| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 61 | 低温冷凝的方法和装置 | CN200710143712.9 | 2007-08-02 | CN101143268A | 2008-03-19 | H-D·奥贝尔迈尔 |
| 本发明涉及在低温冷却装置(TK)中通过低温冷凝来净化工艺气体(1)的低温冷凝方法和低温冷凝设备。根据本发明，在将工艺气体导入低温冷却装置(TK)中前，在冷凝物预冷却装置(KVK)中在与从工艺气体(1，2，3)中分离出的冷凝物(5)的间接热交换中，将工艺气体预冷。 | ||||||
| 62 | 收集装置 | CN00126287.4 | 2000-08-03 | CN1208114C | 2005-06-29 | 野村典彦 |
| 一种收集装置，它包括：一排气道，用于通过真空泵将气密密封室抽成真空；一气密密封收集容器，延伸过排气道和邻设于排气道的再生通道；一收集器，位于收集容器中以吸附被排放气体中的产物，并从被排放气体中去除该产物，该收集器有选择地位于排气道或再生通道上；一阀门件，位于收集器的两侧，可与收集器一体移动；一密封件，安装在阀门件的外周表面上，以便收集器被移动时能够在收集容器的内周表面上滑动。 | ||||||
| 63 | 低温蒸气回收方法和系统 | CN96103082.8 | 1996-03-07 | CN1081320C | 2002-03-20 | 罗恩C·李; 迈克尔D·海尔; 迈克尔T·唐尼; 迈克尔J·巴拉索 |
| 一种用来取出含在气流中的可冷凝蒸气的方法和系统，含在气流中的可冷凝蒸气在一个或多个冷凝器内通过制冷剂流与气流的间接热交换而冷凝。此冷凝过程产生一被致冷气流和一被加热的制冷剂流。且在节能热交换器内将至少部分被加热的制冷剂流的热量进一步热交换给被致冷的气流以将被加热的制冷剂流形成一被冷却的制冷剂流。该制冷剂流通过在一喷射器或类似设备的混合室内将一低温流与至少部分被冷却的制冷剂流相混合而产生。 | ||||||
| 64 | 收集装置 | CN00126287.4 | 2000-08-03 | CN1284613A | 2001-02-21 | 野村典彦 |
| 一种收集装置,它包括:一排气道,用于通过真空泵将气密密封室抽成真空;一气密密封收集容器,延伸过排气道和邻设于排气道的再生通道;一收集器,位于收集容器中以吸附被排放气体中的产物,并从被排放气体中去除该产物,该收集器有选择地位于排气道或再生通道上;一阀门件,位于收集器的两侧,可与收集器一体移动:一密封件,安装在阀门件的外周表面上,以便收集器被移动时能够在收集容器的内周表面上滑动。 | ||||||
| 65 | 多效率吸收冷冻方法及其所使用装置 | CN91102888.9 | 1991-04-30 | CN1056564A | 1991-11-27 | 郑建炎 |
| 本发明的方法中，第一水蒸气被含有水及非挥发性溶质(如溴化锂)，的溶液所吸收，而吸收液的温度高于同压力下的纯水饱和温度。由吸收所放出的热量，传递到纯水以产生第二蒸气，而其第二压力高于第一蒸气压，由此稀释该吸收液。第一蒸气的吸收，第二蒸气的产生及吸收液的稀释，可统认为稀释吸收液所达到的蒸气压补强操作。本发明的方法及装置也可以执行非水溶液溶剂的蒸气加压。 | ||||||
| 66 | CRYOPUMP WITH CONTROLLED HYDROGEN GAS RELEASE | PCT/US2011062098 | 2011-11-23 | WO2012071540A3 | 2012-07-19 | EACOBACCI MICHAEL J; BARTLETT ALLEN J; CASELLO JOHN J; WELLS JEFFREY A |
| A cryopump system includes a cryopump having a first cooling stage and a second cooling stage connected to the first cooling stage, the second cooling stage including a gas adsorber having a hydrogen adsorbing capacity of at least about 2 standard liters. The thermal storage capacity of the second cooling stage is sufficient to enable control of hydrogen pressure within the cryopump to satisfy ignition safety limits and limits on hydrogen flow rate in an exhaust line to be within limits of an abatement system to be coupled to the cryopump, upon warming of the second cooling stage during regeneration of up to a fully loaded cryopump. | ||||||
| 67 | METHOD OF RECLAIMING AND STORING A VALUABLE PROCESS GAS | PCT/US2009037862 | 2009-03-20 | WO2009117693A8 | 2009-11-19 | BARTLETT ALLEN J; BALL-DIFAZIO DOREEN J |
| Cryogenic vacuum pump method for pumping a process chamber and reclaiming process gas. The valuable process gas may include a valuable gas, such as Xenon, Krypton or other rare gases, that is too expensive to be used in a once through loop of a semiconductor processing operation. The cryogenic vacuum pump has a refrigerator and a cryogenic panel in thermal contact with the refrigerator. The cryogenic vacuum pump also has a circuit. The circuit control heating to a first temperature in which a first process gas changes from a condensed phase while at least a second process gas remains in the condensed phase. The circuit also controls heating to a second temperature to reclaim the second process gas remaining in the condensed phase once the first process gas is removed. | ||||||
| 68 | MULTI-REFRIGERATOR HIGH SPEED CRYOPUMP | PCT/US2011045977 | 2011-07-29 | WO2012016192A2 | 2012-02-02 | BARTLETT ALLEN J; EACOBACCI MICHAEL J JR; SYSSOEV SERGEI |
| A refrigeration system includes a first refrigerator having a first cooling load at a first temperature and a second refrigerator having a second cooling load at a second temperature. Also included is a thermal coupling between the two refrigerators to share thermal load, e.g., cooling load, between the refrigerators, the coupling being restricted to maintain a difference between the first and second temperatures. A cryopump includes a first refrigerator having at least first and second stages, and a second refrigerator. A thermal coupling between the first stage of the first refrigerator and a cold end of the second refrigerator is restricted to maintain a temperature difference between the cold end of the second refrigerator and the first stage of the first refrigerator. The cryopump also includes a radiation shield in thermal contact with the cold end of the second refrigerator, and a condensing surface, spaced from and surrounded by the radiation shield, and in thermal contact with a second stage, e.g., coldest stage, of the first refrigerator. The restricted thermal coupling can be configured to balance the cooling load on the two refrigerators. The thermal coupling can be formed in a base plate of the radiation shield, the base plate having varying cross-sectional area to maintain a substantially uniform temperature at a periphery of the base plate. | ||||||
| 69 | METHOD OF RECLAIMING AND STORING A VALUABLE PROCESS GAS | PCT/US2009037862 | 2009-03-20 | WO2009117693A3 | 2010-01-07 | BARTLETT ALLEN J; BALL-DIFAZIO DOREEN J |
| Cryogenic vacuum pump method for pumping a process chamber and reclaiming process gas. The valuable process gas may include a valuable gas, such as Xenon, Krypton or other rare gases, that is too expensive to be used in a once through loop of a semiconductor processing operation. The cryogenic vacuum pump has a refrigerator and a cryogenic panel in thermal contact with the refrigerator. The cryogenic vacuum pump also has a circuit. The circuit control heating to a first temperature in which a first process gas changes from a condensed phase while at least a second process gas remains in the condensed phase. The circuit also controls heating to a second temperature to reclaim the second process gas remaining in the condensed phase once the first process gas is removed. | ||||||
| 70 | 熱処理炉装置および炭素繊維束の製造方法 | JP2016513158 | 2016-02-24 | JP6217844B2 | 2017-10-25 | 岡 勇輔; 稲垣 博司; 山本 伸之; 川村 篤志 |
| 71 | コールドトラップ | JP2013249351 | 2013-12-02 | JP6124776B2 | 2017-05-10 | 谷津 貴裕 |
| 72 | コールドトラップ、及びコールドトラップの取付構造 | JP2012283119 | 2012-12-26 | JP5989539B2 | 2016-09-07 | 及川 健 |
| 73 | クライオポンプシステム、クライオポンプシステムの運転方法、及び圧縮機ユニット | JP2012050725 | 2012-03-07 | JP5868224B2 | 2016-02-24 | 松井 孝聡 |
| 74 | クライオポンプ及びその再生方法 | JP2012045268 | 2012-03-01 | JP5846966B2 | 2016-01-20 | ▲高▼橋 走 |
| 75 | クライオポンプ | JP2012021289 | 2012-02-02 | JP5822747B2 | 2015-11-24 | 及川 健 |
| 76 | コールドトラップ | JP2013249351 | 2013-12-02 | JP2015104720A | 2015-06-08 | 谷津 貴裕 |
| 【課題】排気流路のコンダクタンスの低下を抑えつつ、コールドトラップの排気速度を高くする。 【解決手段】コールドトラップ10は、真空容器12とターボ分子ポンプ14との間に配設される。コールドトラップ10は、コールドパネル24と、排気流路18においてコールドパネル24を囲むコールドパネル容器26と、を備える。コールドパネル24は、コールドパネル容器26の外に拡張パネル34を備える。拡張パネル34は、真空容器12の中に配置される。 【選択図】図1 |
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| 77 | 極低温ユニットおよびその構成品 | JP2011516814 | 2009-06-30 | JP5666438B2 | 2015-02-12 | ボール−ディファジオ・ドリーン・ジェイ; ジョンソン・ウィリアム・エル; モリス・ロナルド・エヌ; サリバン・ロバート・ピー |
| 78 | クライオポンプシステム、クライオポンプのための再生方法 | JP2011108426 | 2011-05-13 | JP5634323B2 | 2014-12-03 | 安東 正道; 正道 安東 |
| 79 | Cryopump and regeneration method of the same | JP2013049483 | 2013-03-12 | JP2014173571A | 2014-09-22 | KIMURA TOSHIYUKI |
| PROBLEM TO BE SOLVED: To provide a cryopump and a regeneration method of the cryopump which facilitates discharge of water in the regeneration of the cryopump.SOLUTION: A regeneration method of a cryopump includes: a first discharge process (S12) in which the exhaust of a cryopump container and supply of purge gas are alternately performed in a first pressure range; and a second exhaust process (S18) in which exhaust of the cryopump container to a low pressure region falling below the first pressure range is performed. In the second exhaust process, whether the second exhaust process is completed or not is judged in the low pressure region at least one time and, prior to the initial time judgment of whether the second exhaust process is completed or not, purge gas is supplied to the cryopump container. | ||||||
| 80 | Cryopump | JP2013043541 | 2013-03-05 | JP2014173424A | 2014-09-22 | TAKAHASHI SO |
| PROBLEM TO BE SOLVED: To provide a cryopump suitable for high-speed evacuation of non-condensable gas such as hydrogen gas.SOLUTION: A cryopump 10 comprises: a cryopanel assembly 20 that comprises a plurality of cryopanels including adsorption areas 48 on both sides; a radiation shield 30 that forms a gas receiving space 50 surrounding the cryopanel assembly 20; and a radiation cover 32 arranged at an inlet 12. The radiation cover 32 comprises: a main plate 52 arranged in a place corresponding to the cryopanel assembly 20 in the inlet 12; and a louver part 54 arranged in a place corresponding to the gas receiving space 50 in the inlet 12. The radiation cover 32 may not comprise the louver part 54. | ||||||
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