| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 161 | Substrate Processing Apparatus | US12954369 | 2010-11-24 | US20110130001A1 | 2011-06-02 | Kazuyuki OKUDA; Toru Kagaya; Masanori Sakai |
| A substrate processing apparatus cleaning method that includes: containing a cleaning gas in a reaction tube without generating a gas flow of the cleaning gas in the reaction tube by supplying the cleaning gas into the reaction tube and by completely stopping exhaustion of the cleaning gas from the reaction tube or by exhausting the cleaning gas at an exhausting rate which substantially does not affect uniform diffusion of the cleaning gas in the reaction tube from at a point of time of a period from a predetermined point of time before the cleaning gas is supplied into the reaction tube to a point of time when several seconds are elapsed after starting of supply of the cleaning gas into the reaction tube; and thereafter exhausting the cleaning gas from the reaction tube. | ||||||
| 162 | Unit for eliminating particles and apparatus for transferring a substrate having the same | US12211234 | 2008-09-16 | US07918910B2 | 2011-04-05 | Young-Ki Ahn; Jae-Jeong Jeong; Bo-Ram-Chan Sung; Kyo-Woog Koo |
| In an apparatus for transferring a substrate, a partition wall is disposed in a vertical direction in a housing to divide an interior space of the housing into a first space and a second space. A pressure generating member divides the first space into an upper space and a lower space and moves in a vertical direction in the first space such that a positive pressure and a negative pressure are alternately generated in the upper space and the lower space. A substrate supporting member is movably disposed in the second space to support and to transfer the substrate. A plurality of gates is disposed on a side wall of the housing and the partition wall, and is opened and closed by the positive pressure and the negative pressure such that the particles are eliminated from the second space to an exterior space via the first space. | ||||||
| 163 | Dry cleaning apparatus and method capable of cleaning the cleaning agent | US11660781 | 2006-05-31 | US07743776B2 | 2010-06-29 | Yoichi Okamoto; Akihiro Fuchigami; Toshiyuki Mutoh; Tomoyasu Hirasawa; Tatsuya Satoh |
| A dry cleaning apparatus which causes cleaning agent to fly in a gas current to impact an object to be cleaned so as to remove extraneous substance attached to the object includes a cleaning tank defining an interior space for accommodating the cleaning agent and the object with the attached extraneous substance, an inflow unit configured to guide a gas current into the cleaning tank through an inlet, an aspiration unit configured to discharge gas from the cleaning tank through an aspiration opening, and a separation unit disposed between the interior space of the cleaning tank and both the inflow unit and the aspiration unit, the separation unit having openings that allow the gas and the extraneous substance to pass through but do not allow the cleaning agent to pass through, wherein the inlet, the aspiration opening, and the separation unit are configured such that relative motion is created between the separation unit and both the inlet and the aspiration opening. | ||||||
| 164 | Method and system for supplying a cleaning gas into a process chamber | US12142402 | 2008-06-19 | US07699935B2 | 2010-04-20 | Ramprakash Sankarakrishnan; Dale DuBois; Ganesh Balasubramanian; Karthik Janakiraman; Juan Carlos Rocha-Alvarez; Thomas Nowak; Visweswaren Sivaramakrishnan; Hichem M'Saad |
| A method and apparatus for cleaning a process chamber are provided. In one embodiment, a process chamber is provided that includes a remote plasma source and a process chamber having at least two processing regions. Each processing region includes a substrate support assembly disposed in the processing region, a gas distribution system configured to provide gas into the processing region above the substrate support assembly, and a gas passage configured to provide gas into the processing region below the substrate support assembly. A first gas conduit is configured to flow a cleaning agent from the remote plasma source through the gas distribution assembly in each processing region while a second gas conduit is configured to divert a portion of the cleaning agent from the first gas conduit to the gas passage of each processing region. | ||||||
| 165 | Compressed Air Welding Fume Shield System and Method | US12176941 | 2008-07-21 | US20090184099A1 | 2009-07-23 | Michael J. Eddington; Donald R. Loyd; James A. Minton; Milton T. Satterwhite; Donald P. Rager, JR. |
| In accordance with a particular embodiment of the present disclosure, an apparatus for shielding welding fumes includes a device configured to engage a welding gun. The device is configured to emit a flow of air through the one or more orifices. The flow of air is operable to divert welding fumes away from a welder. | ||||||
| 166 | SUBSTRATE PROCESSING APPARATUS | US12404932 | 2009-03-16 | US20090178694A1 | 2009-07-16 | Kazuyuki OKUDA; Toru Kagaya; Masanori Sakai |
| A substrate processing apparatus cleaning method that includes: containing a cleaning gas in a reaction tube without generating a gas flow of the cleaning gas in the reaction tube by supplying the cleaning gas into the reaction tube and by completely stopping exhaustion of the cleaning gas from the reaction tube or by exhausting the cleaning gas at an exhausting rate which substantially does not affect uniform diffusion of the cleaning gas in the reaction tube from at a point of time of a period from a predetermined point of time before the cleaning gas is supplied into the reaction tube to a point of time when several seconds are elapsed after starting of supply of the cleaning gas into the reaction tube; and thereafter exhausting the cleaning gas from the reaction tube. | ||||||
| 167 | Cleaning Device and Method for Cleaning a Workpiece | US12357852 | 2009-01-22 | US20090173227A1 | 2009-07-09 | Egon Kaske |
| In order to produce a cleaning device for cleaning a workpiece comprising a suction apparatus for sucking out impurities from an interior of the work piece wherein the suction apparatus has a particularly large suction effect, it is proposed that the suction apparatus at least one vacuum tank, at least one evacuation device for evacuating the vacuum tank, at least one ventilation line for connecting the vacuum tank to the workpiece and at least one blocking device for blocking off the connection between the vacuum tank and the workpiece. | ||||||
| 168 | Method of Cleaning Cavities on Gas Turbine Components | US11992439 | 2006-09-16 | US20090084408A1 | 2009-04-02 | Karl Georg Thiemann |
| A method of cleaning cavities on gas turbine components, in particular on gas turbine blades, wherein a caustic cleaning medium and subsequently a rinsing medium are directed for this purpose in particular repeatedly through the or each cavity, to be cleaned, of a gas turbine component is disclosed. Before the treatment of the or each cavity with cleaning medium and rinsing medium, the or each cavity of the gas turbine component is flooded with inert gas. The gas turbine component, with the inert gas atmosphere in the or each cavity being maintained, is then subjected to a preferably repetitive thermal treatment, wherein the component is heated for this purpose in a first time interval, is held at this temperature for a second time interval and is then cooled in a third time interval. The cleaning medium and the rinsing medium are then directed through the or each cavity. | ||||||
| 169 | METHOD AND ARRANGEMENT FOR CLEANING OPTICAL SURFACES IN PLASMA-BASED RADIATION SOURCES | US12128784 | 2008-05-29 | US20090014027A1 | 2009-01-15 | GUIDO SCHRIEVER |
| The invention is directed to a method and an arrangement for cleaning optical surfaces of reflection optics which are arranged in a plasma-based radiation source or exposure device arranged downstream and contaminated by debris particles emitted by a hot plasma of the radiation source. It is the object of the invention to find a novel possibility for in-situ cleaning of the optical surfaces of reflection optics which are contaminated by debris in plasma-based radiation sources so as to allow an integrated generation of known gas radicals and the isotropic distribution thereof on the contaminated optical surfaces. According to the invention, this object is met in that the gas radicals are generated by dielectrically impeded discharge between two surface electrodes along the entire optical surface. The gas radicals are generated almost exclusively by electron transfer on at least one barrier layer which covers the entire surface of at least one of the surface electrodes, an AC voltage in the Hz to kHz range is applied to the surface electrodes for periodically eliminating the charge polarization at the barrier layer so that a cold plasma is generated continuously and the deposited debris particles are removed as gaseous reaction products by the gas flow guided over the optical surface. | ||||||
| 170 | IN-SITU CHAMBER CLEANING FOR AN RTP CHAMBER | US11561868 | 2006-11-20 | US20080115808A1 | 2008-05-22 | Balasubramanian Ramachandran; Tae Jung Kim; Jung Hoon Sun; Joung Woo Lee; Hwa Joong Lim; Sang Phil Lee; Joseph Michael Ranish |
| A method of cleaning a chamber used for annealing doped wafer substrates. In one embodiment the method provides removing dopants deposited in an annealing chamber after an annealing process of a doped substrate by flowing one or more volatilizing gases into the annealing chamber, applying heat to volatilize the deposited dopants in the annealing chamber, and exhausting the chamber to remove volatilized dopants from the annealing chamber. | ||||||
| 171 | Method and apparatus for conditioning coins prior to discrimination | US11344966 | 2006-02-01 | US20060191770A1 | 2006-08-31 | Dan Gerrity; Aaron Finch; Chris Ferguson; Scott Scherer; Rick Riday; Larry Cannon |
| A coin conditioner is provided for cleaning or otherwise conditioning coins in a coin discriminator apparatus prior to transfer to a coin sensor. Coins enter through a feed tray and move down the length of a perforated tumbler, preferably without the use of gravity, such as under screw force, mechanical or centrifugal force. The spinning tumbler is preferably rotated about its longitudinal axis by a motor. In one embodiment, a blower or vacuum draws or moves air from one area to another, with the air preferably being filtered. As coins move through and down a tumbler, projections such as vanes, fins, ridges, dimples, spines or other raised features cause mechanical agitation and/or abrasion as coins are lifted and dropped while passing longitudinally through the tumbler. The coins are conditioned and non-coin matter is collected as it is separated and/or abraded from the coin surfaces. Tumbler perforations permit non-coin matter to pass through the perforations into a collection tray or other apparatus and/or are collected into filter media as a result of the air flow. In one embodiment, the air pressure system eliminates or reduces the occurrence of low density or light non-coin matter, such as hair or dust, and prevents these materials from settling or being carried through downstream portions of the coin processing system. | ||||||
| 172 | System for removing debris from a test socket | US11053218 | 2005-02-08 | US07005872B1 | 2006-02-28 | Mark Lanowitz; James Migliaccio; Jerome Ferr; Jeffrey Read |
| A test fixture for an electronic device is provided that removes debris from a socket of the test fixture using back side air blow off. In general, the test fixture includes a circuit board, a socket on a front side of the circuit board, and an air manifold on a back side of the circuit board. Pressurized air is provided to the air manifold through an air supply inlet coupling the air manifold to an external pressurized air supply. At least one via formed through the circuit board fluidly couples the air manifold on the back side of the circuit board to the socket on the front side of the circuit board. Accordingly, the pressurized air from the air manifold flows through the vias and up through the socket such that debris is removed from the socket. | ||||||
| 173 | Method and apparatus for conditioning coins prior to discrimination | US10997070 | 2004-11-23 | US20050145463A1 | 2005-07-07 | Dan Gerrity; Aaron Finch; Chris Ferguson; Scott Scherer; Rick Riday; Larry Cannon |
| A coin conditioner is provided for cleaning or otherwise conditioning coins in a coin discriminator apparatus prior to transfer to a coin sensor. Coins enter through a feed tray and move down the length of a perforated tumbler, preferably without the use of gravity, such as under screw force, mechanical or centrifugal force. The spinning tumbler is preferably rotated about its longitudinal axis by a motor. In one embodiment, a blower or vacuum draws or moves air from one area to another, with the air preferably being filtered. As coins move through and down a tumbler, projections such as vanes, fins, ridges, dimples, spines or other raised features cause mechanical agitation and/or abrasion as coins are lifted and dropped while passing longitudinally through the tumbler. The coins are conditioned and non-coin matter is collected as it is separated and/or abraded from the coin surfaces. Tumbler perforations permit non-coin matter to pass through the perforations into a collection tray or other apparatus and/or are collected into filter media as a result of the air flow. In one embodiment, the air pressure system eliminates or reduces the occurrence of low density or light non-coin matter, such as hair or dust, and prevents these materials from settling or being carried through downstream portions of the coin processing system. | ||||||
| 174 | Device for cleaning reticle box | US10980020 | 2004-11-03 | US20050091781A1 | 2005-05-05 | Jae-Hyun Yang; Yo-Han Ahn; Tae-Jin Hwang |
| The present invention relates to a reticule storage device. After the reticule storage device influxes external airs using a motor and a fan, it provides the external airs filtered by a filter to a reticule storage shelf in a chamber. According to the present invention, a nitrogen gas supply pipe is installed on one end of the chamber. In addition, the nitrogen gas supplier is installed to be connected from the nitrogen gas supplier to the reticule storage shelf. Several nitrogen gas supply nozzles are installed on an end portion of the nitrogen gas supply pipe, so that nitrogen gas is supplied to maintain a regular pressure in the chamber when a motor inflowing external airs is stopped. As a result, in case that an apparatus is stopped due to a problem of the apparatus for many hours, or an external voltage is not supplied due to a problem of the external problem, nitrogen gases may be purged in the apparatus. Accordingly, the purity in the apparatus can be maintained, so that it is possible to prevent a reticule kept in the apparatus from a particle contamination. | ||||||
| 175 | System for and method of purging/venting a brush arm bearing | US09767039 | 2001-01-22 | US06500272B2 | 2002-12-31 | Scott R. Cline; Christopher E. Harvey; Willi O. Kalvaitis; Davis H. Moquin |
| A purge/vent system (10) for and method of purging/venting a brush arm bearing. The purge/vent system includes a driven mechanism (12) and a support member (14) having a first cavity (48) for containing the driven mechanism. A gas supply system (24) is in fluid communication with the first cavity proximate the upper end (18) of the driven mechanism, and an evacuation system (26) is in fluid communication with the first cavity proximate the lower end (20) of the driven mechanism. In operation, the gas supply system supplies a gas to the first chamber and the evacuation system draws the gas from the first chamber. As the evacuation system draws the gas from the first chamber, the gas is drawn across and/or through the driven mechanism to keep the driven mechanism dry and/or remove foreign material from the first chamber. | ||||||
| 176 | Method and apparatus for conditioning coins prior to discrimination | US09704178 | 2000-10-31 | US06484884B1 | 2002-11-26 | Dan Gerrity; Aaron Finch; Chris Ferguson; Scott Scherer; Rick Riday; Larry D. Cannon |
| A coin conditioner is provided for cleaning or otherwise conditioning coins in a coin discriminator apparatus prior to transfer to a coin sensor. Coins enter through a feed tray and move down the length of a perforated tumbler, preferably without the use of gravity, such as under screw force, mechanical or centrifugal force. The spinning tumbler is preferably rotated about its longitudinal axis by a motor. In one embodiment, a blower or vacuum draws or moves air from one area to another, with the air preferably being filtered. As coins move through and down a tumbler, projections such as vanes, fins, ridges, dimples, spines or other raised features cause mechanical agitation and/or abrasion as coins are lifted and dropped while passing longitudinally through the tumbler. The coins are conditioned and non-coin matter is collected as it is separated and/or abraded from the coin surfaces. Tumbler perforations permit non-coin matter to pass through the perforations into a collection tray or other apparatus and/or are collected into filter media as a result of the air flow. In one embodiment, the air pressure system eliminates or reduces the occurrence of low density or light non-coin matter, such as hair or dust, and prevents these materials from settling or being carried through downstream portions of the coin processing system. | ||||||
| 177 | System for and method of purging/venting a brush arm bearing | US09767039 | 2001-01-22 | US20020095740A1 | 2002-07-25 | Scott R. Cline; Christopher E. Harvey; Willi O. Kalvaitis; Davis H. Moquin |
| A purge/vent system (10) for and method of purging/venting a brush arm bearing. The purge/vent system comprises a driven mechanism (12) and a support member (14) having a first cavity (48) for containing the driven mechanism. A gas supply system (24) is in fluid communication with the first cavity proximate the upper end (18) of the driven mechanism, and an evacuation system (26) is in fluid communication with the first cavity proximate the lower end (20) of the driven mechanism. In operation, the gas supply system supplies a gas to the first chamber and the evacuation system draws the gas from the first chamber. As the evacuation system draws the gas from the first chamber, the gas is drawn across and/or through the driven mechanism to keep the driven mechanism dry and/or remove foreign material from the first chamber. | ||||||
| 178 | Method and device for the cleaning of objects using a compressed cleaning fluid | US09993427 | 2001-11-06 | US20020074022A1 | 2002-06-20 | Karsten Loehr |
| A method for cleaning objects (4) in a pressure tank (2) using a compressed clean fluid, which contains a gas and which is compressed and decompressed one or more times. According to the present invention, the cleaning fluid is decompressed to a pressure at which the gas has a volume that is a multiple of the volume of the compressed cleaning fluid in the pressure tank. In this manner, it is possible to remove particle-sized and other impurities from recesses, blind holes, or open cavities (6) in the objects. | ||||||
| 179 | Dual-duty blowing and exhausting apparatus | US09401519 | 1999-09-22 | US06367119B1 | 2002-04-09 | Wuu-Cheau Jou |
| A dual-duty blowing and exhausting apparatus is provided. The apparatus may be quickly and conveniently converted between blowing and exhausting configurations without exposing its parts to undue wear or damage, and without causing the escape of the collected dust or other scrap material. The apparatus comprises a body member formed with an intermediate cylinder section having a conically contoured internal surface portion coaxially disposed about an axial bore. The apparatus also includes an exhaust valve coupled to a first end section of the body member in substantially sealed manner. This exhaust valve serves to guide compressed air introduced into the body member to the conically contoured internal surface portion for expulsion through the tapered throat portion during the exhausting operation. The apparatus further includes a blow valve detachably coupled to the exhaust valve for effecting the blowing operation. The blow valve includes a substantially tubular member which receives a central shaft sleeve member having a plurality of angularly offset fins extending radially therefrom. The central shaft sleeve member receives in spring biased manner a slide rod, on a radially flared flange to which is coupled a gasket seal that obstructs the axial bore upon the blow valve's coupling to the exhaust valve. The compressed gas introduced into the body member is thus deflected to the blow valve for expulsion through the gun-barrel section. | ||||||
| 180 | Aerosol substrate cleaner | US09000518 | 1997-12-30 | US06332470B1 | 2001-12-25 | Boris Fishkin; Kyle A. Brown |
| An apparatus for cleaning a substrate includes a source of pressurized carrier gas and a body of cleaning agent in liquid form. A first conduit directs the pressurized carrier gas from the carrier gas source to the body of cleaning agent. A second conduit carries a flow of the carrier gas away from the body of the cleaning agent. The carrier gas flow carried by the second conduit includes cleaning agent in vapor form acquired from the body of cleaning agent. A nozzle is coupled to the second conduit to cause droplets of the cleaning agent to impinge upon a first face of the substrate to be cleaned. | ||||||
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