首页 / 国际专利分类库 / 物理 / 核物理;核工程 / 未列入其他类目的粒子或电离辐射的处理技术;照射装置;γ射线或X射线显微镜 / 粒子或电离辐射的处理装置,如聚焦或慢化 / .使用电荷交换器件,例如用于束流的电荷中性化或改变其符号(中性粒子束的产生或加速入 H05H3/00)
序号 专利名 申请号 申请日 公开(公告)号 公开(公告)日 发明人
21 A STRIPPING MEMBER, A STRIPPING ASSEMBLY AND A METHOD FOR EXTRACTING A PARTICLE BEAM FROM A CYCLOTRON EP09753971 2009-05-29 EP2196072B9 2012-01-25 COLARD VINCENT
The present invention relates to a stripping member for stripping electrons off a negatively charged particle beam at the periphery of a cyclotron for extracting a particle beam out of said cyclotron, said stripping member comprising a first stripper foil adapted for being located at the periphery of said cyclotron so that said particle beam passes through said first stripper foil, characterized in that it comprises a second stripper foil adapted for being located side-by-side with the first foil at the periphery of said cyclotron at a more peripheral radius than said first stripper foil so that said negatively charged particle beam passes through said second stripper foil when said first stripper foil is damaged.
22 A STRIPPING MEMBER, A STRIPPING ASSEMBLY AND A METHOD FOR EXTRACTING A PARTICLE BEAM FROM A CYCLOTRON EP09753971.2 2009-05-29 EP2196072B1 2011-08-03 COLARD, Vincent
The present invention relates to a stripping member for stripping electrons off a negatively charged particle beam at the periphery of a cyclotron for extracting a particle beam out of said cyclotron, said stripping member comprising a first stripper foil adapted for being located at the periphery of said cyclotron so that said particle beam passes through said first stripper foil, characterized in that it comprises a second stripper foil adapted for being located side-by-side with the first foil at the periphery of said cyclotron at a more peripheral radius than said first stripper foil so that said negatively charged particle beam passes through said second stripper foil when said first stripper foil is damaged.
23 MULTI-AXIS CHARGED PARTICLE CANCER THERAPY METHOD AND APPARATUS EP09750858.4 2009-05-21 EP2283713A2 2011-02-16 Balakin, Vladimir Yegorovich
The invention comprises a multi-axis charged particle irradiation method and apparatus. The multi-axis controls includes separate or independent control of one or more of horizontal position, vertical position, energy control, and intensity control of the charged particle irradiation beam. Optionally, the charged particle beam is additionally controlled in terms of timing. Timing is coordinated with patient respiration and/or patient rotational positioning. Combined, the system allows multi-axis and multi-field charged particle irradiation of tumors yielding precise and accurate irradiation dosages to a tumor with distribution of harmful proximal distal energy about the tumor.
24 X-RAY METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM EP09750857.6 2009-05-21 EP2283712A2 2011-02-16 Balakin, Vladimir Yegorovich
The invention comprises an X-ray method and apparatus used in conjunction with charged particle radiation therapy of cancerous tumors. The system uses an X-ray beam that lies in substantially the same path as a charged particle beam path of a particle beam cancer therapy system, has an elongated lifetime, and/or that is synchronized with patient respiration. The system creates an electron beam that strikes an X-ray generation source where the X-ray generation source is located proximate to the proton beam path. By generating the X-rays near the proton beam path, an X-ray path that is essentially the proton beam path is created. Using the generated X-rays, the system collects X-ray images of a localized body tissue region about a cancerous tumor, which are usable for: fine tuning body alignment relative to the proton beam path and/or to control the proton beam path to accurately and precisely target the tumor.
25 CHARGED PARTICLE BEAM EXTRACTION METHOD AND APPARATUS USED IN CONJUNCTION WITH A CHARGED PARTICLE CANCER THERAPY SYSTEM EP09750859.2 2009-05-21 EP2283705A2 2011-02-16 Balakin, Vladimir Yegorovich
The invention comprises a charged particle beam extraction method and apparatus used in conjunction with charged particle beam radiation therapy of cancerous tumors. The system uses a radio-frequency cavity system to induce betatron oscillation of a charged particle stream. Sufficient amplitude modulation of the charged particle stream causes the charged particle stream to hit a material, such as a foil. The foil decreases the energy of the charged particle stream, which decreases a radius of curvature of the charged particle stream in the synchrotron sufficiently to allow a physical separation of the reduced energy charged particle stream from the original charged particle stream. The physically separated charged particle stream is then removed from the system by use of an applied field and deflector.
26 Charge exchange device EP10160919.6 2010-04-23 EP2244538A2 2010-10-27 Hasegawa, Masataka; Saito, Takeshi; Suenaga, Kazutomo; Iljima, Sumio

A charge exchange member having a new function is provided, which solves problems of fragility of a diamond thin film and a low electron density of a CNTS that are challenges of a charge exchange foil. The present invention relates to a charge exchange device comprising a diamond thin film 11 and a non-woven carbon nanotube sheet 12, in which the diamond thin film 11 is deposited on the non-woven carbon nanotube sheet 12.

27 APPARATUS FOR NEUTRALIZING CHARGED BODY. EP92916221 1992-07-24 EP0597103A4 1994-08-17 OHMI TADAHIRO - - KOMEGABUKURO; INABA HITOSHI - NAKAMACHI -CHO
An apparatus which can neutralize charged bodies such as processed substrates for semiconductor devices and for flat display, free from electromagnetic noise, impurity contamination, and residual potentials. To process in a prescribed way a wafer (5) to be processed, the wafer (5) is, for example, moved from a pretreatment chamber (2) to a low pressure reaction chamber (3). In this case, a gas, which does not react on the wafer, such as nitrogen and argon, is introduced into the pretreatment chamber (2), and is kept under a predetermined pressure by a vacuum pump (15). Then, ultraviolet rays are projected in the pretreatment chamber (2) from an ultraviolet rays lamp (11) constituting a means for generating neutralization charges, and positive and negative floating charged particles (electrons and positive ions) are generated by exciting the atmosphere in the chamber (2). Since the charges are removed by projecting the ultraviolet rays from the outsides of a case (1) and the case (2) and moreover in a non- contact way, no electromagnetic noise is generated and the residual potentials are vanished too.
28 Ion neutralizer EP92106796.3 1992-04-21 EP0510581A3 1993-04-28 Nagai, Kazutoshi; Satake Tohru; Hayashi, Hideaki; Hatada, Yoshio

An ion neutralizer which neutralizes electric charges on ions and produces a fast atom beam in an ultra-high vacuum comprising: an ion source disposed in a vacuum container; a hollow container disposed in the vacuum container, the hollow container being closed at both ends thereof except for an ion beam entrance hole provided in one end portion thereof and a fast atom beam exit hole provided in the other end portion thereof; a metal vapor generating source comprising a filament wound with a fine wire or ribbon of a metal selected from titanium, magnesium and aluminum, the filament being disposed in the hollow container in such a manner as to surround an axis connecting the ion beam entrance hole and the fast atom beam exit hole; a vacuum pump connected to the vacuum container; and a filament heating power supply disposed outside the vacuum container and the hollow container and connected to the filament.

29 Plasma processing system and method EP92109655.8 1992-06-09 EP0522296A3 1993-03-10 Kinoshita, Osamu; Murakawa, Shigemi; Kubota, Naoki

An etching system comprises a plasma chamber (20), a charge exchange chamber (22) and a processing chamber (24), and the charge exchange chamber and the processing chamber are partitioned with a porous plate (34) provided with a number of fine linear microchannel holes (34A). Positive ions generated by the plasma chamber are accelerated by an accelerating electrode (26) in the charge exchange chamber, charge-exchanged and introduced as neutral particles into the processing chamber through the microchannel holes. Neutral particles are vertically entered into an object (S) to be processed as neutral particle beams of which directions are completely aligned by the microchannel holes. Even an object with a large area can be etched with high accuracy by making the porous plate in a size which meets the object. Thus, the plasma processing only with neutral particles is carried out with high accuracy even when the area of the object is large.

30 Beam direct converter EP83304842.4 1983-08-22 EP0110504B1 1989-02-01 Hashimoto, Kiyoshi; Sugawara, Toru
31 REDUCTION OF SURFACE AND EMBEDDED SUBSTRATE CHARGE BY CONTROLLED EXPOSURE TO VACUUM ULTRAVIOLET (VUV) LIGHT IN LOW-OXYGEN ENVIRONMENT US15258397 2016-09-07 US20180068754A1 2018-03-08 Rafal Dylewicz; Reinhold Schwazenbacher; Xia Man; Kenichi Sano; David Lou; Milan Pliska
A system for reducing surface and embedded charge in a substrate includes a substrate support configured to support a substrate. A vacuum ultraviolet (VUV) assembly is arranged adjacent to the substrate and includes a housing and a VUV lamp that is connected to the housing and that generates and directs ultraviolet (UV) light at the substrate. A movement device is configured to move at least one of the VUV assembly and the substrate support during exposure of the substrate to the UV light to reduce surface and embedded charge in the substrate.
32 CHARGE STRIPPING FILM FOR ION BEAM US15783242 2017-10-13 US20180049306A1 2018-02-15 Mutsuaki Murakami; Masamitsu Tachibana; Atsushi Tatami
A charge stripping film for an ion beam includes a single layer body of a graphitic film having a carbon component of at least 96 at % and a thermal conductivity in a film surface direction at 25° C. of at least 800 W/mK, or a laminated body of the graphitic film. The charge stripping film has a thickness of 100 nm to 10 μm, a tensile strength in a film surface direction of at least 5 MPa, a coefficient of thermal expansion in the film surface direction of at least 1×10−5/K, and an area of at least 4 cm2.
33 Particle Beam Treatment US15321146 2015-06-26 US20170154760A1 2017-06-01 Stewart Freeman; Richard Shanks
A method of treating a particle beam is disclosed, of interest in particular for mass spectrometry for 14C. A particle beam including positive ions is passed through a charge exchange cell containing a target gas. The target gas is electrically insulating at room temperature and pressure. At least some of the positive ions of the particle beam are converted to negative ions by interaction with the target gas. The particle beam incident at the charge exchange cell includes molecules and/or molecular ions which interact with the target gas to reduce the concentration of molecules as a result of repeated collisions with particles of the target gas. A corresponding mass spectrometry system is also disclosed.
34 Multi-axis charged particle cancer therapy method and apparatus US12994120 2009-05-21 US08901509B2 2014-12-02 Vladimir Yegorovich Balakin
The invention comprises a multi-axis charged particle irradiation method and apparatus. The multi-axis controls includes separate or independent control of one or more of horizontal position, vertical position, energy control, and intensity control of the charged particle irradiation beam. Optionally, the charged particle beam is additionally controlled in terms of timing. Timing is coordinated with patient respiration and/or patient rotational positioning. Combined, the system allows multi-axis and multi-field charged particle irradiation of tumors yielding precise and accurate irradiation dosages to a tumor with distribution of harmful proximal distal energy about the tumor.
35 Multi-field charged particle cancer therapy method and apparatus US12994130 2009-05-21 US08766217B2 2014-07-01 Vladimir Yegorovich Balakin
The invention comprises a multi-field charged particle irradiation method and apparatus. Radiation is delivered through an entry point into the tumor and Bragg peak energy is targeted to a distal or far side of the tumor from an ingress point. Delivering Bragg peak energy to the distal side of the tumor from the ingress point is repeated from multiple rotational directions. Preferably, beam intensity is proportional to radiation dose delivery efficiency. Preferably, the charged particle therapy is timed to patient respiration via control of charged particle beam injection, acceleration, extraction, and/or targeting methods and apparatus. Optionally, multi-axis control of the charged particle beam is used simultaneously with the multi-field irradiation. Combined, the system allows multi-field and multi-axis charged particle irradiation of tumors yielding precise and accurate irradiation dosages to a tumor with distribution of harmful irradiation energy about the tumor.
36 RADIATION IMAGING APPARATUS, RADIATION IMAGING SYSTEM, METHOD OF CONTROLLING RADIATION IMAGING APPARATUS AND STORAGE MEDIUM US13860762 2013-04-11 US20130279656A1 2013-10-24 Tadahiko Iijima
A radiation imaging apparatus comprising: an obtaining unit configured to obtain rotation control information of a positive electrode of a rotating positive electrode type radiation generating apparatus; an accumulation unit configured to accumulate charge; a readout unit configured to read out the charge based on the rotation control information while a rotational speed of the positive electrode is constant; and an image generating unit configured to generate an image by reading out the charge.
37 SYSTEM AND METHOD OF ION NEUTRALIZATION WITH MULTIPLE-ZONED PLASMA FLOOD GUN US13439124 2012-04-04 US20130264498A1 2013-10-10 Chun-Lin CHANG; Chih-Hing HWANG; Wen-Yu KU; Chi-Ming YANG; Chin-Hsiang LIN
An apparatus comprises a plasma flood gun for neutralizing a positive charge buildup on a semiconductor wafer during a process of ion implantation using an ion beam. The plasma flood gun comprises more than two arc chambers, wherein each arc chamber is configured to generate and release electrons into the ion beam in a respective zone adjacent to the semiconductor wafer.
38 APPARATUS AND METHOD FOR CHARGE NEUTRALIZATION DURING PROCESSING OF A WORKPIECE US13313078 2011-12-07 US20130146790A1 2013-06-13 Peter F. Kurunczi; Christopher J. Leavitt; Daniel Distaso; Timothy J. Miller
A processing system may include a plasma source for providing a plasma and a workpiece holder arranged to receive ions from the plasma. The processing system may further include a pulsed bias circuit electrically coupled to the plasma source and operable to switch a bias voltage supplied to the plasma source between a high voltage state in which the plasma source is biased positively with respect to ground and a low voltage state in which the plasma source is biased negatively with respect to the ground.
39 CHARGED PARTICLE CANCER THERAPY PATIENT POSITIONING METHOD AND APPARATUS US12994125 2009-05-21 US20110218430A1 2011-09-08 Vladimir Yegorovich Balakin
The invention comprises a patient positioning and/or repositioning system, such as a laying, semi-vertical, or seated patient positioning, alignment, and/or control method and apparatus used in conjunction with multi-axis charged particle radiation therapy. Patient positioning constraints optionally include one or more of: a seat support, a back support, a head support, an arm support, a knee support, and a foot support. One or more of the positioning constraints are preferably movable and/or under computer control for rapid positioning, repositioning, and/or immobilization of the patient. The system optionally uses an X-ray beam that lies in substantially the same path as a proton beam path of a particle beam cancer therapy system. The generated image is usable for: fine tuning body alignment relative to the proton beam path, to control the charged particle beam path to accurately and precisely target the tumor, and/or in system verification and validation.
40 Extreme ultra violet light source apparatus US11976276 2007-10-23 US07705333B2 2010-04-27 Hiroshi Komori; Akira Endo
In an extreme ultra violet light source apparatus that exhausts debris including fast ions and neutral particles by the effect of a magnetic field, neutral particles emitted from plasma are efficiently ionized. The extreme ultra violet light source apparatus includes a plasma generating unit that generates plasma, that radiates at least extreme ultra violet light, through pulse operation; collective optics that collects the extreme ultra violet light radiated from the plasma; a microwave generating unit that radiates microwave through pulse operation into a space in which a magnetic field is formed to cause electron cyclotron resonance, and thereby ionizes neutral particles emitted from the plasma; a magnetic field forming unit that forms the magnetic field and a magnetic field for trapping at least ionized particles; and a control unit that synchronously controls at least the plasma generating unit and the microwave generating unit.
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