Coating of resist
专利汇可以提供Coating of resist专利检索，专利查询，专利分析的服务。并且PURPOSE:To form the high viscosity resist in a desired thickness by providing a wafer chuck for fixing a semiconductor wafer to the end of a rotary shaft, an outer column having an inserting cylinder of the rotary shaft and an inner column having a wafer inserting inlet, forming the upper end of the inner column flat and approaching the end of the inserting cylinder to the wafer. CONSTITUTION:In the resist coating unit for coating the resist on the surface of the semiconductor wafer, a wafer chuck is constructed by providing the inserting cylinder 11 annularly projecting toward the interior of the column at the bottom center of the outer column 10, inserting the rotary shaft 12 into the inserting cylinder 11, and arranging an adsorbing plate 14 to which the wafer 13 is fixed at the end of the rotary shaft. The inner column 17 having the wafer inserting inlet 16 is provided on the upper end surface in contact with the inside surface of the outer column 10. Thus, the resist is adhered from a nozzle to the wafer, and when the rotary shaft is rotated, it can prevent the resist reflecting phenomenon and obtain the resist of desired thickness having high viscosity.，下面是Coating of resist专利的具体信息内容。
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| 晶片的生成方法 | 2020-05-11 | 150 |
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