101 |
Methods for disrupting electronic circuits |
US13919926 |
2013-06-17 |
US09069049B2 |
2015-06-30 |
James Cornwell |
Directed-energy systems and methods are described for disrupting electronic circuits, especially those containing semiconductors. A directed-energy system can include a charged particle generator configured to generate plural energized particles and a charge transformer configured to receive the plural energized particles that include charged particles and to output energized particles that include particles having substantially zero charge. The charged particle generator can be configured to direct the plural energized particles through the charge transformer in a predefined direction. A method for disrupting electronic circuits can include generating plural energized particles, directing the plural energized particles to an incident surface of a charge transformer and transforming the plural energized particles within the charge transformer. The transformed particles can be at substantially zero charge. The method can further include generating a wavefront at an exit surface of the charge transformer including the transformed particles and impinging an electronic circuit with the wavefront. |
102 |
System and method of ion neutralization with multiple-zoned plasma flood gun |
US13439124 |
2012-04-04 |
US09053907B2 |
2015-06-09 |
Chun-Lin Chang; Chih-Hong Hwang; Wen-Yu Ku; Chi-Ming Yang; Chin-Hsiang Lin |
An apparatus comprises a plasma flood gun for neutralizing a positive charge buildup on a semiconductor wafer during a process of ion implantation using an ion beam. The plasma flood gun comprises more than two arc chambers, wherein each arc chamber is configured to generate and release electrons into the ion beam in a respective zone adjacent to the semiconductor wafer. |
103 |
Charged particle cancer therapy patient positioning method and apparatus |
US12994125 |
2009-05-21 |
US08688197B2 |
2014-04-01 |
Vladimir Yegorovich Balakin |
The invention comprises a patient positioning and/or repositioning system, such as a laying, semi-vertical, or seated patient positioning, alignment, and/or control method and apparatus used in conjunction with multi-axis charged particle radiation therapy. Patient positioning constraints optionally include one or more of: a seat support, a back support, a head support, an arm support, a knee support, and a foot support. One or more of the positioning constraints are preferably movable and/or under computer control for rapid positioning, repositioning, and/or immobilization of the patient. The system optionally uses an X-ray beam that lies in substantially the same path as a proton beam path of a particle beam cancer therapy system. The generated image is usable for: fine tuning body alignment relative to the proton beam path, to control the charged particle beam path to accurately and precisely target the tumor, and/or in system verification and validation. |
104 |
X-ray method and apparatus used in conjunction with a charged particle cancer therapy system |
US12994129 |
2009-05-21 |
US08487278B2 |
2013-07-16 |
Vladimir Yegorovich Balakin |
The invention comprises an X-ray method and apparatus used in conjunction with charged particle radiation therapy of cancerous tumors. The system uses an X-ray beam that lies in substantially the same path as a charged particle beam path of a particle beam cancer therapy system, has an elongated lifetime, and/or that is synchronized with patient respiration. The system creates an electron beam that strikes an X-ray generation source where the X-ray generation source is located proximate to the proton beam path. By generating the X-rays near the proton beam path, an X-ray path that is essentially the proton beam path is created. Using the generated X-rays, the system collects X-ray images of a localized body tissue region about a cancerous tumor, which are usable for: fine tuning body alignment relative to the proton beam path and/or to control the proton beam path to accurately and precisely target the tumor. |
105 |
Directed-energy systems and methods for disrupting electronic circuits |
US12269876 |
2008-11-12 |
US08476901B2 |
2013-07-02 |
James Cornwell |
Disclosed are directed-energy systems and methods for disrupting electronic circuits, especially those containing semiconductors. A directed-energy system can include a charged particle generator configured to generate plural energized particles and a charge transformer configured to receive the plural energized particles that include charged particles and to output energized particles that include particles having substantially zero charge. The charged particle generator can be configured to direct the plural energized particles through the charge transformer in a predefined direction. A method for disrupting electronic circuits can include generating plural energized particles, directing the plural energized particles to an incident surface of a charge transformer and transforming the plural energized particles within the charge transformer. The transformed particles can be at substantially zero charge. The method can further include generating a wavefront at an exit surface of the charge transformer including the transformed particles and impinging an electronic circuit with the wavefront. |
106 |
MULTI-FIELD CHARGED PARTICLE CANCER THERAPY METHOD AND APPARATUS |
US12994130 |
2009-05-21 |
US20110233423A1 |
2011-09-29 |
Vladimir Yegorovich Balakin |
The invention comprises a multi-field charged particle irradiation method and apparatus. Radiation is delivered through an entry point into the tumor and Bragg peak energy is targeted to a distal or far side of the tumor from an ingress point. Delivering Bragg peak energy to the distal side of the tumor from the ingress point is repeated from multiple rotational directions. Preferably, beam intensity is proportional to radiation dose delivery efficiency. Preferably, the charged particle therapy is timed to patient respiration via control of charged particle beam injection, acceleration, extraction, and/or targeting methods and apparatus. Optionally, multi-axis control of the charged particle beam is used simultaneously with the multi-field irradiation. Combined, the system allows multi-field and multi-axis charged particle irradiation of tumors yielding precise and accurate irradiation dosages to a tumor with distribution of harmful irradiation energy about the tumor. |
107 |
CHARGED PARTICLE BEAM ACCELERATION METHOD AND APPARATUS AS PART OF A CHARGED PARTICLE CANCER THERAPY SYSTEM |
US12994117 |
2009-05-21 |
US20110180720A1 |
2011-07-28 |
Vladimir Yegorovich Balakin |
The invention comprises a charged particle beam acceleration method and apparatus used as part of multi-axis charged particle radiation therapy of cancerous tumors. The accelerator includes a synchrotron having advances in turning magnets, edge focusing magnets, magnetic field concentration magnets, and extraction and intensity control elements that minimize the overall size of the synchrotron, provide a tightly controlled proton beam, directly reduce the size of required magnetic fields, directly reduces required operating power, and allows independent energy and intensity control of extracted charged particles from the synchrotron. |
108 |
Extreme ultra violet light source apparatus |
US11976276 |
2007-10-23 |
US20080083887A1 |
2008-04-10 |
Hiroshi Komori; Akira Endo |
In an extreme ultra violet light source apparatus that exhausts debris including fast ions and neutral particles by the effect of a magnetic field, neutral particles emitted from plasma are efficiently ionized. The extreme ultraviolet light source apparatus includes: a plasma generating unit that generates plasma, that radiates at least extreme ultra violet light, through pulse operation; collective optics that collects the extreme ultra violet light radiated from the plasma; a microwave generating unit that radiates microwave through pulse operation into a space in which a magnetic field is formed to cause electron cyclotron resonance, and thereby ionizes neutral particles emitted from the plasma; a magnetic field forming unit that forms the magnetic field and a magnetic field for trapping at least ionized particles; and a control unit that synchronously controls at least the plasma generating unit and the microwave generating unit. |
109 |
Methods and apparatuses for making x-rays using electron-beam ion trap (EBIT) technology |
US11175409 |
2005-07-06 |
US20070009089A1 |
2007-01-11 |
Marcus Mendenhall |
Methods and systems for making X-rays using Electron-Beam Ion Trap (EBIT) technology. A method includes extracting ions of various atomic species from an EBIT, transporting the ions through an evacuated tube, and producing x-rays by neutralizing the ions when the ions strike a conducting plate. Another method includes producing x-rays through EBIT technology and using the x-rays in a medical application. An apparatus includes an EBIT configured to emit fully ions of various atomic species, an evacuated tube configured to transport the ions, and a conducting plate configured to produce X-rays by neutralizing the ions when the ions strike the conducting plate. |
110 |
Neutral particle beam processing apparatus |
US10451633 |
2002-03-22 |
US06861642B2 |
2005-03-01 |
Katsunori Ichiki; Kazuo Yamauchi; Hirokuni Hiyama; Seiji Samukawa |
A neutral particle beam processing apparatus comprises a workpiece holder (20) for holding a workpiece (X), a plasma generator for generating a plasma in a vacuum chamber (3), an orifice electrode (5) disposed between the workpiece holder (20) and the plasma generator, and a grid electrode (4) disposed upstream of the orifice electrode (5) in the vacuum chamber (3). The orifice electrode (5) has orifices (5a) defined therein. The neutral particle beam processing apparatus further comprises a voltage applying unit for applying a voltage between the orifice electrode (5) and the grid electrode (4) via a dielectric (5b) to extract positive ions from the plasma generated by the plasma generator and pass the extracted positive ions through the orifices (5a) in the orifice electrode (5). |
111 |
Plural foils shaping intensity profile of ion beams |
US09707950 |
2000-11-08 |
US06462348B1 |
2002-10-08 |
William Z. Gelbart |
The invention presents an approach that uses plural separated foils to shape an ion beam so that the intensity density of hot spots in the ion beam is lowered. More particularly, plural foils are placed in close proximity to each other, wherein at least one foil intercepts a portion of the beam to strip a charge from ions in different portions of the beam at different times, and thus, shape the ion beam. At a basic level, the inventive approach places plural foils so that the distance between planes of successive foils is a fraction of the radius of curvature of the beam's cyclotron orbit. |
112 |
Charge exchange device for charged particle accelerator |
US09755554 |
2001-01-05 |
US20020088944A1 |
2002-07-11 |
Marvin
R.
LaFontaine; Paul
Murphy; Paul
Barrett |
A charge exchange device, typically used in an ion beam accelerator, includes a charge exchange tube defining a charge exchange chamber and beam ports for allowing an ion beam to enter and exit the charge exchange tube, a containment tube mounted external to the charge exchange tube, the containment tube having an entrance port for a charge exchange material, and at least one intermediate tube mounted between the charge exchange tube and the containment tube. The charge exchange tube and the at least one intermediate tube have at least one set of flow ports that are aligned on opposite sides of the charge exchange chamber to permit columnated flow of the charge exchange material into and through the charge exchange chamber. Leakage of the charge exchange material through the beam ports is reduced in comparison with prior art charge exchange devices. |
113 |
Charge-exchange device |
US162066 |
1998-09-29 |
US6137246A |
2000-10-24 |
Yasuo Suzuki |
A charge-exchange device is disclosed which is able to considerably reduce, without the use of foils, radio activation caused by a beam deflection angle and, which also implements a further efficiency and reduction of a laser output. The charge-exchange device is provided with an undulator and an optical resonator. The undulator magnetic field which has been generated by the undulator generates the Lorentz electric field by interaction with the relativistic velocity of H.sup.0 neutral beam being injected. The optical resonator amplifies the photon density of the laser beam and causes it to collide against the injected H.sup.0 neutral beam, thereby resonantly exciting the H.sup.0 beam to the principal quantum number of 4. The H.sup.0 beam which has been resonantly excited or excited by the relativistic Doppler effect in the undulator magnetic field is ionized to H.sup.+ ion by the Lorentz electric field. |
114 |
Plasma processing system and method |
US444261 |
1995-05-18 |
US5518572A |
1996-05-21 |
Osamu Kinoshita; Shigemi Murakawa; Naoki Kubota |
An etching system contains a plasma chamber, a charge exchange chamber and a processing chamber. The charge exchange chamber and the processing chamber are partitioned with a porous plate provided with a number of fine linear microchannel holes. Positive ions generated by the plasma chamber are accelerated by an accelerating electrode in the charge exchange chamber, charge-exchanged and introduced as neutral particles through the microchannel holes into the processing chamber. Neutral particles are vertically entered into an object to be processed as neutral particle beams that are completely aligned by the microchannel holes. An object with a large surface area can be etched with high accuracy by making the porous plate a size which corresponds to the object. Thus, plasma processing with only neutral particles is carried out with high accuracy even when the surface area of the object is large. |
115 |
Ion implantation apparatus |
US974873 |
1992-11-12 |
US5354986A |
1994-10-11 |
Satoshi Yamada; Hirohisa Yamamoto; Shigeru Shiratake |
An ion implantation apparatus includes a charge neutralizer having a control circuit which controls the quantity of secondary electrons irradiating a semiconductor wafer. Electrons are generated in response to a direction of movement of a semiconductor wafer to neutralize positive charge on the semiconductor wafer. The apparatus can neutralize the positive charge homogeneously and prevent electrical breakdown of the semiconductor wafer. |
116 |
Electrostatic ion accelerator |
US643855 |
1991-01-18 |
USRE34575E |
1994-04-05 |
Robert E. Klinkowstein; Ruth Shefer |
A high current (0.2 to at least 2 milliamperes), low-energy (2.2 to 4 MV) ion beam is generated and is utilized to produce clinically significant quantities of medical isotopes useful in applications such as positron emission tomography. For a preferred embodiment, a tandem accelerator is utilized. Negative ions generated by a high current negative-ion source are accelerated by an electrostatic accelerator in which the necessary high voltage is produced by a solid state power supply. The accelerated ions then enter a stripping cell which removes electrons from the ions, converting them into positive ions. The positive ions are then accelerated to a target which is preferably at ground potential. For a preferred embodiment, the solid state power supply utilized to develop the required voltages is a cascade rectifier power supply which is coaxial with the accelerator between the ion source and the stripper, and is designed to have a voltage gradient which substantially matches the maximum voltage gradient of the accelerator. |
117 |
Ion accelerator |
US877452 |
1992-05-01 |
US5300891A |
1994-04-05 |
Nobuhiro Tokoro |
Ion accelerator characterized in that it is able to use not only a negative ion beam, but also a positive ion beam and a neutral beam, increases the efficiency of the use of the beam, and increases beam current, by using a positive ion source and a charge exchange cell, producing a negative ion beam, and providing, in a tandem type accelerator which uses this, a pre-analyzing magnet having changeable polarity and a pre-focusing lens, a beam neutralizer, and an accelerator terminal, shorting rod. |
118 |
High brilliance negative ion and neutral beam source |
US460464 |
1990-01-03 |
US5019705A |
1991-05-28 |
Robert N. Compton |
A high brilliance mass selected (Z-selected) negative ion and neutral beam source having good energy resolution. The source is based upon laser resonance ionization of atoms or molecules in a small gaseous medium followed by charge exchange through an alkali oven. The source is capable of producing microampere beams of an extremely wide variety of negative ions, and milliampere beams when operated in the pulsed mode. |
119 |
Spherical projectile for electromagnetic acceleration |
US96294 |
1987-09-08 |
US5007348A |
1991-04-16 |
George T. Pinson |
An electrically charged spherical projectile for use in acceleration devices such as betatrons, cyclotrons, linear accelerators and similar devices. The spherical projectile having a large hollow or low mass filled spherical body which can be electrically charged and perform the same functions as an electron or ion. |
120 |
Non coherent photoneutralizer |
US456900 |
1989-12-26 |
US4960990A |
1990-10-02 |
Michael J. Lavan; George R. Edlin; Daniel L. Whitener |
A non-coherent photoneutralizer that has a fluorescent light source for neutralizing a negative ion beam as it is passed through a housing in which the fluorescent light source is mounted. |