| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 81 | 平版印刷的印刷板的制备方法 | CN01125460.2 | 2001-07-07 | CN1334492A | 2002-02-06 | 堀田久; 坂本敦 |
| 本发明涉及一种制备平版印刷的印刷板的方法,其包括在阳极氧化后用一种水溶液处理的铝基片上涂覆光敏层或热敏层而形成PS版,用不含有硅酸盐的显影剂使该PS版显影,其中所述的水溶液包括至少一种化合物选自含有亚硝酸盐基团的化合物、含有氟原子的化合物和含有磷原子的化合物,条件是当该至少一种化合物是含氟原子的化合物时,所述处理的铝基片具有满足下式的表面:0.30≤A/(A+B)≤0.90,其中A表示经X射线电子能谱进行化学分析(ESCA)测定的氟原子的峰面积(1S)(计算eV/sec);B表示由X射线ESCA测定的铝原子的峰面积(2P)(计算eV/sec);当该至少一种化合物是含磷原子的化合物时,所述处理的铝基片具有满足下式的表面:0.05≤A/(A+B)≤0.70,其中A表示经X射线ESCA测定的磷原子的峰面积(1P)(计算eV/sec);B表示由X射线ESCA测定的铝原子的峰面积(2P)(计算eV/sec)。 | ||||||
| 82 | X-ray photoelectron spectroscopic analytic method | JP2007258354 | 2007-10-02 | JP2009085859A | 2009-04-23 | SHIMA MASAHIDE |
| PROBLEM TO BE SOLVED: To quickly and suitably conduct an analysis of the state of chemical bonds contained in a slight amount in a sample. SOLUTION: In such an X-ray photoelectron spectroscopic analytic method that the path energy of photoelectrons passing through an energy analyzer is uniformized, the path energy is set in accordance with the position of a peak of an inherent energy spectrum of the state of chemical bonds contained in a sample 2 to be analyzed and the half-value width of the peak, the peak position of another inherent energy spectrum of the state of chemical bonds that is closest to the energy spectrum and the half-value width of the peak, and the half-value width of a peak of an energy spectrum of an X-ray with which the sample is irradiated. COPYRIGHT: (C)2009,JPO&INPIT | ||||||
| 83 | PHOTOCURED PRODUCT | PCT/JP2013/064564 | 2013-05-21 | WO2013183468A1 | 2013-12-12 | MIHARA, Chieko; ITO, Toshiki; MURAYAMA, Yohei; OKINAKA, Motoki |
To provide a photocured product having small mold releasing force. A photocured product obtained by curing with light and containing a surface active agent, wherein a peak area of the ether bond derived peak is 3.0 times or more as large as a peak area of the ester bond derived peak, wherein the peak areas are obtained by peak separation processing by curve fitting of an X-ray photoelectron spectroscopy spectrum obtained as an analytical result on a chemical state of carbon at topmost surface of the photocured product, the analytical result being among analytical results on the topmost surface of the photocured product obtained by surface analysis of the photocured product with angle resolved X-ray photoelectron spectroscopy. |
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| 84 | 광경화물 | KR1020147036330 | 2013-05-21 | KR101734632B1 | 2017-05-11 | 미하라치에코; 이토도시키; 무라야마요헤이; 오키나카모토키 |
| 본발명은이형력이작은광경화물을제공한다. 본발명의광경화물은광 경화에의해얻어지고계면활성제를포함하며, 여기서에테르결합-유도피크의피크면적이에스테르결합-유도피크의피크면적의 3배이상이고, 상기피크면적은상기광경화물의최상표면에서탄소의화학상태에관한분석결과로서얻어지는 X선광전자분광스펙트럼의커브피팅에의한피크분리처리에의해얻어지며, 상기분석결과는각도분해 X선광전자분광분석을사용한광경화물의표면분석에의해얻은광경화물의최상표면상의분석결과중 하나이다. | ||||||
| 85 | XPS AND RAMAN SAMPLE ANALYSIS SYSTEM AND METHOD | PCT/EP2017/052757 | 2017-02-08 | WO2017148668A2 | 2017-09-08 | NUNNEY, Timothy Sion; GLENISTER, Christopher Kenneth; MEYER, Matthew Wayne; HIBBARD, Noah |
A process of analyzing a sample by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) includes providing a sample having a sample surface within a vacuum chamber, performing a Raman spectroscopic analysis on a plurality of selected areas of the sample surface within the vacuum chamber to map an area of the sample surface comprising the selected areas, the Raman spectroscopic analysis including identifying one or more chemical and/or structural features of the sample surface in one or more of the selected areas of the sample surface, and performing an X-ray photoelectron spectroscopy (XPS) analysis of one or more selected areas of the sample surface containing at least one chemical and/or structural feature identified by the Raman spectroscopic analysis, wherein the duration of the XPS analysis of a given selected area of the sample surface is longer than the duration of the Raman spectroscopic analysis of that given selected area. |
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| 86 | Photo-curing material | JP2012126821 | 2012-06-04 | JP2013251478A | 2013-12-12 | MIHARA CHIEKO; ITO TOSHIKI; MURAYAMA YOHEI; OKINAKA MOTOKI |
| PROBLEM TO BE SOLVED: To provide a photo-curing material of small release force.SOLUTION: The photo-curing material obtained by curing with light contains a surfactant. In the photo-curing material, the peak area of a peak derived from ether linkage obtained by performing waveform separation of an X-ray photoelectron spectroscopy spectrum, obtained as analysis results of chemical state of carbon on the outermost surface of the photo-curing material, out of the analysis results of the outermost surface of the photo-curing material obtained by surface analysis of the photo-curing material using resolved X-ray photoelectron spectroscopy analysis, is 3.0 times or more of the peak area of a peak derived from ester linkage. | ||||||
| 87 | HALOGENATED WANG RESINS FOR COMBINATORIAL CHEMICAL SYNTHESIS | PCT/KR1999/000468 | 1999-08-19 | WO00010943A2 | 2000-03-02 | |
| The present invention relates to novel halogenated Wang resins for combinational chemical synthesis, more specifically to halogenated Wang resins expressed by formula (1) useful for the effective tracing of combinational chemical synthetic process on solid supports using X-ray photoelectron spectroscopy (XPS) element analysis method; in formula (1), P represents polystyrene-divinylbenzene; X and Y represent hydrogen atom or halogen atom, which may be identical or different, their total number being 1-4; and at least one of them is halogen atom. | ||||||
| 88 | 晶圓金屬污染的評估方法 | TW105128040 | 2016-08-31 | TW201738980A | 2017-11-01 | 三重野文健; MIENO, FUMITAKE |
| 本發明提供了一種晶圓金屬污染的評估方法，包括步驟：對晶圓進行多次化學處理；對所述晶圓依次進行表面檢查、掃描電子顯微鏡-X射線能譜分析以及缺陷分類；通過對晶圓進行多次化學處理，與現有評估方法相比，能夠在後續對晶圓的處理中檢測到晶圓內部更深位置處的缺陷，以增加金屬污染檢測的精度，提高晶圓金屬污染的評估的準確性；並且本發明進行兩次表面檢查、兩次掃描電子顯微鏡-X射線能譜分析以及兩次缺陷分類，並將兩次的結果進行綜合分析，從而能夠更加精確得獲得金屬污染的資訊，準確的對晶圓金屬污染進行評估。 | ||||||
| 89 | 縫製糸、当該縫製糸を用いた、防護材料、防護衣服、および防護用品 | JP2016087981 | 2016-04-26 | JP6069721B1 | 2017-02-01 | 吉田 知弘; 中川 明久 |
| 【課題】初期及び経時のはっ水はつ油に優れ、液状有機化学物質から作業者を有効に防護しえる防護材料に好適に使用される縫製糸を提供する。 【解決手段】炭素数が6以下のパーフルオロアルキル基を有するフッ素系はっ水はつ油剤が塗布され、その表面のESCA(Electron Spectroscopy for Chemical Analysis)測定での珪素検出量が10atom%以下である縫製糸。 【選択図】なし |
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| 90 | Spectrum peak position correcting method for surface analyzing instrument | JP2000305599 | 2000-10-05 | JP2002116163A | 2002-04-19 | TAZAWA TOYOHIKO |
| PROBLEM TO BE SOLVED: To provide a spectrum peak position correcting method for a surface analyzing instrument, requiring no installation of charge removing mechanism nor specimen treatment such as vapor deposition of a reference substance for a correction reference. SOLUTION: This spectrum peak position correcting method is used for a surface analyzing instrument for analyzing the chemical conditions of elements in a sample by detecting the positions of peaks in an energy spectrum in the depth direction of the specimen obtained by irradiating the surface of the sample with X rays or electron beam while etching it. The position of a peak in the energy spectrum of an element to be analyzed existing in the upper layer part of the sample is corrected based on the amount of shifts of the peak positions due to a charge in the energy spectrum of elements constituting a substrate part at the interface area of the substrate part in contact with the upper layer part where the element to be analyzed exists. | ||||||
| 91 | Method of measuring sensitivity coefficient of auger electron spectroscopy | JP2006033435 | 2006-02-10 | JP2007212328A | 2007-08-23 | IDA ISATO; NOMOTO HIROTAKA |
| PROBLEM TO BE SOLVED: To provide a method of measuring sensitivity of coefficient of the Auger electron spectroscopy capable of correctly obtaining the sensitivity coefficient at the time of quantitative calculation: in the AES method regarding the method of sensitivity coefficient measuring method of the Auger electron spectroscopic analyzing method of the Auger electron spectro-analyzer for analyzing the chemical state of a solid surface. SOLUTION: The Auger electron spectroscopic analyzer for detecting Auger electron by scanning with an electron beam is characterized in that step (1) ≥2 kinds of solid material of single elements are arranged in the scanning range of the electron beam; step (2) the spectra in the scanning range are measured and the intensities of the elements constituting the solid materials are obtained; step (3) the areal ratios of the solid materials in the scanning area are obtained; the step (4) the sensitive factors between each element from the intensities of the elements and the areal ratios of the solid body materials are obtained. COPYRIGHT: (C)2007,JPO&INPIT | ||||||
| 92 | QUANTITATIVE DETERMINATION OF NITROGEN SPECIES DISTRIBUTION IN DISPERSANTS | US14728311 | 2015-06-02 | US20150369762A1 | 2015-12-24 | Frank Cheng-Yu WANG; Simon Robert KELEMEN; Liepao Oscar FARNG; Margaret May-Som WU |
| The nitrogen species in a long chain alkenyl succinimide are quantitated and speciated by means of X-Ray Photoelectron Spectroscopy with speciation being made by chemometrically curve resolving the XPS spectrum. | ||||||
| 93 | Scanning and high resolution electron spectral and image pickup device | JP3708495 | 1995-02-24 | JPH07325052A | 1995-12-12 | POORU II RAASON; POORU DABURIYU PARUMUBAAGU |
| PURPOSE: To provide an improved device for making the chemical measuring mapping over the whole surface region by the use of an X-ray photoelectron spectroscopy. CONSTITUTION: A device 10 for surface analysis emits an electron beam 20 which is put in a raster scan across an anode 24 so that X-rays are produced, and a Bragg monochrometer 34 converges the energy peak of the X-rays at the surface of a specimen 14 so that photoelectrons are emitted. An analyzer 54 offers information about the given photoelectrons and also information about chemical species of the applicable surface based on the photoelectron information, and the second sensor for low-energy photoelectrons works together with the raster means and produces the scanning photo-electron image of the surface for photographing of the specimen. A lens system 18 transports the photoelectrons to the analyzer 54 with a selectively corrected energy and allows the analyzer 54 to sense either of the high-energy electron characteristic representing the chemical species and the low-energy electron characteristic representing the surface image. COPYRIGHT: (C)1995,JPO | ||||||
| 94 | Chemical mechanical polishing pad, method for manufacturing the same, and chemical mechanical polishing method | JP2011145241 | 2011-06-30 | JP2012039093A | 2012-02-23 | KUBO KOTARO; OKAMOTO TAKAHIRO; HOSAKA YUKIO |
| PROBLEM TO BE SOLVED: To provide a chemical mechanical polishing pad having excellent storage stability, a method for manufacturing the same, and a chemical mechanical polishing method using the chemical mechanical polishing pad.SOLUTION: The chemical mechanical polishing pad according to the present invention is a chemical mechanical polishing pad comprising a polishing layer, whose surface subjected to polishing has a silicon atom concentration or fluorine atom concentration of 0.5 to 10 atom% calculated by elemental analysis using x-ray photoelectron spectroscopy (XPS). | ||||||
| 95 | Device for analyzing specimen | JP11949680 | 1980-08-29 | JPS5744842A | 1982-03-13 | SASAKI SUMIO; KOJIMA KENJI; MUROTA MASAO; ITOU TAKASHI |
| PURPOSE:To perform Auger electron spectroscopy and electro spectronscopy for cheminal analysis (ESCA) with good operability in a simple structure by providing an X-ray transmitting window which blocks an electron beam so that it can be freely inserted and removed. CONSTITUTION:An X-ray transmitting filter 11 which blocks the elctron beam is provided between an anticathode 7 of an X-ray source which also serves as an electron beam source and a specimen 3 via a moving mechanism 12 so that the filter can be freely inserted and removed. When said filter 11 is inserted the ESCA electron spectroscopy utilizing the irradiation of the X-ray having a specified wavelength is perfomred. When the filter 11 is removed, the Auger electron spectroscopy utilizing the electron beam containing the X-ray is performed. Therefore, the Auger and ESCA electron spectroscopies can be selectively performed by the easy operation in the simple constitution utilizing a pair of the beam and ray sources. | ||||||
| 96 | 조합화학합성 생성물의 정량분석방법 | KR1020000041991 | 2000-07-21 | KR1020000077495A | 2000-12-26 | 유성은; 공영대; 서진수 |
| PURPOSE: Quantitative analysis method of CCS products is provided which uses X-ray Photoelectron Spectroscopy(XPS) effectively to track the extent of progress of synthetic reaction in a solid support. CONSTITUTION: In the analysis method of products by CCS on the solid support, a CCS process wherein Wang resin halide is used as a solid support and processed through organic synthesis, peptide synthesis or carbohydrate synthesis is analyzed by XPS atomic spectroscopy quantitatively. The Wang resin are shown in a chemical formula 1 wherein P is polystyrene-divinyl benzene, X is selected from a halogen atom and n is an integer from 1 to 4 which indicates the number of substituted by halogen atom. | ||||||
| 97 | Separation membrane and separation membrane module | JP2013195336 | 2013-09-20 | JP2014042913A | 2014-03-13 | UENO YOSHIYUKI; FUJITA MASANORI; SUGAYA HIROYUKI |
| PROBLEM TO BE SOLVED: To provide a high-performance separation membrane module causing less deposition of proteins or organic substances by improving the defects of the conventional techniques.SOLUTION: There is provided a hollow fiber membrane which comprises a vinyl acetate unit-containing polymer and a polysulfone-based polymer and has a functional layer obtained by mixing an injection fluid flowing into the inside when a membrane-forming stock solution is discharged from a double annular spinneret with the vinyl acetate unit-containing polymer. The peak area percentage of carbon derived from ester group is 0.1 (% by atomic number) or more and 10 (% by atomic number) or less as measured by X-ray electron spectroscopy for chemical analysis (ESCA) on the surface of the functional layer, the peak area percentage of carbon derived from ester group is 10 (% by atomic number) or less as measured by X-ray electron spectroscopy for chemical analysis (ESCA) on the opposite surface of the functional layer, and the content of carbon derived from ester group on the surface of the functional layer is 10% or more larger than that on the opposite surface of the functional layer. | ||||||
| 98 | Method and apparatus for surface analysis of sample | JP25395293 | 1993-10-12 | JPH07110311A | 1995-04-25 | HASEGAWA MASAKI; NINOMIYA TAKESHI; YAMAMOTO KENICHI |
| PURPOSE: To provide a photoelectron spectrometry for analysis of physical and chemical quantities of minute areas, such as depthwise analysis, analysis of band structures, and analysis of crystal structures of component elements. CONSTITUTION: Light in a wavelength area from soft X rays to vacuum ultraviolet rays is condensed by an optical element 4 to irradiate a microscopic area of the surface of a sample 4 to measure kinematic energy of photoelectrons released therefrom with an energy analyzer 9, and at the same time, an angle distribution of the photoelectrons is measured by a position analysis type detector 10 as two-dimensional image. Thus, an analysis on the direction of depth of component elements, an analysis of band structures, an analysis of crystal structures and the like are accomplished in the microscopic area from photoelectron signals thus obtained. COPYRIGHT: (C)1995,JPO | ||||||
| 99 | 粘着剤組成物及びその製造方法、並びに粘着製品 | PCT/JP2016/066986 | 2016-06-08 | WO2016199787A1 | 2016-12-15 | 中村 賢一 |
Ｔｇが４０℃以上２００℃以下、数平均分子量が５００～１０，０００であるビニル重合体（Ａ）、及びアクリル系粘着性ポリマー（Ｂ）を含有する粘着剤組成物であって、 アクリル系粘着性ポリマー（Ｂ）は、その全構成単位に対して（メタ）アクリル酸アルコキシアルキルエステルに由来する構成単位を８５質量％以上含有し、 アクリル系粘着性ポリマー（Ｂ）１００質量部に対する前記ビニル重合体（Ａ）の割合が０．５質量部以上３０質量部以下であり、 粘着剤組成物をセパレーターに塗工、乾燥させて粘着剤層を得た際に、当該粘着剤層のＸ線光電子分光分析により得られるその表層部分の組成から計算されるＴｇが、粘着剤組成物のＴｇよりも３０℃以上高いことを特徴とする粘着剤組成物。 |
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| 100 | ANALYSIS METHOD AND X-RAY PHOTOELECTRON SPECTROSCOPE | EP16187259.3 | 2016-09-05 | EP3139158A1 | 2017-03-08 | SHIMA, Masahide |
An analysis method includes: acquiring a photoelectron spectrum and an X-ray-excited Auger spectrum, the photoelectron spectrum being obtained by detecting photoelectrons emitted from a specimen (S) by irradiating the specimen with X-rays, and the X-ray-excited Auger spectrum being obtained by detecting Auger electrons emitted from the specimen (S) by irradiating the specimen (S) with X-rays; calculating a quantitative value of each element included in the specimen (S) based on the photoelectron spectrum; and performing a curve fitting process on the X-ray-excited Auger spectrum by using an electron beam-excited Auger electron standard spectrum, and calculating a quantitative value of an analysis target element in each chemical bonding state included in the specimen (S). |
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