Film thickness distribution measuring device
专利汇可以提供Film thickness distribution measuring device专利检索，专利查询，专利分析的服务。并且PURPOSE: To make it possible through film surface observation to appraise the non-uniformity in film thickness caused by unevenness at the interface between an insulation film and a substrate by moving a probe against the interatomic force from the insulation film.
CONSTITUTION: An SXM is a type of needle-contact microscope which applies the techniques of an atomic force microscope(AFM) and a scanning tunneling microscope(STM). In this device, a probe 1 with a sharpened tip touches and move on the surface of a sample 5 and the upward/downward movements of the probe 1 during this scan are used to measure the unevenness of the surface of the sample 5. When the probe 1 approaches the surface within a few Åof the surface, a strong repulsive forces occurs between the two. In the AFM, a cantilever 6 is used and this force is converted into the displacement of the cantilever 6. Actually, the probe 1 is so moved that this displacement is always constant. By employing this AFM probe control method, even in the case of the insulation thin film 3, it is possible to control and move the probe 1 along the film surface independent of the presence of a tunnel current. As a result, the distribution of the insulation film 3 on the surface of a conductive substrate 2 can be measured with high spatial resolution.
COPYRIGHT: (C)1992,JPO&Japio，下面是Film thickness distribution measuring device专利的具体信息内容。
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