Apparatus and method for securing a high vacuum for particle coating process专利检索-真空镀膜表面处理和涂层专利检索查询-专利查询网

Apparatus and method for securing a high vacuum for particle coating process

阅读：518发布：2023-02-12

专利汇可以提供Apparatus and method for securing a high vacuum for particle coating process专利检索，专利查询，专利分析的服务。并且A vacuum coating apparatus is provided with valves wherein the volumes containing the coating material emitter and high-vacuum pump can be isolated from the substrate table to preserve the high vacuum of the system. A wide-throated valve between the coating material emitter and the substrate table permits vacuum sealing of the coating material emitter and high-vacuum pump when the substrate is replaced, throttling of the gases within the volume of the system containing the substrate table to reduce the roughing cycle required to attain the requisite high vacuum, and complete opening between the coating emitter apparatus and substrate table to provide an unobstructed particle path for efficient high-vacuum coating.，下面是Apparatus and method for securing a high vacuum for particle coating process专利的具体信息内容。

权利要求

2. The invention of claim 1 and wherein, said chamber, valve seat, and disc are of circular section.

3. The invention of claim 1 and including valve means between said molecular pump means and said chamber for sealing said molecular pump means from said emitter portion.

4. The invention of claim 1 and wherein said first moving means includes: an arm connected to said disc at one end and to said housing at said opposite end; and, means for pivotally moving said arm with respect to said housing to move said disc between said first and second positions.

5. A process for evacuating a first portion of a vacuum coating chamber by a molecular pump communicated to a second portion of said vacuum coating chamber, said molecular pump operable only below a predetermined gas pressure limit maintained within said second portion, said processing comprising the steps of: providing a valve disc and seat intermediate said chamber ends, said seat defining an opening substantially coextensive with the intermediate section of said chamber; seating said disc on said seat to seal said substrate portion of said chamber from said molecular pump; evacuating said substrate portion of said chamber to a pressure in the range between said predetermined pressure limit and twice said predetermined pressure limit; lifting said disc overlying said seat to permit throttling molecular conductance of gas within said substrate portion to said pump portion at a rate wherein said molecular pump is not swamped; and, moving disc clear of said seat after said throttling has substantially equilibrated gas within said chamber portions.

6. The proceSs of claim 5 and wherein, said molecular pump is an ion pump and said evacuating step evacuates said chamber to a pressure limit between 50 and 100 microns of mercury gas pressure.

7. The process of claim 5 and wherein, said molecular pump is a diffusion pump and said evacuating step evacuates said chamber to a pressure range between 100 and 200 microns of mercury gas pressure.

8. In a vacuum coating chamber having a first portion for mounting a substrate and a second portion for mounting a coating material emitter and molecular pump, and means for vacuum sealing said substrate mounting from said coating emitter and molecular pump therebetween, the improvement in said vacuum sealing means comprising: a valve seat attached to the sidewalls of said chamber intermediate said substrate portion and coating material emitter portion, said seat defining aperture substantially coextensive with the section of said chamber; a valve disc configured for engagement with said seat; a sealed housing adjoining said seat, communicated with said chamber and extending outwardly of said chamber for receiving said disc clear of said seat; first disc moving means for moving said disc between a first position overlying said seat and a second position within said housing clear of said seat; and, second disc moving means for moving said disc when overlying said seat towards and away from said seat between a first position where said disc on said seat seals said emitter portion from said substrate portion and a second position where disc provides throttled molecular conductance between substrate portion and said emitter portion.

9. Apparatus according to claim 8 and wherein, said second disc moving means includes first biasing means for continuously biasing said disc away from said seat to said throttling position and second biasing means for overcoming said first biasing means to seat said disc.

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Apparatus and method for securing a high vacuum for particle coating process

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