Semiconductor device
专利汇可以提供Semiconductor device专利检索，专利查询，专利分析的服务。并且PURPOSE: To obtain a state of favorable image-formation when preferable arrangements of semiconductor emitter are incorporated into an optical device by forming a light emission end face of each semiconductor emitter at a limited angle and arranging light emission points to be emitted from the above end face on an identical line.
CONSTITUTION: After preparing semiconductor emission elements such as its element like double hetero-structures on a substrate of GaAs 11, a photo mask forms a fanwise pattern where respective light emission end faces are formed so that they are shifted by the angles of θ
1 and θ
2 each other. Since the end faces facing each other and forming Fabry Perot resonance faces are also slidden by the angles θ
1 and θ
2 , such a state permits resonance directions to be shifted by the angles θ
1 and θ
2 and also light emission directions 12a∼12e to be different accordingly. In such a case, the resonance faces are formed as if lights ware emitted from a point P
o or its vicinity that is located at the opposite side of light emission side. As a result, the resonance faces cause emission points 100a∼104a to be arranged nearly on one straight BB' line. This approach helps in correcting the defocusing of the imageformation.
COPYRIGHT: (C)1987,JPO&Japio，下面是Semiconductor device专利的具体信息内容。
| 标题 | 发布/更新时间 | 阅读量 |
|---|---|---|
| 发光器件、光学光谱仪和用于发光器件的下变频膜 | 2020-05-11 | 555 |
| 一种近波长单纤双向光收发一体器件 | 2020-05-12 | 291 |
| 有机发光器件 | 2020-05-12 | 249 |
| 车辆照明和/或信号装置 | 2020-05-11 | 281 |
| 并入射束成形光学器件和射束稳定性的方法和系统 | 2020-05-08 | 503 |
| 一种光发射感应传感装置 | 2020-05-12 | 769 |
| 一种光线控制装置和被动发光像源 | 2020-05-12 | 781 |
| 一种光模块控制装置 | 2020-05-12 | 26 |
| 激光二极管及高速率光发射器件 | 2020-05-08 | 66 |
| 通光件、光发射模组和电子设备 | 2020-05-11 | 771 |
高效检索全球专利专利汇是专利免费检索,专利查询,专利分析-国家发明专利查询检索分析平台，是提供专利分析，专利查询，专利检索等数据服务功能的知识产权数据服务商。
我们的产品包含105个国家的1.26亿组数据，免费查、免费专利分析。
专利汇分析报告产品可以对行业情报数据进行梳理分析，涉及维度包括行业专利基本状况分析、地域分析、技术分析、发明人分析、申请人分析、专利权人分析、失效分析、核心专利分析、法律分析、研发重点分析、企业专利处境分析、技术处境分析、专利寿命分析、企业定位分析、引证分析等超过60个分析角度，系统通过AI智能系统对图表进行解读，只需1分钟，一键生成行业专利分析报告。
