Piezo-resistance pressing device
专利汇可以提供Piezo-resistance pressing device专利检索，专利查询，专利分析的服务。并且PURPOSE:To limit the movement of ions in sealing liquid, to stabilize the depletion layer between the piezo resistor and the substrate and to reduce the variation in the output of the device by setting the potentials of the substrate of the piezo-resistor and the shielding plate at the most positive potential in the circuit. CONSTITUTION:The P type piezo-resistance layer 3 and the ohmic contact region 4 are formed on the surface of the N type semiconductor substrate 2. The sealing liquid is filled between the surface protective film 6 and the shielding plate 5. The surface protective layer 9 may not be formed. The maximum potential in the circuit is applied through a metallized part 8 to the shielding plate 5 and the substrate 2. The P-N junction between the semiconductor substrate region 2 and the piezo-resistors 3a-3d is retained at stable reverse bias, and a sensor bridge 11 is surrounded by a shield plate having the same potential as the substrate. Accordingly, it can limit the movement of the ions existing in the sealing liquid 7, increase the stability of the sensor and improve the S/N ratio thereof.，下面是Piezo-resistance pressing device专利的具体信息内容。
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