High vacuum ion plating apparatus
专利汇可以提供High vacuum ion plating apparatus专利检索，专利查询，专利分析的服务。并且PURPOSE:To form a film with good quality by maitaining the discharge of a titled apparatus stably by a mechanism wherein DC or AC current is applied to an accerelating electrode in order to take out an ionizing gas or electron independently or at the sane time from a plasma generator into vaccum atmosphere. CONSTITUTION:An inert or an active gas is introduced from a gas introducing port 10 to generate plasma by a plasma generator 7 and positive or negative ion or electron taken out from the said plasma by an accerelating electrode 9 is advanced to the vicinity of an evaporating sourse 2 and a discharge electrode 5 to maintain a discharge electrode 5 in a remarkably dischargeable condition. Therefore, even if high vacuum condition is maintained within a vocuum tank 1, sufficiently stabilized high frequency electric discharge is generated and metal or dielectric substance evaporated from an evaporating sourse 2 is effectively ionized to obtain a film with god quality. If positive or negative DC voltage is applied to an electric sourse 9, negative ionized gas and electron or positive ion is taken out and, if AC voltage is applied, positive ion and electron or negative ion is mutually tanken out.，下面是High vacuum ion plating apparatus专利的具体信息内容。
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