| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 261 | LASER PROBE TIP FIBER CAP CLEANING | US13326826 | 2011-12-15 | US20120152275A1 | 2012-06-21 | Wen-Jui Ray Chia; Meiling Wu; Ming Ko |
| In a method of cleaning a fiber cap of a laser probe tip, a glass fiber comprising a cap body having an internal cavity and an opening to the cavity at a proximal end is provided. A particulate collecting member is also provided. An electrical charge is applied to the particulate collecting member. A distal end of the particulate collecting member is then inserted through the opening and into the cavity of the fiber cap. Particles located within the cavity are attracted to the particulate collecting member. The attracted particles attach to the particulate collecting member. The particulate collecting member is then removed from the cavity. | ||||||
| 262 | ELECTROSTATIC DUST COLLECTOR | US13383954 | 2010-07-12 | US20120110756A1 | 2012-05-10 | Karl-Ludwig Gibis; Mike Kosub; Thomas Leibfried; Christoph Herold |
| Electrostatic dust collector comprising a first (1) and a second electrode (2), a voltage source (3) for applying a voltage between the two electrodes (1, 2), and a connection to ground (2a) is provided. The first electrode (1) and the second electrode (2) form a dust collection device, the first electrode (1) being positively charged and the second electrode (2) being negatively charged. | ||||||
| 263 | System and method for removing particles in semiconductor manufacturing | US12885630 | 2010-09-20 | US08046860B2 | 2011-11-01 | Chen-Yuan Hsia; Chang-Cheng Hung; Chi-Lun Lu; Shih-Ming Chang; Wen-Chuan Wang; Yen-Bin Huang; Ching-Yu Chang; Chin-Hsiang Lin |
| A system for semiconductor wafer manufacturing, comprises a chamber process path for processing the wafer, and a device operable to remove particles from the wafer by electrostatic and electromagnetic methodologies wherein the device is installed in the chamber process path. | ||||||
| 264 | SYSTEM AND METHOD FOR REMOVING PARTICLES IN SEMICONDUCTOR MANUFACTURING | US12885630 | 2010-09-20 | US20110005010A1 | 2011-01-13 | Chen-Yuan Hsia; Chang-Cheng Hung; Chi-Lun Lu; Shih-Ming Chang; Wen-Chuan Wang; Yen-Bin Huang; Ching-Yu Chang; Chin-Hsiang Lin |
| A system for semiconductor wafer manufacturing, comprises a chamber process path for processing the wafer, and a device operable to remove particles from the wafer by electrostatic and electromagnetic methodologies wherein the device is installed in the chamber process path. | ||||||
| 265 | PORTABLE DUSTING TOOL | US12756444 | 2010-04-08 | US20100186771A1 | 2010-07-29 | Fariborz Rahbar-Dehghan |
| There is provided a non-scrubbing dusting tool for cleaning the exposed surface of a digital camera sensor lens in a recessed digital camera sensor chamber. The dusting tool comprises a dust brush having an elongated shank with a tuft of bristles having electrostatic charge built up therein at one end, and a handle at the other end. The tuft of bristles is V-shape and its free end tips are bevelled, for best performance. The duster is sized to adjustably fit inside the digital camera sensor chamber in such a fashion that the bristles leading edge tips will be able to reach all of the exposed surface of the camera sensor lens while avoiding contaminating contact with the camera sensor chamber. In an operative sensor lens cleaning condition of the dusting tool, the dust brush remains motionless relative to the handle while the dusting tool bristles leading edge tips are manually swept over the camera sensor lens to be cleaned. When the dusting tool is not in use, a rotating motor may spin the dust brush so that the bristles fan out under centrifugal force, so as to remove dust collected by the bristles during cleaning operations. | ||||||
| 266 | VACUUM EXHAUST METHOD AND A SUBSTRATE PROCESSING APPARATUS THEREFOR | US12606569 | 2009-10-27 | US20100104760A1 | 2010-04-29 | Hidefumi MATSUI; Tsuyoshi Moriya; Nobuyuki Nagayama |
| A vacuum exhaust method of a substrate processing apparatus, after opening to the atmosphere, depressurizes a vacuum processing chamber having therein a mounting table for mounting a target substrate thereon. The vacuum exhaust method includes covering a surface of the mounting table with a protection member; sealing the vacuum processing chamber; vacuum evacuating the sealed vacuum processing chamber; and adsorbing at least one of foreign substances and out-gases by the protection member. | ||||||
| 267 | Walk-Up Workstation Employing Ionizing Air Nozzles and Insulating Panels | US12180928 | 2008-07-28 | US20100017977A1 | 2010-01-28 | Roger ROBIDOUX |
| A walk-up, user accessible cleaning workstation having a sensor and ionization nozzle arranged on a frame. The frame mounts the sensor in a fixed position to the nozzle in operative proximity to a cleaning area. The frame partially encloses the nozzle's electrode. The sensor detects manual workpiece placement into the cleaning area to open the gas valve and activate the power supply. The panel deflects dust flying off the workpiece from reaching the user's face. The workstation improves safety in the cleaning and destaticizing of ophthalmic lenses. | ||||||
| 268 | Method for Protecting Substrate | US12086375 | 2006-12-07 | US20090267015A1 | 2009-10-29 | Shiro Ogata |
| The present invention provides a novel method for preventing or reducing color degradation or color change of a substrate over time, and is characterized by arranging at least one positively-charged substance selected from the group consisting of (1) a positive ion; (2) a conductor or dielectric having a positive charge; and (3) a composite formed from a conductor and a dielectric or a semiconductor, on a surface of a substrate, and arranging an insulating organic or inorganic substance on the aforementioned positively-charged substance. | ||||||
| 269 | Apparatus for removing foreign material from substrate and method for removing foreign material from substrate | US11988514 | 2006-07-11 | US20090250077A1 | 2009-10-08 | Riichiro Harano; Yoshiaki Tatsumi; Kinya Miyashita; Hiroshi Fujisawa |
| Provided are an apparatus for and a method of removing foreign materials from a substrate which reliably remove the foreign materials, eliminate a chance of redeposition of the foreign materials, and are applicable even to large-size substrates. The apparatus for removing foreign materials includes electrostatic chucks (2, 3) forming a substrate chucking surface (4) to which the substrate (1) is attracted; a resin sheet supplying means (9) for supplying a resin sheet (5) to the substrate chucking surface (4); resin sheet collecting means (13) for collecting the supplied resin sheet (5); and a substrate transfer means for transferring the substrate (1). The substrate (1) supplied to the electrostatic chucks (2, 3) by the substrate transfer means is attracted to the substrate chucking surface (4) through the resin sheet (5), and a foreign material (22) deposited on a side of the substrate chucking surface (4) of the substrate (1) is transferred onto the resin sheet (5) and removed. | ||||||
| 270 | Method for Protecting Substrate | US12223723 | 2007-02-01 | US20090061104A1 | 2009-03-05 | Shiro Ogata |
| The present invention has an objective to provide a novel method for preventing or reducing color degradation or color change of a substrate over time, and thereby, protecting the substrate, and is characterized by arranging a positively-charged substance on a surface of a substrate or in a surface layer of the substrate. | ||||||
| 271 | Infeed Device for Dedusting Apparatus | US11762906 | 2007-06-14 | US20080307603A1 | 2008-12-18 | Heinz Schneider; Paul Wagner; John Moyer |
| An infeed device provides a configuration that improves the flow of particulate material into a double wash deck dedusting apparatus. The infeed device is formed with a circular inlet opening, an oval-shaped discharge opening and step sides interconnecting the inlet and discharge openings to prevent bridging in particulate material being fed through the infeed device onto the wash decks. The infeed device can be formed as a separate member that can be inserted into the infeed opening of existing dedusters. The oval-shaped discharge opening is substantially smaller transversely than the diameter of the inlet opening, but has a longitudinal length that is equal to the diameter of the inlet opening and equal to the longitudinal length of the wash decks. The joinder of the wash decks is blunted to eliminate a divider edge on which plastic streamers can hang up while being fed to the wash decks. | ||||||
| 272 | Dry Cleaning Apparatus and Method Capable of Cleaning the Cleaning Agent | US11660781 | 2006-05-31 | US20070283980A1 | 2007-12-13 | Youchi Okamoto; Akihiro Fuchigami; Toshiyuki Mutoh; Tomoyasu Hirasawa; Tatsuya Satoh |
| A dry cleaning apparatus which causes cleaning agent to fly in a gas current to impact an object to be cleaned so as to remove extraneous substance attached to the object includes a cleaning tank defining an interior space for accommodating the cleaning agent and the object with the attached extraneous substance, an inflow unit configured to guide a gas current into the cleaning tank through an inlet, an aspiration unit configured to discharge gas from the cleaning tank through an aspiration opening, and a separation unit disposed between the interior space of the cleaning tank and both the inflow unit and the aspiration unit, the separation unit having openings that allow the gas and the extraneous substance to pass through but do not allow the cleaning agent to pass through, wherein the inlet, the aspiration opening, and the separation unit are configured such that relative motion is created between the separation unit and both the inlet and the aspiration opening. | ||||||
| 273 | DUST REMOVER | US11739278 | 2007-04-24 | US20070256258A1 | 2007-11-08 | Makoto TAKAYANAGI |
| A dust remover which comprises a power supply and an electrode applied with voltage by said power supply. The dust attached to the object of dust removal is removed therefrom by bringing the electrode into contact with the object of dust removal or approaching toward the object of dust removal. The object of dust removal is a conductor and/or an insulator. The voltage applied to said electrode is a pulsed voltage of plus and minus or an AC voltage of plus and minus. Or the voltage is a DC voltage having the same polarity with that of electricity with which the dust is charged, or the voltage is a DC voltage having an opposite polarity to that of electricity with which the dust is charged. The object of dust removal includes at least a ball for “Pachinko”, a car body, a printed board, a metal box or a part thereof, a frame for glasses, a plastic lens, a plastic box or a part thereof, a fiber, a wood, a paper box or a part thereof. | ||||||
| 274 | Method of ionized air-rinsing of containers and apparatus therefor | US11403448 | 2006-04-13 | US20070240784A1 | 2007-10-18 | Rei-Young Wu; Richard Schutzenhofer; Anthony Armstrong; Timothy Olsem; Robert Rusher |
| A method and system for cleaning containers being transposed through a container cleaning line, including an open-ended housing, a predetermined container flow path defined by the line of moving containers traversing the enclosure defined by the housing longitudinally, a first set of ionizing air nozzles mounted within the housing for directing ionized compressed air toward the containers in the container flow path, with at least one of the nozzles directing air flow into an open side of each container as it passes the nozzle and a second set of high velocity air nozzles mounted within the housing for directing high velocity compressed air toward the container flow path, the second set of high velocity nozzles being disposed along a direction essentially parallel to the container flow path with at least one of the nozzles flows directing high velocity air flow into the open side of each container as it passes the nozzle. Nozzle guards are provided to prevent contact between the containers and the nozzles. | ||||||
| 275 | Method and apparatus for particle removal | US11543365 | 2006-10-04 | US20070151583A1 | 2007-07-05 | Erik M. Freer; John M. deLarios; Katrina Mikhaylichenko; Michael Ravkin; Mikhail Korolik; Fritz C. Redeker |
| A method and system for cleaning a surface, having particulate matter thereon, of a substrate features impinging upon the surface a jet of a liquid having coupling elements entrained therein. A sufficient drag force is imparted upon the coupling elements to have the same move with respect to the liquid and cause the particulate matter to move with respect to the substrate. | ||||||
| 276 | Process for cleaning large format or giant screen movie screens | US11600632 | 2006-11-16 | US20070113869A1 | 2007-05-24 | Andrew Brown; Michael Quaranto |
| This invention relates to cleaning large format movie screens, such as vinyl screens and painted screens. There are different variations of the basic concept of using a cleaning head, cables, pulleys, an upper mounting bracket and a winch. In one instance a track may be used instead of a cable. The winch is connected to the cleaning head using cables and is used to move the cleaning head vertically across the screen through pulleys and other arrangements. | ||||||
| 277 | Apparatus for contactless cleaning of a conveying element and arrangement for transporting and/or storing of rod-shaped articles with an apparatus for contactless cleaning of a conveying element | US11284847 | 2005-11-23 | US20060107968A1 | 2006-05-25 | Hans-Herbert Schmidt; Knut Tracht |
| The invention concerns an apparatus for the contactless cleaning of a conveying element which is designed to receive rod-shaped articles in the tobacco-processing industry, including at least one ionising element for removing electrostatic charges on the surfaces of the conveying element to be cleaned, at least one rotating compressed-air nozzle for loosening and removing contaminants located on surfaces of the conveying element, and a suction device for extracting the contaminated outgoing air, characterized in that associated with the apparatus is a housing for forming a cleaning chamber at least partially shielded from the environment, whereby the cleaning chamber has an inlet opening and an outlet opening for the conveying element to be cleaned, such that upper side and lower side of the conveying element are surrounded. Furthermore, the invention concerns an arrangement for transporting and/or storing rod-shaped articles with an apparatus for contactless cleaning with the above-mentioned characteristics. | ||||||
| 278 | In-mold forming apparatus, in-mold forming method, in-mold formed article manufacturing method, and dust collector | US11251826 | 2005-10-18 | US20060082019A1 | 2006-04-20 | Yoshinori Kairiku; Noboru Koike |
| An in-mold forming apparatus including a first mold and a second mold for injection molding and a film feeding mechanism for feeding in-mold foil between the first mold and the second mold. A transfer foil is formed on the in-mold foil. The in-mold forming apparatus further includes a mold closing mechanism for closing the first mold and the second mold, thereby to fix the in-mold foil inside a cavity formed between the first mold and the second mold, a resin injection forming mechanism for injecting fused resin into the cavity, thereby to unit the transfer foil formed on the in-mold foil with the resin, and a charger arranged in the neighborhood of at least one of the first mold, the second mold, and the in-mold foil. The charger includes a charging unit for freeing ions and charging particles in the neighborhood of the in-mold foil, and an electrode for adsorbing the particles charged by the ions. | ||||||
| 279 | Dense fluid spray cleaning process and apparatus | US10221593 | 2002-09-12 | US20030207655A1 | 2003-11-06 | David P Jackson |
| Diclosed is a dense fluid spray cleaning apparatus comprising a gas supply (3) for providing a predetermined amount of a gas to an enhanced joule-thompson condensation reactor (2) and for providing gas to a propellant generator (4), a premix chamber (6) for receiving a solid particulate from the enhanced joule thompson condensation reactor and heated gas from the propellant generator, and a mixing chamber (8) for receiving the solid particulate and the heated gas and producing a spray stream containing the solid particulate. | ||||||
| 280 | Gas-purged ionizers and methods of achieving static neutralization thereof | US09868788 | 2001-10-30 | US06636411B1 | 2003-10-21 | Charles G. Noll |
| A small quantity of electron attaching gas is introduced into the corona region of an electrical ionizer to stabilize the corona in the otherwise electron non-attaching nitrogen gas. The corona region is closely localized at emitter points so the quantity of electron attaching gas is very small. Clean-dry-air is preferably used as the purge gas but other gases such as oxygen and carbon dioxide may be used. The small quantity of electron attaching gas may be introduced either through a hollow needle emitter or an external purge gas (sleeve about the needle, or by using a gas purge nozzle). | ||||||
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