METHOD FOR INDUSTRIAL MANUFACTURING OF A SEMICONDUCTOR STRUCTURE WITH REDUCED BOWING
专利汇可以提供METHOD FOR INDUSTRIAL MANUFACTURING OF A SEMICONDUCTOR STRUCTURE WITH REDUCED BOWING专利检索，专利查询，专利分析的服务。并且A method for manufacturing a semiconductor structure with reduced bowing for applications in the field of power electronics, photonics, optoelectronics, solar energy conversion and the like, which comprises: - a step of providing at least a first layer of a first semiconductor material, said first layer comprising a substrate of said first semiconductor material, which extends along a first reference plane, and a plurality of first portions of said first semiconductor material, which are mutually spaced and extend in elevation from said substrate along axes perpendicular to said first reference plane, said first portions having ends in distal position with respect to said substrate; - a step of providing at least a second layer of a second semiconductor material, said second layer comprising second portions of said second semiconductor material, each of which is joined to the ends of a plurality of said first portions, said second portions being mutually spaced and extending along a second reference plane parallel to said first reference plane; The first portions of the first layer are produced with an aspect ratio that depends on a dimension of said second portions, measured along said second reference plane. In a further aspect thereof, the invention relates to a semiconductor structure for applications in the field of power electronics, photonics, optoelectronics, solar energy conversion and the like.，下面是METHOD FOR INDUSTRIAL MANUFACTURING OF A SEMICONDUCTOR STRUCTURE WITH REDUCED BOWING专利的具体信息内容。
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