High vacuum ion plating apparatus
专利汇可以提供High vacuum ion plating apparatus专利检索，专利查询，专利分析的服务。并且PURPOSE:To form a strong film of dielectric substance or metal to a relatively low temperature substrate plate by a mechanism wherein, in a high vaccum vapor depositing chamber, in auxiliary electrode is provided between an evaporating sourse and a supporting plate for a substrate plate and high frequency voltage is applied to the said electrode. CONSTITUTION:A vacuum tank 1 is maintained to high vacuum degree of below 5X10 torr. Between an evaporating sourse 3 and a supporting plate 6 for a substrate plate capable of applying DC or AC voltage arranged in a tank 1 in an opposed manner, an auxiliary electrode 4 is provided so as to be able to apply high frequency voltage from a high frequency electric sourse 5 to the auxiliary electrode 4. When a substrate plate is metal, an electric sourse 7 may by negative DC electric sourse and, when a substrate plate is a dielectric substance, AC voltage or relatively low DC voltage is applied to a supporting plate 6 for a substrate plate. When high frequency voltage is applied to an auxiliary electrode 4, even if an evaporating sourse 3 is metal or dielectric substance, evaporated substance is effectively deposited to an ionized substrate plate and adhesivity and strength of a deposited membrane is remarkably enhanced.，下面是High vacuum ion plating apparatus专利的具体信息内容。
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