Electron beam lithography equipment
专利汇可以提供Electron beam lithography equipment专利检索，专利查询，专利分析的服务。并且PURPOSE: To enable drawing at high speed with optimum accuracy at every figure by recognizing the accuracy of drawing in response to the kinds of the figures in a device preparing the pattern-data of an input to an electron beam lithography equipment and giving the pattern-data a function adding an index displaying the accuracy of drawing.
CONSTITUTION: A pattern-data production unit 1 for an electronic computer determines the accuracy of drawing in response to the kinds of figures to be drawn and prepares pattern-data in forms in which indices displaying accuracy are added to figure data, and a beam density-distribution measuring device 2 records measured density distribution information to a memory storage 3. A soft-ware 4 determining maximum beam size determines maximum beam size from the indices of accuracy added to the figure data and the beam density- distribution information, and a pattern-data resolution device 5 resolves pattern data into singly irradiate able figure groups of maximum beam size or less. An electron optic system controller 6 controls a beam forming apparatus 9 for electron beams generated from an electron gun 7 and a deflection system 10, and projects electron beams having the same cross section as the resolution fugures to a substrate 11.
COPYRIGHT: (C)1987,JPO&Japio，下面是Electron beam lithography equipment专利的具体信息内容。
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