron beam gun for generating an electron beam, a consumable target for the beam composed of material to be melted to form a melt and then evaporated within the chamber, and drive means for replenishing the vaporized target material so as to maintain a constant equilibrium evaporation rate, the improvement comprising a. sensing means responsive to radiation from the target melt and for producing signal corresponding to the magnitude of such radiation, b. means for varying the intensity of radiation received at the sensing means according to the height of the melt meniscus, c. drive control means connected to the said signal and responsive thereto to control the rate of replenishing of the vaporized material at a rate for maintaining the meniscus at the constant level.
4. An electron beam evaporation system as specified in claim 3 wherein the material is in the form of a rod and the advancing end of the rod constitutes the target for the electron beam.
5. An electron beam evaporation system as specified in claim 3 wherein the sensing means includes photosensitive means for producing a control signal for the drive means.
6. An electron beam evaporation system as specified in claim 5 wherein the drive means comprises an electric servo mechanism that is responsive to the control signal for advancing the rod toward the electron beam.
7. An electron beam evaporation system as specified in claim 3 wherein the means for varying the intensity of radiation comprises a fixed mask having an aperture of graduated cross-sectional area interposed between the melt meniscus and the sensing means, whereby the intensity of sensed radiation varies according to the meniscus height.
8. An electron beam evaporation system as specified in claim 7 wherein the mask aperture consists of a V-shaped notch, the notch at its median width being in general horizontal alignment with the melt meniscus at the constant reference height.
9. An electron beam evaporation system as specified in claim 3 including an expendable transparent evaporant shield disposed within the chamber in the path of the variable intensity radiation to the sensing means, and shield moving means connected thereto for continuously moving the evaporant exposed area thereof from the radiation path.
10. An electron beam evaporation system as specified in claim 5 further including an optical system between said melt and said sensing means having means for restricting radiation and focusing the restricted radiation on the photosensitive means.
11. An electron beam evaporation system as specified in claim 4 wherein the evaporation chamber includes a crucible having a vertical bore, and the rod is advanced by the drive means through the bore and into the crucible.
12. An electron beam evaporation system as specified in claim 11 wherein the level of the melt meniscus extends beyond the upper surface of the crucible for passing radiation horizontally to the sensing means.
13. An electron beam evaporation system having an evaporation chamber containing an electron beam gun, a crucible for vertically guiding into the electron beam a rod composed of material to be evaporated, the leading end of the rod being the beam target, and means for replenishing the rod material at a rate corresponding to the rate of evaporation of the material comprising: a. a photosensitive device responsive to radiation from the rod melt at the top of the crucible, and adapted to generate a signal proportional to the level of said melt, b. a fixed mask located opposite the rod melt and having an aperture that is variable in width for passing radiation of varying intensity according to the height of the melt meniscus, c. a transparent shielding film disposed for continuous movement between the melt and photosensitive device for precluding progressive accumulation of evaporant in the path of sensed radiation, d. means for focusing the variable intensity radiation on the photosensitive device, e. a control amplifier responsive to said signal for producing a control voltage of proportionate magnitude and f. a servo mechanism having a linear voltage-speed characteristic responsive to the control voltage for advancing the rod into the crucible at a rate maintaining the melt meniscus at the constant level for a constant rate of evaporation.
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