| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | 光刻胶组合物 | CN97115414.7 | 1997-07-16 | CN1173647A | 1998-02-18 | 俞升濬; 林翼哲; 金昌昱; 姜纪旭 |
| 含有光固化聚合物和光敏剂的光刻胶组合物,其中所述光敏剂包含至少两种选自4,4’－二叠氮基－2,2’二苯乙烯二磺酸钠盐、4,4’－重氮－2,2’－二亚苄基丙酮二磺酸二钠盐、2,5－二(4－叠氮基－2－磺基亚苄基)环戊酮二钠盐和4,4’－二叠氮基－2,2’－二亚肉桂基丙酮磺酸盐的化合物。用光刻胶组合物进行石印术方法,可以缩短曝光时间,藉此提高产品的产量。 | ||||||
| 2 | 着色感光性树脂组合物 | CN94191324.4 | 1994-12-12 | CN1118629A | 1996-03-13 | 工藤隆范; 野崎优子; 长尾一矢; 南条有纪; 冈崎博; 木下义章; 增田诚也; 帕德马纳班·穆尼拉斯那; 末广夏美 |
| 本发明公开了用颜料分散方式的着色感光性树脂组合物。其特征是(a)具有醇性或酚性羟基的聚合物，(b)通过光化射线照射，生成氮烯的化合物、(c)颜料、(b)溶剂。另外，在这些成分中最好含有(e)热交联剂和/或(f)具有聚合性双键的化合物。按本发明制造颜色滤光片，是在惰性气体气氛中进行的，不需设置氧隔断膜。进而，从曝光到显像不需要加热。因此，通过利用本组合物，可大大简化制造工序，工业上的利用价值极大。 | ||||||
| 3 | 感光性组合物、硬化膜、彩色滤光片、显示元件、固体摄像元件、触摸屏及LED发光体 | CN201510976989.4 | 2015-12-23 | CN105954972A | 2016-09-21 | 尾崎刚史; 堀田佑策; 近藤学 |
| 本发明涉及一种感光性组合物、硬化膜、彩色滤光片、显示元件、固体摄像元件、触摸屏及LED发光体。该感光性组合物含有碱可溶性聚合物(A)、多官能环氧化合物(B)、具有聚合性双键的化合物(C)、光聚合引发剂(D)、1，2-醌二叠氮化合物(E)、及溶剂(F)。本发明的感光性组合物具有良好的涂布性，可形成对玻璃等基底基板的密接性、透明性、耐热性、平坦性、及特别是解析性优异的硬化膜。 | ||||||
| 4 | 感光树脂及其制备方法与应用 | CN201210034258.4 | 2012-02-15 | CN102702406A | 2012-10-03 | 刘陆; 薛建设 |
| 本发明公开了一种感光树脂及其制备方法与应用。本发明的感光树脂包括如下所示的化合物：其中R为：或者其中R2，R3为H、卤素、C1-C4烷基、N，N-二甲胺基、N，N-二乙胺基、环己基、甲氧基或乙氧基；x+y＝100，x为0-99之间整数和y为1-100之间的整数。本发明的感光树脂具有感光性的同时具有了良好的成膜性。 | ||||||
| 5 | 光刻胶组合物 | CN97115414.7 | 1997-07-16 | CN1109925C | 2003-05-28 | 俞昇濬; 林翼喆; 金昌昱; 姜纪旭 |
| 含有光固化聚合物和光敏剂的光刻胶组合物，其中所述光敏剂包含至少两种选自4，4’-二叠氮基-2，2’-二苯乙烯二磺酸钠盐、4，4’-重氮-2，2’-二亚苄基丙酮二磺酸二钠盐、2，5-二(4-叠氮基-2-磺基亚苄基)环戊酮二钠盐和4，4’-二叠氮基-2，2’-二亚肉桂基丙酮磺酸盐的化合物。用光刻胶组合物进行石印术方法，可以缩短曝光时间，藉此提高产品的产量。 | ||||||
| 6 | 光敏化合物和光敏组合物 | CN00800423.4 | 2000-03-31 | CN1297430A | 2001-05-30 | 渡辺哲也; 向井孝夫; 丹羽恭规; 野田桂子; 渡部千代治 |
| 本发明提供一种由下式(1)或下式(2)表示的水溶性光敏化合物,式中,X代表直接键、有1—5个碳原子的亚烷基、－CH2O－、－OCH2－、－CH2OCH2－、－O－、－S－或－SO2－,Z代表－SO3-·Q+、－COO-·Q+或－SO2NR2,其中Q+代表Li+、Na+、K+或N+R4,R代表氢原子和/或有1—5个碳原子的烷基,所述烷基可任选包含一个羟基、醚、羰基、羰氧基或氧羰基,光敏基团在紫外光谱中的最大吸收波长不大于305nm。 | ||||||
| 7 | 透明导电膜形成用墨组合物、透明导电膜、透明电极的制造方法以及图像显示装置 | CN201480020392.6 | 2014-04-02 | CN105143366A | 2015-12-09 | 石井康久; 水野幹久; 井上纯一; 金子直人 |
| 对于由使用金属纳米线的透明导电膜构成的透明电极，简化了透明导电膜的图案化工序数，并且提高了由透明导电膜形成的透明电极的图案化精度。用于形成电极间距离为20μm以上的透明电极的透明导电膜形成用墨含有金属纳米线、感光材料以及溶剂。金属纳米线的平均长度为电极间距离的1.5倍以下。 | ||||||
| 8 | 感光树脂及其制备方法与应用 | CN201210034258.4 | 2012-02-15 | CN102702406B | 2014-03-05 | 刘陆; 薛建设 |
| 本发明公开了一种感光树脂及其制备方法与应用。本发明的感光树脂包括如下所示的化合物：其中R为：或者其中R2，R3为H、卤素、C1-C4烷基、N，N-二甲胺基、N，N-二乙胺基、环己基、甲氧基或乙氧基；x+y＝100，x为0-99之间整数和y为1-100之间的整数。本发明的感光树脂具有感光性的同时具有了良好的成膜性。 | ||||||
| 9 | 着色感光性树脂组合物 | CN94191324.4 | 1994-12-12 | CN1094604C | 2002-11-20 | 工藤隆范; 野崎优子; 长尾一矢; 南条有纪; 冈崎博; 木下义章; 增田诚也; 帕德马纳班·穆尼拉斯那; 末广夏美 |
| 本发明公开了用颜料分散方式的着色感光性树脂组合物。其特征是(a)具有醇性或酚性羟基的聚合物、(b)通过光化射线照射，生成氮烯的化合物、(c)颜料、(b)溶剂。另外，在这些成分中最好含有(e)热交联剂和/或(f)具有聚合性双键的化合物。按本发明制造颜色滤光片，是在惰性气体气氛中进行的，不需设置氧隔断膜。进而，从曝光到显像不需要加热。因此，通过利用本组合物，可大大简化制造工序，工业上的利用价值极大。 | ||||||
| 10 | METHOD FOR DIRECT PHOTOPATTERNING OF MOLECULES ON SURFACES | US14729976 | 2015-06-03 | US20150343413A1 | 2015-12-03 | Matthew B. Francis; Amy A. Twite; Kareem El Muslemany |
| The disclosure relates to methods of photopatterning molecules directly on a surface by photochemical means. | ||||||
| 11 | Manufacture of a polymer device | US10556841 | 2004-05-12 | US20070172978A1 | 2007-07-26 | Lay-Lay Chua; Peter Ho; Richard Friend |
| A method of forming a polymer device including the steps of: (i) depositing on a substrate a solution comprising a polymer or oligomer and a crosslinking moiety, to form a layer; (ii) curing the layer formed in step (i) under conditions to form an insoluble crosslinked polymer, characterized in that the crosslinking moiety is present in step (i) in an amount in the range of from 0.05 to 5 mol % based on the total number of moles of repeat units of the polymer or oligomer and the crosslinking moiety in the solution. | ||||||
| 12 | Photosensitive compound and photosensitive composition | US09700907 | 2000-03-31 | US06908719B1 | 2005-06-21 | Tetsuya Watanabe; Takao Mukai; Yasunori Niwa; Keiko Noda; Chiyoji Watanabe |
| The present invention relates to a water-soluble photosensitive compound represented by the general formula (1): or by the general formula (2): in the formula, X represents a direct bond, an alkylene group containing 1 to 5 carbon atoms, —CH2O—, —OCH2—, —CH2OCH2—, —O—, —S— or —SO2—, and Z represents —SO3−.Q+, —COO−.Q+ or —SO2NR2, in which Q+ represents Li+, Na+, K+ or N+R4 and R represents a hydrogen atom and/or an alkyl group containing 1 to 5 carbon atoms, said alkyl group optionally having one hydroxy, ether, carbonyl, carbonyloxy or oxycarbonyl group, wherein a photosensitive group has an absorption maximum wavelength of not longer than 305 nm in the ultraviolet absorption spectrum thereof. | ||||||
| 13 | Photosensitive compound, photosensitive resin, and photosensitive composition | US10400844 | 2003-03-27 | US06861456B2 | 2005-03-01 | Toru Shibuya; Masanori Kurihara; Mineko Takeda; Kazuo Yamada |
| The present invention provides a novel photosensitive compound having an azido group suitable for exposure to light of a short wavelength; a photosensitive resin containing the photosensitive compound; and a photosensitive composition containing the photosensitive compound or photosensitive resin. The photosensitive compound containing a photosensitive unit represented by formula (1): wherein R is selected from among the following groups, R: X is selected from among the following groups, X: and each of Y and Z represents a hydrogen atom, an alkyl group, an acetal-group-containing alkyl group, an aryl group, an aralkyl group, or a substituent containing a base-forming nitrogen atom, wherein at least one of R and X contains an azido group. | ||||||
| 14 | Photoresist composition | US892442 | 1997-07-14 | US5885744A | 1999-03-23 | Seung-joon Yoo; Ik-chul Lim; Chang-wook Kim; Ki-wook Kang |
| A photoresist composition containing a photo-curing polymer and a photosensitive agent, wherein the photosensitive agent comprises at least two compounds selected from the group consisting of 4,4'-diazido-2,2'-stilbenedisulfonate sodium salt, 4,4'-diazo-2,2'-dibenzalacetone disulfonate disodium salt, 2,5-bis(4-azido-2-sulfobenzylidene) cyclopentanone disodium salt and 4,4'-diazido-2,2'-dicinnamylideneacetone sulfonate salt. By performing a lithography process using the photoresist composition, the exposure time can be shortened, thereby improving the yield of products. | ||||||
| 15 | Control of cell arrangement | US308204 | 1994-09-19 | US5593814A | 1997-01-14 | Takehisa Matsuda; Kazuhiko Inoue; Nobutaka Tani |
| A device for controlling cell arrangement having a pattern composed of a cell adhesive surface and a cell non-adhesive surface, which has a good selectivity of cell adhesion and which can provide a fine pattern of cells in high resolution by culturing cells in a usual manner. The device is prepared by a process which comprises applying a photosensitive, cell adhesive or cell non-adhesive polymer to a surface having a reverse cell adhesivity property to that of the applied polymer, and patternwise irradiating a light to the photosensitive polymer layer followed by development; a process which comprises patternwise irradiating UV or radiation to a cell non-adhesive surface to produce a cell adhesive functional group such as carboxyl group or amino group in the irradiated portion; or a process which comprises patternwise irradiating UV or radiation to a cell adhesive or non-adhesive surface made of plastics to produce a polymerization initiation site in the irradiated portion, and graft-polymerizing at least one monomer having the reverse cell adhesivity property to the plastic surface to produce a polymer on the irradiated portion of plastic surface. | ||||||
| 16 | Positive type photosensitive composition developable with water comprising a photocrosslinking agent, a water-soluble resin and an aqueous synthetic resin | US815614 | 1992-01-07 | US5264318A | 1993-11-23 | Norio Yabe; Kuniaki Monden; Hisashi Mino |
| A positive type photosensitive composition developable with water or warm water alone of water-soluble photocrosslinking agent, water-soluble resin and synthetic resin emulsion and further a coloring agent, if necessary. | ||||||
| 17 | Radiation exposure method of manufacturing a color cathode ray tube having light absorptive areas | US826024 | 1986-02-04 | US4707426A | 1987-11-17 | Robert E. Dodds; David S. Goodwin; Himanshu M. Patel |
| A method for manufacturing a color cathode ray tube, and in particular, for conditioning the surface of a panel of a color cathode ray tube to prepare it for the application of a pattern of color phosphors while minimizing the effects of reflections from interfaces in the panel. The method consists of coating a reciprocity-failing photoresist layer on the inner surface of the panel, drying the layer with a stream of low dew point air, exposing the layer to actinic radiation through a patterned mask to provide insoluble polymerized areas in preselected portions of the layer, developing the layer with a developing solution to remove unpolymerized areas while leaving the polmerized areas, applying an aqueous suspension of light absorptive material to the panel to replace the developing solution with the light absorptive material, drying the light absorptive material, applying an oxidizing solution to the panel to cause the polymerized areas to become water soluble, and removing the polymerized areas and the light absorptive material before applying the phosphors. | ||||||
| 18 | Polyamide ester photoresist formulations of enhanced sensitivity | US818950 | 1986-01-15 | US4701300A | 1987-10-20 | Hans J. Merrem; Rudolf Klug; Thomas Herold |
| Photoresist formulations for forming relief structures from highly heat-resistant polyimide polymers, containing in an organic solvent in essence at least(a) one polyamide ester prepolymer carrying photopolymerizable radicals(b) a radiation-reactive copolymerizable unsaturated compound(c) a photosensitizer(d) a photoinitiator(e) a leuco dye, exhibit enhanced photosensitivity if they contain as the photoinitiator a compound of the type of the N-azidosulphonylarylmaleimides and as leuco dye a compound of the type of the triarylmethanes. | ||||||
| 19 | Photosensitive azide composition with alkali soluble polymer and process of using to form resist pattern | US615749 | 1984-05-31 | US4565768A | 1986-01-21 | Saburo Nonogaki; Michiaki Hashimoto |
| A photosensitive composition comprising an equimolar condensation product of an aromatic azide compound having an aldehyde group and isophorone, and an alkali-soluble polymeric compound is a negative-type photoresist with a high resolution suitable for the fabrication of semiconductor devices. | ||||||
| 20 | Photosensitive bisazide composition for dry development | US472004 | 1983-03-04 | US4468447A | 1984-08-28 | Wataru Kanai |
| A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming bisazide compound as a photocuring agent, is disclosed.The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated. | ||||||
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