| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | 烧蚀层、感光性树脂结构体、使用了该感光性树脂结构体的凸版印刷版的制造方法 | CN200980151487.0 | 2009-12-18 | CN102257434B | 2013-04-24 | 矶知里 |
| 使用具备用于凸版印刷用感光性树脂的烧蚀层的感光性树脂结构体，对前述烧蚀层照射红外线而进行图案描绘，对前述感光性树脂层照射紫外线而进行图案曝光，利用显影液去除前述烧蚀层及未曝光的感光性树脂层，从而制造凸版印刷版，所述烧蚀层是能利用红外线进行加工的层，并含有阴离子性聚合物。 | ||||||
| 2 | 烧蚀层、感光性树脂结构体、使用了该感光性树脂结构体的凸版印刷版的制造方法 | CN200980151487.0 | 2009-12-18 | CN102257434A | 2011-11-23 | 矶知里 |
| 使用具备用于凸版印刷用感光性树脂的烧蚀层的感光性树脂结构体，对前述烧蚀层照射红外线而进行图案描绘，对前述感光性树脂层照射紫外线而进行图案曝光，利用显影液去除前述烧蚀层及未曝光的感光性树脂层，从而制造凸版印刷版，所述烧蚀层是能利用红外线进行加工的层，并含有阴离子性聚合物。 | ||||||
| 3 | Method for preparing relief printing form | US13527936 | 2012-06-20 | US09063437B2 | 2015-06-23 | Michael Lee Rudolph |
| A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas. | ||||||
| 4 | Device and method for preparing relief printing form | US12401106 | 2009-03-10 | US08241835B2 | 2012-08-14 | Michael Lee Rudolph; Joseph Anthony Perrotto; Dhiren V. Patel; Robert A. McMillen |
| A relief printing form is prepared from a photosensitive element in an environment having controlled oxygen concentration during exposure to actinic radiation. An in situ mask is formed on a photosensitive element, the element is exposed to actinic radiation through the in-situ mask in an environment having an inert gas and a concentration of oxygen between 190,000 and 100 ppm, and the exposed element is treated to form the relief printing form having a pattern of raised surface areas. | ||||||
| 5 | Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor | US14812485 | 2015-07-29 | US09713919B2 | 2017-07-25 | Robert M Blomquist; John Stephen Locke; Chi W Chiu |
| The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer. | ||||||
| 6 | Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure | US13133289 | 2009-12-18 | US08883399B2 | 2014-11-11 | Chisato Iso |
| A photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing the pattern by irradiating the photosensitive resin layer with ultraviolet radiation; and removing the ablation layer and unexposed photosensitive resin layer with a developer. | ||||||
| 7 | PRINTING FORM PRECURSOR HAVING ELASTOMERIC CAP LAYER AND A METHOD OF PREPARING A PRINTING FORM FROM THE PRECURSOR | US13788589 | 2013-03-07 | US20130255513A1 | 2013-10-03 | ROBERT M. BLOMQUIST; John Stephen Locke; Chi W. Chiu |
| The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer. | ||||||
| 8 | ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE | US13133289 | 2009-12-18 | US20110275016A1 | 2011-11-10 | Chisato Iso |
| Using a photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing the pattern by irradiating the photosensitive resin layer with ultraviolet radiation; and removing the ablation layer and unexposed photosensitive resin layer with a developer. | ||||||
| 9 | Ablation layer, the photosensitive resin construct, method for producing a letterpress printing plate using the photosensitive resin construct | JP2013024700 | 2013-02-12 | JP5525074B2 | 2014-06-18 | 知里 磯 |
| 10 | PRINTING FORM PRECURSOR HAVING ELASTOMERIC CAP LAYER AND A METHOD OF PREPARING A PRINTING FORM FROM THE PRECURSOR | EP13714774.0 | 2013-03-15 | EP2831672A2 | 2015-02-04 | BLOMQUIST, Robert, M.; LOCKE, John, Stephen; CHIU, Chi, W. |
| The invention pertains to a printing form precursor, a method of preparing a printing form from the precursor, and a process of preparing the precursor. The printing form precursor includes a photopolymerizable layer, an elastomeric layer having at least an elastomeric binder and particulate, and an actinic radiation opaque material on, adjacent, or disposed above the elastomeric layer opposite the photopolymerizable layer. The particulate is selected from specific material particles having an average diameter from 1 to 10 micron and a refractive index that is within 0.04 units of an index of refraction of the composition forming the elastomeric layer. | ||||||
| 11 | エラストマーキャップ層を有する印刷版原版、および原版からの印刷版の製造方法 | JP2015503319 | 2013-03-15 | JP2015514232A | 2015-05-18 | エム．ブロムクイスト ロバート; スティーブン ロック ジョン; ダブリュ．シュウ チー |
| 本発明は、印刷版原版、原版から印刷版を製造する方法、および原版の製造方法に関する。印刷版原版は、光重合性層と、少なくともエラストマーバインダーおよび粒子状物質を有するエラストマー層と、光重合性層とは反対側のエラストマー層の上に存在する、隣接する、または上方に配置される化学線不透明材料とを含む。粒子状物質は、平均直径1〜10ミクロンを有しエラストマー層を形成する組成物の屈折率から0.04単位の範囲内である屈折率を有する特殊な材料の粒子から選択される。 | ||||||
| 12 | アブレーション層、感光性樹脂構成体、当該感光性樹脂構成体を用いた凸版印刷版の製造方法 | JP2010542883 | 2009-12-18 | JPWO2010070918A1 | 2012-05-24 | 知里 磯 |
| 赤外線により加工可能な層であり、アニオン性ポリマーを含有する凸版印刷用感光性樹脂用のアブレーション層を具備する感光性樹脂構成体を用い、前記アブレーション層に赤外線を照射してパターン描画し、前記感光性樹脂層に紫外線を照射してパターン露光し、現像液により前記アブレーション層及び未露光の感光性樹脂層を除去し、凸版印刷版を製造する。 | ||||||
| 13 | Ablation layer, the photosensitive resin construct, method for producing a letterpress printing plate using the photosensitive resin construct | JP2010542883 | 2009-12-18 | JP5334996B2 | 2013-11-06 | 知里 磯 |
| Using a photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing the pattern by irradiating the photosensitive resin layer with ultraviolet radiation; and removing the ablation layer and unexposed photosensitive resin layer with a developer. | ||||||
| 14 | Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure | JP2013024700 | 2013-02-12 | JP2013101394A | 2013-05-23 | ISO TOMOSATO |
| PROBLEM TO BE SOLVED: To provide an ablation layer having such properties that: the layer is not wrinkled by moisture absorption in a high humidity environment even after peeling off a cover film stuck to the ablation layer; a portion of the layer that has been removed with a developing solution can be easily dissolved and dispersed; retention or re-adhesion of a washing residue can be effectively prevented; and the layer can be processed with IR rays.SOLUTION: The ablation layer to be used for a photosensitive resin for relief printing can be processed with IR rays and contains an anionic polymer. | ||||||
| 15 | PRINTING FORM PRECURSOR HAVING ELASTOMERIC CAP LAYER AND A METHOD OF PREPARING A PRINTING FORM FROM THE PRECURSOR | EP13714774.0 | 2013-03-15 | EP2831672B1 | 2017-09-27 | BLOMQUIST, Robert, M.; LOCKE, John, Stephen; CHIU, Chi, W. |
| 16 | ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE | EP09833225 | 2009-12-18 | EP2381309A4 | 2011-11-02 | ISO CHISATO |
| 17 | ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE | EP09833225.7 | 2009-12-18 | EP2381309B1 | 2013-08-07 | ISO, Chisato |
| 18 | ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE | EP09833225.7 | 2009-12-18 | EP2381309A1 | 2011-10-26 | ISO, Chisato |
Using a photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing the pattern by irradiating the photosensitive resin layer with ultraviolet radiation; and removing the ablation layer and unexposed photosensitive resin layer with a developer. |
||||||
| 19 | Methods of detecting defects in registration controlled photomasks | US14988471 | 2016-01-05 | US10026166B2 | 2018-07-17 | Goo Min Jeong |
| A method of detecting defects of a photomask includes measuring registration errors of the photomask, correcting the measured registration errors using a registration control process with a laser beam, extracting deformation data of the photomask deformed by the registration control process, reflecting the extracted deformation data in defect detection parameters to obtain compensated defect detection parameters, and detecting defects of the photomask using the compensated defect detection parameters. | ||||||
| 20 | METHODS OF DETECTING DEFECTS IN REGISTRATION CONTROLLED PHOTOMASKS | US14988471 | 2016-01-05 | US20170039693A1 | 2017-02-09 | Goo Min JEONG |
| A method of detecting defects of a photomask includes measuring registration errors of the photomask, correcting the measured registration errors using a registration control process with a laser beam, extracting deformation data of the photomask deformed by the registration control process, reflecting the extracted deformation data in defect detection parameters to obtain compensated defect detection parameters, and detecting defects of the photomask using the compensated defect detection parameters. | ||||||
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