| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | 可辐射固化的耐蚀刻喷墨油墨印刷 | CN201380007454.5 | 2013-01-18 | CN104066590A | 2014-09-24 | S.斯梅特; F.祖特曼; P.维米尔施; J.洛库菲尔; A.维勒姆斯 |
| 本发明涉及喷墨印刷在蚀刻过程期间形成保护层的可辐射固化的喷墨油墨的方法，其中所述可辐射固化的喷墨油墨包括至少70重量%的可聚合组合物，基于可辐射固化的喷墨油墨的总重量，其中所述可聚合组合物的氧分数OFR>0.250并且加权可聚合官能度WPF≥0.0050，且其中所述可聚合组合物不含具有烯属双键并且在其分子中包括磷酸酯基团或羧酸基团的可聚合化合物。 | ||||||
| 2 | 可辐射固化的耐蚀刻喷墨油墨印刷 | CN201380007454.5 | 2013-01-18 | CN104066590B | 2015-11-25 | S.斯梅特; F.祖特曼; P.维米尔施; J.洛库菲尔; A.维勒姆斯 |
| 本发明涉及喷墨印刷在蚀刻过程期间形成保护层的可辐射固化的喷墨油墨的方法，其中所述可辐射固化的喷墨油墨包括至少70重量%的可聚合组合物，基于可辐射固化的喷墨油墨的总重量，其中所述可聚合组合物的氧分数OFR>0.250并且加权可聚合官能度WPF≥0.0050，且其中所述可聚合组合物不含具有烯属双键并且在其分子中包括磷酸酯基团或羧酸基团的可聚合化合物。 | ||||||
| 3 | RADIATION CURABLE ETCH RESISTANT INKJET INK PRINTING | US15381161 | 2016-12-16 | US20170096572A1 | 2017-04-06 | Stefaan SMET; Freddy ZUTTERMAN; Peter VERMEERSCH; Johan LOCCUFIER; Ann WILLEMS |
| An inkjet printing radiation curable inkjet ink for forming a protective layer during an etching process includes at least 70 percent by weight of a polymerizable composition based on the total weight of radiation curable inkjet ink, wherein the polymerizable composition has an oxygen fraction OFR>0.250 and a weighted polymerizable functionality WPF≧0.0050, and the polymerizable composition contains no polymerizable compound with an ethylenic double bond and including a phosphoester group or a carboxylic acid group in the molecule thereof. | ||||||
| 4 | Method and Apparatus for Preparing a Screen Printing Screen | US14887673 | 2015-10-20 | US20160039197A1 | 2016-02-11 | Andrew L. Oleson |
| A system or machine is disclosed which takes pre-stretched emulsion coated screens, digitally prints thereon and exposes them before further processing and use in a screen printing machine. | ||||||
| 5 | Method and apparatus for preparing a screen printing screen | US14060172 | 2013-10-22 | US09649837B2 | 2017-05-16 | Andrew L. Oleson |
| A system or machine is disclosed which takes pre-stretched emulsion coated screens, digitally prints thereon and exposes them before further processing and use in a screen printing machine. | ||||||
| 6 | Apparatus including a registration system for preparing a screen printing screen | US14887673 | 2015-10-20 | US09527274B2 | 2016-12-27 | Andrew L. Oleson |
| A system or machine is disclosed which takes pre-stretched emulsion coated screens, digitally prints thereon and exposes them before further processing and use in a screen printing machine. | ||||||
| 7 | Process for producing a photomask on a photopolymeric surface | US13146749 | 2010-01-27 | US09513551B2 | 2016-12-06 | Moshe Frenkel; Yaacov Mazuz; Oleg Berezin; Natalia Ivanova |
| A process is provided for printing a high resolution pattern on a photopolymeric surface. | ||||||
| 8 | Method and Apparatus for Preparing a Screen Printing Screen | US14060172 | 2013-10-22 | US20140261029A1 | 2014-09-18 | Andrew L. Oleson |
| A system or machine is disclosed which takes pre-stretched emulsion coated screens, digitally prints thereon and exposes them before further processing and use in a screen printing machine. | ||||||
| 9 | 金属表面上のエッチレジストパターンの製造方法 | JP2018507595 | 2016-07-27 | JP2018527463A | 2018-09-20 | シュパイスマン、ナバ; フレンケル、モシェ |
| 金属表面上にエッチレジストマスクを形成するための方法および組成物セットが提供される。前記方法は、第1の反応性成分を含む第1の液体組成物を金属表面上に適用してプライマー層を形成するステップと、ノンインパクト印刷プロセスによる像様の印刷により前記プライマー層上に第2の反応性成分を含む第2の液体組成物を適用して所定のパターンに従ってエッチレジストマスクを生成するステップとを含み、前記第2の液体組成物の液滴が前記プライマー層に接触すると、前記第2の反応性成分は液滴を固定化するように前記第1の反応性成分と化学反応を起こすことを特徴とし得る。前記セットは、固定化反応性成分を含む第1の液体組成物と、エッチレジスト反応性成分を含む第2の液体組成物とを含み、前記固定化反応性成分および前記固定化反応性成分は化学反応を起こして水および酸性エッチ溶液に不溶性の二成分材料を形成することができることを特徴とし得る。 【選択図】図1 |
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| 10 | Process for producing a photomask on a photopolymeric surface | EP12193114.1 | 2010-01-27 | EP2562599B1 | 2014-12-10 | Frenkel, Moshe; Mazuz, Yacov; Berezin, Oleg; Ivanova, Natalia |
| 11 | METHODS FOR PRODUCING AN ETCH RESIST PATTERN ON A METALLIC SURFACE | US15751866 | 2016-07-27 | US20180242457A1 | 2018-08-23 | Nava SHPAISMAN; Moshe FRENKEL |
| A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface- activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch resist mask. | ||||||
| 12 | Method and Apparatus for Preparing a Screen Printing Screen | US15440391 | 2017-02-23 | US20170157913A1 | 2017-06-08 | Andrew L. Oleson |
| A system or machine is disclosed which takes pre-stretched emulsion coated screens, digitally prints thereon and exposes them before further processing and use in a screen printing machine. | ||||||
| 13 | Radiation curable etch resistant inkjet ink printing | US14370253 | 2013-01-18 | US09556349B2 | 2017-01-31 | Stefaan Smet; Freddy Zutterman; Peter Vermeersch; Johan Loccufier; Ann Willems |
| An inkjet printing radiation curable inkjet ink for forming a protective layer during an etching process includes at least 70 percent by weight of a polymerizable composition based on the total weight of radiation curable inkjet ink, wherein the polymerizable composition has an oxygen fraction OFR>0.250 and a weighted polymerizable functionality WPF≧0.0050, and the polymerizable composition contains no polymerizable compound with an ethylenic double bond and including a phosphoester group or a carboxylic acid group in the molecule thereof. | ||||||
| 14 | RADIATION CURABLE ETCH RESISTANT INKJET INK PRINTING | US14370253 | 2013-01-18 | US20140363632A1 | 2014-12-11 | Stefaan Smet; Freddy Zutterman; Peter Vermeersch; Johan Loccufier; Ann Willems |
| An inkjet printing radiation curable inkjet ink for forming a protective layer during an etching process includes at least 70 percent by weight of a polymerizable composition based on the total weight of radiation curable inkjet ink, wherein the polymerizable composition has an oxygen fraction OFR>0.250 and a weighted polymerizable functionality WPF≧0.0050, and the polymerizable composition contains no polymerizable compound with an ethylenic double bond and including a phosphoester group or a carboxylic acid group in the molecule thereof. | ||||||
| 15 | PROCESS FOR PRODUCING A PHOTOMASK ON A PHOTOPOLYMERIC SURFACE | US13146749 | 2010-01-27 | US20120045583A1 | 2012-02-23 | Moshe Frenkel; Yaacov Mazuz; Oleg Berezin; Natalia Ivanova |
| A process is provided for printing a high resolution pattern on a photopolymeric surface. | ||||||
| 16 | 소수성 표면 형성방법 | KR1020080099678 | 2008-10-10 | KR1020100040520A | 2010-04-20 | 이택민; 노지환; 조정대; 김동수 |
| PURPOSE: A method for forming a hydrophobic surface is provided to remarkably reduce manufacturing costs while obtaining uniform hydrophobic surface. CONSTITUTION: A method for forming a hydrophobic surface comprises the following steps: a step(S01) preparing a target surface for forming hydrophobicity; a step(S02) printing hydrophobic patterns using ink materials including minute particles on the target surface; and a step(S03) hardening the printed hydrophobic pattern. The hydrophobic pattern comprises: a main pattern which is printed on the object surface in a micrometer size using the ink materials; and a ciliary pattern which is projected on the upper side of the main pattern using minute particles. | ||||||
| 17 | RADIATION CURABLE ETCH RESISTANT INKJET INK PRINTING | EP13700736.5 | 2013-01-18 | EP2809735A1 | 2014-12-10 | SMET, Stefaan; ZUTTERMAN, Freddy; VERMEERSCH, Peter; LOCCUFIER, Johan; WILLEMS, Ann |
| An inkjet printing radiation curable inkjet ink for forming a protective layer during an etching process includes at least 70 percent by weight of a polymerizable composition based on the total weight of radiation curable inkjet ink, wherein the polymerizable composition has an oxygen fraction OFR>0.250 and a weighted polymerizable functionality WPF≧0.0050, and the polymerizable composition contains no polymerizable compound with an ethylenic double bond and including a phosphoester group or a carboxylic acid group in the molecule thereof. | ||||||
| 18 | Process for producing a photomask on a photopolymeric surface | EP12193114.1 | 2010-01-27 | EP2562599A3 | 2013-06-12 | Frenkel, Moshe; Mazuz, Yacov; Berezin, Oleg; Ivanova, Natalia |
A process is provided for printing a high resolution pattern on a photopolymeric surface.
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| 19 | Process for producing a photomask on a photopolymeric surface | EP12193114.1 | 2010-01-27 | EP2562599A2 | 2013-02-27 | Frenkel, Moshe; Mazuz, Yacov; Berezin, Oleg; Ivanova, Natalia |
A process is provided for printing a high resolution pattern on a photopolymeric surface.
|
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| 20 | PROCESS FOR PRODUCING A PHOTOMASK ON A PHOTOPOLYMERIC SURFACE | EP10704601.3 | 2010-01-27 | EP2391924A2 | 2011-12-07 | FRENKEL, Moshe; MAZUZ, Yaacov; BEREZIN, Oleg; IVANOVA, Natalia |
| A process is provided for printing a high resolution pattern on a photopolymeric surface. | ||||||
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