| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 141 | Nitrogen trifluoride as in-site detergent and method for washing ship shaped container and pipe using the same | JP17353886 | 1986-07-23 | JPS62127397A | 1987-06-09 | AARU JIYOSEFU FURETSUKU; RICHIYAADO ESU ROZURAA |
| 142 | X-ray photographic apparatus | JP10619282 | 1982-06-22 | JPS5945A | 1984-01-05 | KURIHARA TETSUO |
| 143 | 축광 및 중성화 방지용 도장공법 | KR1020110039815 | 2011-04-27 | KR101078999B1 | 2011-11-01 | 박명애 |
| PURPOSE: A coating method for preventing phosphorescence and neutralization is provided to prevent the concrete contamination of building construction and illuminating the inside of a tunnel by forming an anti-neutralizing film, an anti-contaminating film, and a phosphorescent film. CONSTITUTION: A coating method for preventing phosphorescence and neutralization includes the following: Degraded parts or foreign materials are eliminated from a concrete structure. An anti-neutralizing film is formed on the surface of the concrete structure based on a first aqueous coating composition. An anti-contaminating film is formed on the upper side of the anti-neutralizing film based on a second aqueous coating composition. A phosphorescent film is formed on the upper side of the anti-contaminating film based on a phosphorescent coating. Another anti-contaminating film is formed on the upper side of the phosphorescent film. | ||||||
| 144 | 염해방지용 침투식 방수제를 이용한 철근콘크리트 구조물 보수 보강공법 | KR1020100127172 | 2010-12-13 | KR101058157B1 | 2011-08-24 | 고원준 |
| PURPOSE: A repairing and reinforcing method of a reinforced concrete structure using a waterproofing agent for preventing a salt damage is provided to reduce working time by integrating a waterproofing agent with a reinforced concrete structure. CONSTITUTION: A repairing and reinforcing method of a reinforced concrete structure using a waterproofing agent for preventing a salt damage is as follows. The deteriorated parts of a reinforced concrete structure are chipped. Rust formed on exposed reinforcing bars of the reinforced concrete structure is eliminated. The reinforced concrete structure is washed using high-pressure water. A rust resisting process is performed in the exposed reinforcing bars of the washed reinforced concrete structure. Rust resisting primer is spread on the surface of the reinforced concrete structure. A waterproofing agent for preventing sea damage is produced and is spread on the surface of the spread rust resisting primer two to five times. A surface protective material is spread on the surface of the spread waterproofing agent. | ||||||
| 145 | 단열효과를 강화시킨 건축물의 단열방수공법 | KR1020100045290 | 2010-05-14 | KR101025429B1 | 2011-03-25 | 채민호 |
| PURPOSE: A heat-insulating and waterproofing method for a building is provided to prevent poisonous gas in the event of a fire by employing expanded perilte composition. CONSTITUTION: A heat-insulating and waterproofing method for a building is as follows. Expanded perilte composition is prepared by coating expanded perilite particles with an adhesive and cement, yellow soil, or white soil. A surface for heat-insulating and waterproofing construction is arranged and a primer is spread. The expanded perilte composition and a waterproofing material is mixed and the mixture is placed to the thickness of 30~100mm, wherein the waterproofing material helps the bonding of particles in the expanded perilte composition. The surface coated with the expanded perilte composition is finally coated to the thickness of 0.5~3mm. | ||||||
| 146 | 콘크리트 구조물의 방수 방식 공법 | KR1020090089616 | 2009-09-22 | KR100954725B1 | 2010-04-23 | 주재억 |
| PURPOSE: A waterproof construction method of a concrete structure is provided to reinforce the cohesive property of a waterproof layer and to keep concrete surface even using a background control material. CONSTITUTION: A base processing step comprises a foreign material removing process of a concrete surface(S10). A primer coating step is coating primer on the concrete surface(S20). A surface control substance coating step is coating background control materials on the primer(S30). A waterproof material first coating step is forming a first waterproof coating layer on the background control materials(S40). A waterproof material second coating step is coating waterproof materials on the first waterproof coating layer(S50). | ||||||
| 147 | 강유전체막의 손상층을 제거하기 위한 세정액 및 이를이용한 세정방법 | KR1020000035705 | 2000-06-27 | KR1020020000670A | 2002-01-05 | 이광욱; 박임수; 이근택; 권영민; 하상록 |
| PURPOSE: A cleaning solution and a cleaning method using the solution are provided, to remove the damaged layer of a ferroelectric film selectively without the corrosion of an electrode membrane and to improve the lifetime of a cleansing solution. CONSTITUTION: The cleaning solution comprises 0.01-1 wt% of a fluoride; 1-50 wt% of an organic acid containing a carboxylic acid; 0.25-15 wt% of an alkali pH controlling agent; and water. Preferably the fluoride is hydrogen fluoride, Boron fluoride hydroxide or ammonium fluoride; the organic acid is formic acid, acetic acid or citric acid; and the pH controlling agent is ammonium hydroxide, potassium hydroxide, tetramethylammonium hydroxide or tetraethylammonium hydroxide. The pH of the cleaning solution is 4.5-6.0. The surface of an exposed ferroelectric film is contacted with the cleansing solution after the annealing and etching processes. | ||||||
| 148 | Floor cleaning method | JP52349296 | 1995-08-22 | JP4502405B2 | 2010-07-14 | クロス，テリー・ジェイ; ゴール，デイビッド・ダブリュー; トーマス，ジョン・イー; ブチャナン、アリソン; ローランド，ジョン・ジェイ |
| 149 | Method for preventing asbestos from scattering out of slate with contaminated surface | JP2007138076 | 2007-05-24 | JP2008291512A | 2008-12-04 | HAYASHI YOSHINOBU |
| PROBLEM TO BE SOLVED: To provide a method for enclosing asbestos by treating slates used on roofs and ceilings of buildings for a long time and having contaminated surfaces and for preventing asbestos fibers from scattering caused by the treatment. SOLUTION: This method for preventing asbestos from scattering comprises a first step of removing the contamination adhered to the surface of a contaminated slate by spraying a high-pressure liquid containing 2-10 w% emulsified silicone resin to the slate, and a second step of spraying liquid containing 10-50 wt.% emulsified silicone resin to the surface. The liquid obtained by collecting the liquid used in the first step and passing through a solid content removal step is circulated and used as the liquid used in the first and second steps. COPYRIGHT: (C)2009,JPO&INPIT | ||||||
| 150 | Wet cleaning method of silicon carbide sintered body | JP34870198 | 1998-12-08 | JP4188473B2 | 2008-11-26 | 宏明 和田; 正珠 大月 |
| PROBLEM TO BE SOLVED: To simply and easily remove organic impurities and inorganic ones both existing on the surface of and near the surface of a silicon carbide sintered product by washing it through the sequential immersion treatment of the sintered product in a quasi-aqueous organic solvent, an aqueous ammonium solution, an aqueous inorganic acid solution and deionized water. SOLUTION: This method for the wet cleaning of a silicon carbide sintered product is to sequentially subject the sintered product to the following treatment so as to wash it and to make the washing degree on its surface become the level of <1×1011 atoms/cm2: (1) removing organic impurities adhered to the surface of and near the surface of the sintered product by soaking it in a quasi-aqueous organic solution for 2-60 min; (2) soaking it in an aqueous ammonium solution having 25-35 dynes/cm surface tension for 5-120 min; (3) removing metallic impurities on its surface of and near its surface by soaking it in an aqueous inorganic acid solution having 0. 3-68 wt.% concentration for 5-120 min; (4) soaking it in deionized water having <=100 ppt impurity and 16-18 MΩ resistivity for 2-60 min in an overflowing state. At least one of the processes preferably is conducted in a state that ultrasonic vibration is applied to the aqueous solution and the aqueous solution of at least one of the processes preferably shows >=30 deg.C. | ||||||
| 151 | Coating film removing agent | JP2000120695 | 2000-04-21 | JP2001303278A | 2001-10-31 | MAEKAWA TAKESHI |
| PROBLEM TO BE SOLVED: To provide a coating film removing agent for removing the coating film by forming the coating film removing agent to a prescribed shape by screen printing or the like on the coating film formed on a rigid base material, such as glass or ceramic and subjecting the film to heating and washing treatment. SOLUTION: Silica of ≤0.1 μm in grain size and cerium (IV) oxide are respectively added at 2 to 6 wt.% and 0 to 45 wt.% to a slurry or aqueous solution of acidic sulfate and the viscosity of the slurry or solution is specified to 5 to 90 Pa.S. COPYRIGHT: (C)2001,JPO | ||||||
| 152 | Surface treating agent for sanitary pottery and surface treatment of sanitary pottery | JP22351899 | 1999-08-06 | JP2001048678A | 2001-02-20 | MATSUNAGA MASAO; MOCHIZUKI TOSHIJI |
| PROBLEM TO BE SOLVED: To eliminate such cleaning using an acidic detergent, hard brushes, or the like, as to deteriorate pottery surfaces from daily cleaning by consisting of the subject surface treating agent of respective specific ratios of a polyalkylsiloxane, a catalyst and a solvent. SOLUTION: This treating agent is a one-component type silicone resin-base coating agent which consists of 20 to 30 wt.% polyalkylsiloxane, ≤2 wt.% catalyst and 70 to 80 wt.% (total is 100 wt.%) solvent and cures at room temperature. The catalyst is preferably an organic tin component, for example, butyltin laurate and the solvent is preferably an aromatic solvent, for example, toluene. A coating treatment is carried out by bringing the coating agent and the sanitary pottery into contact with each other. Coating films are then formed by carrying out the drying treatment of the sanitary pottery surfaces. The sanitary pottery formed with the coating films is daily used and the daily washing treatment accompanying the use is carried out by bringing a neutral detergent free of a polishing agent and the sanitary pottery into contact with each other. COPYRIGHT: (C)2001,JPO | ||||||
| 153 | Wet cleaning method for silicon carbide sintered compact | JP18313699 | 1999-06-29 | JP2001009394A | 2001-01-16 | OOTSUKI MASAMI; ENDO SHIGEKI |
| PROBLEM TO BE SOLVED: To simply and rapidly clean and remove organic and inorganic impurities present on the surface of a silicon carbide sintered compact by sequentially soaking the silicon carbide sintered compact in a quasi-water organic solvent and an aqueous inorganic acid solution and emitting ultrasonic wave with a specified frequency to the sintered compact during its soaking. SOLUTION: The silicon carbide sintered compact is treated sequentially in a process to soak the compact in a quasi-water organic solvent and a process to soak it in an aqueous inorganic solution and, is treated while an ultrasonic wave with a frequency set at 700 kHz or above is emitted to the compact at least in either of the described processes. That is, first an organic matter (e.g. an oil film, a fingerprint or wax) is removed from the surface of the silicon carbide sintered compact using the quasi-water organic solvent and then a metallic element is removed likewise from the surface and an area near the surface using the aqueous inorganic acid solution. Further, the sintered compact is treated while the ultrasonic wave is emitted to the compact. Thus the compact to be cleaned and the cleaning solution are physically vibrated and an active radical is generated in the cleaning solution to remove the impurities. | ||||||
| 154 | Wet cleaning of silicon carbide sintered product | JP34870198 | 1998-12-08 | JP2000169233A | 2000-06-20 | OOTSUKI MASAMI; WADA HIROAKI |
| PROBLEM TO BE SOLVED: To simply and easily remove organic impurities and inorganic ones both existing on the surface of and near the surface of a silicon carbide sintered product by washing it through the sequential immersion treatment of the sintered product in a quasi-aqueous organic solvent, an aqueous ammonium solution, an aqueous inorganic acid solution and deionized water. SOLUTION: This method for the wet cleaning of a silicon carbide sintered product is to sequentially subject the sintered product to the following treatment so as to wash it and to make the washing degree on its surface become the level of <1×1011 atoms/cm2: (1) removing organic impurities adhered to the surface of and near the surface of the sintered product by soaking it in a quasi-aqueous organic solution for 2-60 min; (2) soaking it in an aqueous ammonium solution having 25-35 dynes/cm surface tension for 5-120 min; (3) removing metallic impurities on its surface of and near its surface by soaking it in an aqueous inorganic acid solution having 0. 3-68 wt.% concentration for 5-120 min; (4) soaking it in deionized water having <=100 ppt impurity and 16-18 MΩ resistivity for 2-60 min in an overflowing state. At least one of the processes preferably is conducted in a state that ultrasonic vibration is applied to the aqueous solution and the aqueous solution of at least one of the processes preferably shows >=30 deg.C. | ||||||
| 155 | Method for cleaning building | JP25542298 | 1998-09-09 | JP2000083881A | 2000-03-28 | OTSUKI YOSHIO |
| PROBLEM TO BE SOLVED: To remove soils, such as dust, mold, produced on the surface of a building efficiently and safely without damage to a cleaning site and the environment around the cleaning site. SOLUTION: A granular agent 4 composed of a cationic linear chain organic polymer is blown against the surface of a building 1 where a soil 3 is produced, whereby electric forces are generated between each of the particles of the soil 3 and the agent 4. The particles of the soil 3 are ionized by the electric forces, and hence the particles are slightly displaced along the surface of the building 1 and separated from the surface to be cleaned and are removed in the form of granules. COPYRIGHT: (C)2000,JPO | ||||||
| 156 | Removing method of film coated on substrate | JP24838498 | 1998-09-02 | JP2000080483A | 2000-03-21 | YOSHIMURA KATSUSHI; MAEKAWA TAKESHI; TSUJII YOSHIAKI |
| PROBLEM TO BE SOLVED: To effectively remove with easy work a thin film composing of a metal or a metal compd. on a substrate of a glass, a ceramic or the like. SOLUTION: In a method removing a thin film, which composes of a metal or its compd. coated on a surface of a glass, a ceramic substrate, an acidic sulfate is brought into contact with a desired removing part of the thin film and the acidic sulfate is molten together with the thin film by heating at a higher temp. than an m.p. of the acidic sulfate, and after cooling it, the thin film is removed by washing the desired part. The metal is pref. to be selected among at least one kind of titanium, silicon, aluminum, zirconium, tin, cobalt, iron, chromium, manganese, copper and nickel, and their compd. is pref. to be an oxide, a nitride, carbide or their complex. COPYRIGHT: (C)2000,JPO | ||||||
| 157 | Cleaning of buildings | JP25542298 | 1998-09-09 | JP2952373B1 | 1999-09-27 | OOTSUKI YOSHIO |
| 【要約】 【課題】 建造物の表面に生ずる塵埃や、黴等の汚れを清掃現場及びその周囲の環境を破壊しないで能率的に、
かつ安全に掃除する。 【解決手段】 汚れの発生した建造物の表面にカチオン性線状上有機高分子から成る団粒剤を噴射して、その汚れの各粒子と団粒剤との間に生ずる電気力で、その汚れの各粒子を電離し、建造物の表面に沿って僅かに変位して被清掃面から剥離すると同時に団粒化して清掃する。 |
||||||
| 158 | Floor cleaning method | JP52349296 | 1995-08-22 | JPH10513073A | 1998-12-15 | クロス，テリー・ジェイ; ゴール，デイビッド・ダブリュー; トーマス，ジョン・イー; ブチャナン、アリソン; ローランド，ジョン・ジェイ |
| (57)【要約】 硬質表面に非中性pＨを有する第一洗浄組成物を接触させた後、該第一洗浄組成物のpＨに対して相補的な非中性pＨを有する第二洗浄組成物を接触させることを含む、複合的汚れを除去するための硬質表面(例えば、床)の洗浄方法。 「相補的」という用語は必要に応じて酸性またはアルカリ性を意味する。 これらの洗浄組成物の一方または両方の適用に際しては機械的な力を印加してもよい。 | ||||||
| 159 | Solvent for efflorescence and its production | JP4954697 | 1997-01-27 | JPH10212180A | 1998-08-11 | KIYONO RYUTARO |
| PROBLEM TO BE SOLVED: To rapidly dissolve and remove efflorescence essentially comprising calcium carbonate produced on the surface of an alkali concrete product such as mortar in the presence of alkali without damaging the base of the product. SOLUTION: This solvent for efflorescence is produced in the following processes. Ammonia gas or a water-soluble alkali soln. containing ammonia is added to water in which ethylenediamine tetraacetic acid is dissolved till the whole soln. changes into alkali. Then another water-soluble alkali soln. which is prepared by dissolving ammonium borate or by dissolving boric acid till the water becomes acid and then introducing ammonia gas or water-soluble alkali soln. containing ammonia into the water till the soln. becomes alkali is added to the mixed soln. above described. Further, cyclodextrin or di- or mono-saccharide sugar is added as an accelerator in order to dissolve calcium carbonate which is the main component of the efflorescence in ammonium borate. Moreover, potassium hydroxide is added in order to dissolve α-quartz which is one component of the efflorescence. The obtd. solvent is applied on an area where efflorescence is produced, and then naturally or forcedly dried. | ||||||
| 160 | Production of jig for semiconductor | JP35049296 | 1996-12-27 | JPH10194876A | 1998-07-28 | MINAGAWA KAZUHIRO |
| PROBLEM TO BE SOLVED: To provide a jig for a semiconductor made of a silicon carbide-metallic silicon composite material, metallic silicon, etc., and used in a process of producing a semiconductor device without contaminating a silicon wafer. SOLUTION: A compact having a shape necessary for a jig for a semiconductor and made of a silicon carbide-silicon composite material, metallic silicon, etc., is washed with hydrofluoric acid or a mixture of hydrofluoric acid with hydrochloric acid. The washed compact is heat-treated at 1,000-1,300 deg.C in an oxidizing atmosphere to form an oxidized film of 0.1-5μm thickness in the surface. The compact with the oxidized film is mechanically worked and washed with hydrofluoric acid or a mixture of hydrofluoric acid with hydrochloric acid to removed the oxidized film. | ||||||
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