| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 1 | 一种菲林涨缩的控制方法 | CN201611019034.0 | 2016-11-21 | CN106707685A | 2017-05-24 | 李卓韬; 黄勇; 贺波 |
| 本发明提供一种菲林涨缩的控制方法，包括步骤:在对菲林进行光绘前,将菲林的包装拆开,放置在无尘室内;使用光绘机进行菲林光绘时,延长显影时间至33~37秒,降低定影温度至30~34℃,降低显影温度至32~36℃,降低烘干温度至41~45℃;菲林光绘完成后先进行压膜,压膜速度2~3m/min，压膜后静置110~130分钟。通过在光绘前让菲林适应当前温湿度，并降低定温、显影、烘干温度，并延长显影时间保证光绘质量，光绘完成后立即进行压膜并静置，减轻光绘前后及光绘时环境温湿度变化对菲林尺寸造成的热涨冷缩影响，降低光绘菲林的尺寸变形不良率。 | ||||||
| 2 | Color filter and liquid crystal panel | US14777523 | 2015-06-24 | US09740072B2 | 2017-08-22 | Xiaoping Yu; Hsiaohsien Chen |
| The present invention provides a color filter and a liquid crystal display. The color filter comprises a substrate, and a color resist layer and a black matrix positioned on the substrate, and the color resist layer comprises a plurality of pixel areas aligned in array, and the plurality of pixel areas are separated by the black matrix, and the pixel area comprises a sub pixel main area and a sub pixel sub area, and two sides of the sub pixel sub area are respectively provided with a first transparent electrode and a second transparent electrode electrically coupled thereto; the sub pixel sub area is made by electrochromic material, and by adjusting voltage signals applied to the two sides of the sub pixel sub area with the first transparent electrode and the second transparent electrode, color variation of the sub pixel sub area is controlled to achieve switch of the color filter between high color saturation and high brightness display modes. The liquid crystal panel of the present invention is provided with the color filter capable of achieving switch of the color filter between high color saturation and high brightness display modes to satisfy the display requirement of high color saturation and high brightness at the same time. | ||||||
| 3 | COLOR FILTER AND LIQUID CRYSTAL PANEL | US14777523 | 2015-06-24 | US20170168365A1 | 2017-06-15 | Xiaoping Yu; Hsiaohsien Chen |
| The present invention provides a color filter and a liquid crystal display. The color filter comprises a substrate, and a color resist layer and a black matrix positioned on the substrate, and the color resist layer comprises a plurality of pixel areas aligned in array, and the plurality of pixel areas are separated by the black matrix, and the pixel area comprises a sub pixel main area and a sub pixel sub area, and two sides of the sub pixel sub area are respectively provided with a first transparent electrode and a second transparent electrode electrically coupled thereto; the sub pixel sub area is made by electrochromic material, and by adjusting voltage signals applied to the two sides of the sub pixel sub area with the first transparent electrode and the second transparent electrode, color variation of the sub pixel sub area is controlled to achieve switch of the color filter between high color saturation and high brightness display modes. The liquid crystal panel of the present invention is provided with the color filter capable of achieving switch of the color filter between high color saturation and high brightness display modes to satisfy the display requirement of high color saturation and high brightness at the same time. | ||||||
| 4 | Nanopatterning method and apparatus | US13546436 | 2012-07-11 | US09465296B2 | 2016-10-11 | Boris Kobrin |
| Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles. | ||||||
| 5 | PATTERNING NON-PLANAR SURFACES | US11837253 | 2007-08-10 | US20080038677A1 | 2008-02-14 | Eric Hogue; Stephen Krak; Timothy Stanfield |
| A pattern is formed on a non-planar surface by forming a layer of photoresist on a part having a surface comprising a non-planar surface area. A deformable mask is aligned over at least a portion of the non-planar surface area of the part such that the deformable mask substantially deforms in a manner corresponding to at least a portion of the non-planar surface area of the part. The photoresist on the part is exposed through the mask so as to transfer a desired pattern onto the part while the deformable mask is maintained in a deformed state. | ||||||
| 6 | Patterning non-planar surfaces | US13206770 | 2011-08-10 | US08891065B2 | 2014-11-18 | Eric L. Hogue; Stephen J. Krak; Timothy J. Stanfield |
| A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure source and a third pressure source. The first pressure source provides a negative pressure within the chamber to draw the mask towards a part installed within the chamber base. The second pressure source provides a positive pressure within the pressure vessel to direct the mask towards the part so that the mask corresponds to at least one complex non-planar surface of the part. The third pressure source provides a negative pressure within pressure vessel. An exposure source exposes the part through the mask while the mask is deformed corresponding to the at least one complex non-planar surface of the part. | ||||||
| 7 | NANOPATTERNING METHOD AND APPARATUS | US13546436 | 2012-07-11 | US20120274004A1 | 2012-11-01 | Boris Kobrin |
| Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles. | ||||||
| 8 | PATTERNING NON-PLANAR SURFACES | US13206770 | 2011-08-10 | US20110292360A1 | 2011-12-01 | Eric L. Hogue; Stephen J. Krak; Timothy J. Stanfield |
| A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure source and a third pressure source. The first pressure source provides a negative pressure within the chamber to draw the mask towards a part installed within the chamber base. The second pressure source provides a positive pressure within the pressure vessel to direct the mask towards the part so that the mask corresponds to at least one complex non-planar surface of the part. The third pressure source provides a negative pressure within pressure vessel. An exposure source exposes the part through the mask while the mask is deformed corresponding to the at least one complex non-planar surface of the part. | ||||||
| 9 | Patterning non-planar surfaces | US11837253 | 2007-08-10 | US08017308B2 | 2011-09-13 | Eric L. Hogue; Stephen J. Krak; Timothy J. Stanfield |
| A pattern is formed on a non-planar surface by forming a layer of photoresist on a part having a surface comprising a non-planar surface area. A deformable mask is aligned over at least a portion of the non-planar surface area of the part such that the deformable mask substantially deforms in a manner corresponding to at least a portion of the non-planar surface area of the part. The photoresist on the part is exposed through the mask so as to transfer a desired pattern onto the part while the deformable mask is maintained in a deformed state. | ||||||
| 10 | 투명진사구를 이용한 홀 형성 마스크 및 그 형성방법 | KR1019980023511 | 1998-06-22 | KR1020000002660A | 2000-01-15 | 정호련; 남명우; 황성연 |
| PURPOSE: A method of a hole formation mask produce using a transparent cinnabarite ball is provided to realize the high integration of the devices by forming the contact hole of a semiconductor to be under the submicron size in its diameter. CONSTITUTION: A method of a hole formation mask produce comprises the steps of: forming a hole mask by fixing a transparent cinnabarite ball(23) on the upper part of a quartz substrate(21) using a metal(25); forming etched layer(13) onto the substrate and then forming positive photosensitive film(15); and exposing the photosensitive film by an exposing process using the hole mask. | ||||||
| 11 | 마찰 마모 저감을 위한 탄성 표면 구조 및 그 제조 방법 | KR1020130005309 | 2013-01-17 | KR101411328B1 | 2014-06-25 | 김대은; 유신성; 올릭세이펜코브 |
| The present invention relates to an elastic surface structure for reducing wear and friction between two structures which relatively move while being in contact with each other and a manufacturing method thereof. For this, the elastic surface structure for reducing wear and friction between two structures which relatively move while being in contact with each other comprises: a plurality of pillar units which have a pillar shape, are arranged at intervals on the surface of the structure, are deformed within an inherent elasticity range when a load is applied from the structure, and are restored to its initial shape when the load is removed; and a plurality of plate units which have a plate shape, are fixed to the top of the pillar units, and move by linking with the pillar units while being in contact with the surface of the structure when the pillar units are elastically deformed due to the load from the structure. | ||||||
| 12 | PATTERNING NON-PLANAR SURFACES | PCT/US2007075714 | 2007-08-10 | WO2008024643A3 | 2008-09-04 | HOGUE ERIC L; KRAK STEPHEN J; STANFIELD TIMOTHY J |
| A pattern is formed on a non-planar surface by forming a layer of photoresist on a part (24) having a surface comprising a non-planar surface area (24A). A deformable mask (26) is aligned over at least a portion of the non-planar surface area (24A) of the part (24) such that the deformable mask (26) substantially deforms in a manner corresponding to at least a portion of the non-planar surface area (24A) of the part (24). The photoresist on the part (24) is exposed through the mask (26) so as to transfer a desired pattern onto the part (24) while the deformable mask (26) is maintained in a deformed state. | ||||||
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