Method of cleaning vacuum device
专利汇可以提供Method of cleaning vacuum device专利检索，专利查询，专利分析的服务。并且PURPOSE:To enable absorbed gas molecules to be sufficiently removed by introducing microwaves into a vacuum device while agitating them. CONSTITUTION:A thermion-producing filament 4 constituting a thermion- irradiating mechanism 3 is placed in an ion pump case 1 of a hard vacuum atmosphere from which internal electrodes are removed. When power supplies 5 and 6 are turned on, thermions emitted by the filament 4 are irradiated upon the inner surface of the ion pump case 1 to undergo electronic impacts thereby compulsorily removing molecular or atomic gas molecules contained in the inner surface. After an electrode section 2 is placed in the thus pretreated ion pump case 1, a wave guide 7 is connected to the electrode section 2 and then an agitation vane 8 is placed in the ion pump case 1 maintained at a hard vacuum, microwaves are introduced into the case 1 through the wave guide 7 to drive the agitation vane 8 thereby producing a homogeneous state. As the result, a high electric field develops on each surface and absorbed gas molecules are sufficiently removed.，下面是Method of cleaning vacuum device专利的具体信息内容。
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