Developing method of photosensitive resin
专利汇可以提供Developing method of photosensitive resin专利检索，专利查询，专利分析的服务。并且PURPOSE:To obtain a uniformly developed pattern inside a substrate with accuracy by placing a ring at a position near the periphery of the substrate and away from the substrate and dropping a developer into the ring. CONSTITUTION:Semiconductor substrate 12 with mask exposable resin 13 coated on the surface is set on wafer chuck 11, and ring 14 is placed near the periphery of substrate 12 at interval (x). The inside of ring 14 is about equal to the periphery of substrate 12 in size, and interval (x) between substrate 12 and ring 14 is adjusted to such an extent that solvent does not flow out of substrate 12 owing to the surface tension, e.g., about 3-7mm.. A developing solvent is dropped from nozzle 15. Since dropped solvent 16 stays inside ring 14, a developed pattern can be formed uniformly with accuracy.，下面是Developing method of photosensitive resin专利的具体信息内容。
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