专利汇可以提供Ion implantation device专利检索,专利查询,专利分析的服务。并且PURPOSE: To enhance productivity, by housing an ion implanter and a laser oscillator provided with a scanning mirror, a reflected light convergence lens, etc., in a vacuum container to continuously perform ion implantation and annealing.
CONSTITUTION: A semiconductor substrate W can be put into and out of a vacuum container 1 provided with an exhaust system 2. An ion implanter 3, in which an accelerator, a convergence lens, a scanner, etc. are disposed in front of a liquefied metal ion source, is provided in the vacuum container 1. A laser annealer, which comprises a laser oscillator 6 connected to a laser power supply 7, a mirror 8, which is located in front of the laser oscillator 6 and moved by a driver 10 to perform scanning in the directions of an X-axis and a Y-axis, and a lens 9 for converging a reflected beam, is housed in the vacuum container 1. Control is performed by a computer 5 so that ions are implanted into the substrate W and it is subsequently annealed. As a result, productivity is enhanced and the quality of a product is prevented from being deteriorated due to the mixing of an impurity.
COPYRIGHT: (C)1987,JPO&Japio,下面是Ion implantation device专利的具体信息内容。
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