Charge neutralizing apparatus for ion implanter
专利汇可以提供Charge neutralizing apparatus for ion implanter专利检索，专利查询，专利分析的服务。并且PURPOSE: To prevent any damage to a wafer due to a radiated ion beam from occurring, by drawing an electron with relatively higher voltage than an electron drawing system, decelerating it to less than the specified energy by an electron decelerating system, and emitting the decelerated one into an ion current to be neutralized.
CONSTITUTION: A charge neutralizing apparatus 1 is installed between an accelerating stage of an accelerating ion ION of an ion implanter and a wafer 2 performing ion implantation. And, this neutralizing apparatus 1 is made up of an electron drawing system inclusive of an electron source 11 and a drawing electrode 12, and an electron decelerating system 14 consisting of a Faraday cup 16 and a decelerating power source 15. And, an electron is drawn with relatively higher voltage than the electron drawing system, and size of an electron current is kept intact but its energy is set down to less than the specified value, then it is emitted into the ion ION to be neutralized by the electron decelerating system 14. Therefore, with a simple structure, any damage to the wafer 2 due to the high energy electron is eliminated, preventing the charge from occurring, thus high-quality ion implantation is performable.
COPYRIGHT: (C)1987,JPO&Japio，下面是Charge neutralizing apparatus for ion implanter专利的具体信息内容。
| 标题 | 发布/更新时间 | 阅读量 |
|---|---|---|
| 一种自旋半导体ZrO2薄膜的制备方法 | 2020-05-11 | 76 |
| 使用基板级离子注入制造太阳能电池发射极区 | 2020-05-14 | 918 |
| 一种耐高温高质量SOI基剥离Ge薄膜的制备方法 | 2020-05-11 | 764 |
| 基于深层离子注入的氧化镓肖特基二极管抗位移辐照方法 | 2020-05-13 | 630 |
| 一种半导体芯片生产工艺 | 2020-05-13 | 980 |
| 离子注入方法及离子注入机 | 2020-05-11 | 823 |
| 增强型的Ga2O3金属氧化物半导体场效应晶体管及制作方法 | 2020-05-11 | 248 |
| 提高等离子体离子注入机机台产能的方法及设备 | 2020-05-12 | 414 |
| 一种高量子效率CCD结构 | 2020-05-12 | 623 |
| 一种多阴极长寿命型离子源 | 2020-05-13 | 991 |
高效检索全球专利专利汇是专利免费检索,专利查询,专利分析-国家发明专利查询检索分析平台，是提供专利分析，专利查询，专利检索等数据服务功能的知识产权数据服务商。
我们的产品包含105个国家的1.26亿组数据，免费查、免费专利分析。
专利汇分析报告产品可以对行业情报数据进行梳理分析，涉及维度包括行业专利基本状况分析、地域分析、技术分析、发明人分析、申请人分析、专利权人分析、失效分析、核心专利分析、法律分析、研发重点分析、企业专利处境分析、技术处境分析、专利寿命分析、企业定位分析、引证分析等超过60个分析角度，系统通过AI智能系统对图表进行解读，只需1分钟，一键生成行业专利分析报告。
