| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | Method and apparatus for removing dirt from the substrate surface using an atmospheric pressure glow plasma | JP2006546868 | 2004-12-22 | JP4668208B2 | 2011-04-13 | ジャン・バスティアーン・ボーウストラ; ヒンドリック・ウィレム・デ・ヴリーズ; モーリチウス・コーネルス・マリア・ファン・デ・サンデン; ユーゲン・アルデア |
| 2 | 極紫外光の発生のためのシステムおよび方法 | JP2016529812 | 2014-07-21 | JP2016531316A | 2016-10-06 | アレクサンダー ビカノフ; オレク ホディキン; ダニエル ワック; コンスタンティン ツィグツキン; レイトン ヘイル; ジョーセフ ウォルシュ; フランク チレセ |
| EUV光源は、プラズマ形成ターゲット材料でコーティングされた表面を有する回転可能な円筒対称要素と、プラズマ形成ターゲット材料の励起によるプラズマの形成を介してEUV光を発生させるのに十分な1つ以上のレーザーパルスを発生させるように構成されている駆動レーザー源と、回転可能な円筒対称要素の表面上に1つ以上のレーザーパルスを集束させるように構成されている集束光学系のセットと、発生したプラズマから発せられるEUV光を受けるように構成されており、照明を中間焦点に方向付けるようにさらに構成されている集光系のセットと、回転可能な円筒対称要素の表面にプラズマ形成ターゲット材料を供給するように構成されているガス供給サブシステムを含むガス管理システムとを含む。 | ||||||
| 3 | Plasma light source apparatus and light source system including the same | US15222571 | 2016-07-28 | US09839110B2 | 2017-12-05 | Wook-Rae Kim; Won-Don Joo; Byeong-Hwan Jeon; Sung-Hwi Cho; Young-Kyu Park; Jung-Chul Lee; Jin-Woo Ahn |
| A plasma light source apparatus includes a first laser generator configured to generate a first laser. A second laser generator is configured to generate a second laser. A chamber is configured to accommodate and seal a medium material for plasma ignition and to allow plasma to be ignited by the first laser and to be maintained by the second laser. An inner surface of the chamber includes two curved mirrors that face each other. | ||||||
| 4 | PLASMA ENHANCED CHEMICHAL VAPOR DEPOSITION APPARATUS AND METHOD | US12206040 | 2008-09-08 | US20090004363A1 | 2009-01-01 | Marvin S. Keshner; Paul H. McCleland |
| A substrate processing system includes a deposition chamber and a plurality of tubular electrodes positioned within the deposition chamber defining plasma regions adjacent thereto. | ||||||
| 5 | Radiation source with shaped emission | US10005600 | 2001-12-07 | US06563907B1 | 2003-05-13 | Glenn D. Kubiak; William C. Sweatt |
| Employing a source of radiation, such as an electric discharge source, that is equipped with a capillary region configured into some predetermined shape, such as an arc or slit, can significantly improve the amount of flux delivered to the lithographic wafers while maintaining high efficiency. The source is particularly suited for photolithography systems that employs a ringfield camera. The invention permits the condenser which delivers critical illumination to the reticle to be simplified from five or more reflective elements to a total of three or four reflective elements thereby increasing condenser efficiency. It maximizes the flux delivered and maintains a high coupling efficiency. This architecture couples EUV radiation from the discharge source into a ring field lithography camera. | ||||||
| 6 | Unit for a plasma atomizer device with plasma gas-supply means, sample atomizer means and sample injection means | US09615245 | 2000-07-13 | US06448565B1 | 2002-09-10 | Michael Erath |
| The present invention relates to a unit for a plasma atomizer device comprising a supply means for supplying a gas for generating a plasma, an atomizer means for atomizing a sample to be analyzed, an injection means for injecting the atomized sample into a plasma generated with the supplied gas, and a support means for holding the supply means, the atomizer means and the injection means. The invention is characterized in that the support means is connectable to a generator chamber wall of the atomizer device in such a manner that the supply means and the injection means are arranged inside the generator chamber. | ||||||
| 7 | Droplet Generation for a Laser Produced Plasma Light Source | US15261639 | 2016-09-09 | US20170131129A1 | 2017-05-11 | Brian Ahr; Alexander Bykanov; Rudy F. Garcia; Layton Hale; Oleg Khodykin |
| The present disclosure is directed to a device having a nozzle for dispensing a liquid target material; one or more intermediary chamber(s), each intermediary chamber positioned to receive target material and formed with an exit aperture to output target material for downstream irradiation in a laser produced plasma (LPP) chamber. In some disclosed embodiments, control systems are included for controlling one or more of gas temperature, gas pressure and gas composition in one, some or all of a device's intermediary chamber(s). In one embodiment, an intermediary chamber having an adjustable length is disclosed. | ||||||
| 8 | PLASMA LIGHT SOURCE APPARATUS AND LIGHT SOURCE SYSTEM INCLUDING THE SAME | US15222571 | 2016-07-28 | US20170111986A1 | 2017-04-20 | WOOK-RAE KIM; WON-DON JOO; BYEONG-HWAN JEON; SUNG-HWI CHO; YOUNG-KYU PARK; JUNG-CHUL LEE; JIN-WOO AHN |
| A plasma light source apparatus includes a first laser generator configured to generate a first laser. A second laser generator is configured to generate a second laser. A chamber is configured to accommodate and seal a medium material for plasma ignition and to allow plasma to be ignited by the first laser and to be maintained by the second laser. An inner surface of the chamber includes two curved mirrors that face each other. | ||||||
| 9 | System and Method for Generation of Extreme Ultraviolet Light | US14335442 | 2014-07-18 | US20150076359A1 | 2015-03-19 | Alexander Bykanov; Oleg Khodykin; Daniel C. Wack; Konstantin Tsigutkin; Layton Hale; Joseph Walsh; Frank Chilese |
| An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element. | ||||||
| 10 | Device and method for extracting a constituent from a chemical mixture | US09999053 | 2001-11-15 | US06639222B2 | 2003-10-28 | Sergei Putvinski; Vadim Volosov |
| A device for separating a chemical mixture into its constituents includes a central cathode that is aligned axially within a cylindrical plasma chamber. An anode, made of the chemical mixture requiring separation is positioned near the cylindrical wall of the plasma chamber. A working gas is introduced into the chamber to sputter the chemical mixture into the plasma chamber where it is dissociated and ionized. To reduce the unwanted loss of the central cathode due to sputtering by the working gas, the central cathode is formed with a plurality of radial projections that extend outwardly from the axis of the cylindrical plasma chamber. These radial projections act to capture sputtered cathode material before it is lost to the plasma. Once the chemical mixture has been ionized in the plasma chamber, the ions are separated, according to their respective mass to charge ratio, using crossed electric and magnetic fields. | ||||||
| 11 | Device and method for extracting a constituent from a chemical mixture | US09999053 | 2001-11-15 | US20030089850A1 | 2003-05-15 | Sergei Putvinski; Vadim Volosov |
| A device for separating a chemical mixture into its constituents includes a central cathode that is aligned axially within a cylindrical plasma chamber. An anode, made of the chemical mixture requiring separation is positioned near the cylindrical wall of the plasma chamber. A working gas is introduced into the chamber to sputter the chemical mixture into the plasma chamber where it is dissociated and ionized. To reduce the unwanted loss of the central cathode due to sputtering by the working gas, the central cathode is formed with a plurality of radial projections that extend outwardly from the axis of the cylindrical plasma chamber. These radial projections act to capture sputtered cathode material before it is lost to the plasma. Once the chemical mixture has been ionized in the plasma chamber, the ions are separated, according to their respective mass to charge ratio, using crossed electric and magnetic fields. | ||||||
| 12 | 熱光起電力発電装置 | JP2017558527 | 2016-01-08 | JP2018524557A | 2018-08-30 | ミルズ, ランデル エル. |
| 電気的及び熱的パワーの少なくとも1つを供給する溶融金属燃料からラズマから電気パワー源は、(i)ハイドリノを形成する原子水素の触媒作用のための少なくとも1つの反応セルと、(ii)H2O触媒源又はH2O触媒、原子水素源又は原子水素、H2O触媒源又はH2O触媒及び原子水素源又は原子水素を形成する反応物、及び、高い導電性を燃料に持たせる溶融金属 から選択される少なくとも2つの構成様をを含む化学燃料混合物と、(iii)電磁ポンプを含む燃料噴射システムと、(iv)ハイドリノ反応の高速反応速度を開始する低電圧高電流の電気エネルギーの繰り返しのショート・バースト、及び、輝く発光プラズマを形成するハイドリノを形成することによるエネルギー・ゲイン を提供する電気的パワー源及び燃料を封じ込める電極の少なくとも1つのセットと、(v)電極電磁ポンプ回収システム及び重力回収システムの少なくとも1つのような生成物回収システムと、(vi)プラズマに供給されるH2O蒸気の源と、及び(vii)セルの高出力光出力を、集中太陽熱熱電発電装置及び可視及び赤外線透明窓又は複数の紫外線(UV)光起電力セル又は複数の光電子セルのような、セルの高いパワーの光出力を電気に変換することができるパワー・コンバーターと、を含む。 | ||||||
| 13 | Method and apparatus for removing dirt from the substrate surface using an atmospheric pressure glow plasma | JP2006546868 | 2004-12-22 | JP2007520878A | 2007-07-26 | ジャン・バスティアーン・ボーウストラ; ヒンドリック・ウィレム・デ・ヴリーズ; モーリチウス・コーネルス・マリア・ファン・デ・サンデン; ユーゲン・アルデア |
| 本発明は、大気圧グロープラズマに基板表面を曝露することによって基板の表面から汚物を除去する方法及び配置に関する。 プラズマは、プラズマ電流及び変位電流を発生する複数の電極に交流プラズマ活性電圧を印加することによって、複数の電極を具備する放電空間で生成される。 プラズマは、基板表面の特性の改質が防がれるように、プラズマ生成の間に変位電流を制御することによって安定化される。 変位電流を制御する段階は、プラズマ生成の間に変位電流の相対的な減少をもたらす。 | ||||||
| 14 | THERMOPHOTOVOLTAIC ELECTRICAL POWER GENERATOR | US15572898 | 2016-01-08 | US20180159459A1 | 2018-06-07 | Randell Lee MILLS |
| A molten metal fuel to plasma to electricity power source that provides at least one of electrical and thermal power comprising (i) at least one reaction cell for the catalysis of atomic hydrogen to form hydrinos, (ii) a chemical fuel mixture comprising at least two components chosen from: a source of H20 catalyst or H20 catalyst; a source of atomic hydrogen or atomic hydrogen; reactants to form the source of H20 catalyst or H20 catalyst and a source of atomic hydrogen or atomic hydrogen; and a molten metal to cause the fuel to be highly conductive, (iii) a fuel injection system comprising an electromagnetic pump, (iv) at least one set of confinement electrodes that provide repetitive short bursts of low-voltage, high-current electrical energy to initiate rapid kinetics of the hydrin reaction and an energy gain due to forming hydrinos to form a brilliant-light emitting plasma. | ||||||
| 15 | System and method for generation of extreme ultraviolet light | US14335442 | 2014-07-18 | US09544984B2 | 2017-01-10 | Alexander Bykanov; Oleg Khodykin; Daniel C. Wack; Konstantin Tsigutkin; Layton Hale; Joseph Walsh; Frank Chilese; Rudy F. Garcia; Brian Ahr |
| An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element. | ||||||
| 16 | Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma | US10584075 | 2004-12-22 | US07969095B2 | 2011-06-28 | Hindrik Willem De Vries; Eugen Aldea; Jan Bastiaan Bouwstra; Mauritius Cornelius Maria Van De Sanden |
| The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented. | ||||||
| 17 | Method of and Arrangement for Removing Contaminants from a Substrate Surface Using an Atmospheric Pressure Glow Plasma | US10584075 | 2004-12-22 | US20080271748A1 | 2008-11-06 | Hindrik Willem De Vries; Eugen Aldea; Jan Bastiaan Bouwstra; Mauritius Cornelius Maria Van De Sanden |
| The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented. | ||||||
| 18 | PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD | US11553334 | 2006-10-26 | US20070048456A1 | 2007-03-01 | Marvin Keshner; Paul McClelland |
| A substrate processing system includes a deposition chamber and a plurality of tubular electrodes positioned within the deposition chamber defining plasma regions adjacent thereto. | ||||||
| 19 | SYSTEM AND METHOD FOR GENERATION OF EXTREME ULTRAVIOLET LIGHT | EP14829857 | 2014-07-21 | EP3025565A4 | 2017-05-24 | BYKANOV ALEXANDER; KHODYKIN OLEG; WACK DANIEL; TSIGUTKIN KONSTANTIN; HALE LAYTON; WALSH JOSEPH; CHILESE FRANK |
| An EUV light source includes a rotatable, cylindrically-symmetric element having a surface coated with a plasma-forming target material, a drive laser source configured to generate one or more laser pulses sufficient to generate EUV light via formation of a plasma by excitation of the plasma-forming target material, a set of focusing optics configured to focus the one or more laser pulses onto the surface of the rotatable, cylindrically-symmetric element, a set of collection optics configured to receive EUV light emanated from the generated plasma and further configured to direct the illumination to an intermediate focal point, and a gas management system including a gas supply subsystem configured to supply plasma-forming target material to the surface of the rotatable, cylindrically-symmetric element. | ||||||
| 20 | THERMOPHOTOVOLTAIC ELECTRICAL POWER GENERATOR | EP16793102 | 2016-01-08 | EP3295460A1 | 2018-03-21 | MILLS RANDELL LEE |
| A molten metal fuel to plasma to electricity power source that provides at least one of electrical and thermal power comprising (i) at least one reaction cell for the catalysis of atomic hydrogen to form hydrinos, (ii) a chemical fuel mixture comprising at least two components chosen from: a source of H20 catalyst or H20 catalyst; a source of atomic hydrogen or atomic hydrogen; reactants to form the source of H20 catalyst or H20 catalyst and a source of atomic hydrogen or atomic hydrogen; and a molten metal to cause the fuel to be highly conductive, (iii) a fuel injection system comprising an electromagnetic pump, (iv) at least one set of confinement electrodes that provide repetitive short bursts of low-voltage, high-current electrical energy to initiate rapid kinetics of the hydrino reaction and an energy gain due to forming hydrinos to form a brilliant-light emitting plasma. | ||||||
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