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Surface condition measuring apparatus

阅读:139发布:2021-10-31

专利汇可以提供Surface condition measuring apparatus专利检索,专利查询,专利分析的服务。并且PURPOSE:To enable an increase in separate detection rate of a foreign matter for a circuit pattern, by selectively receiving the scattered lights only from a foreign matter existing on a substrate, avoiding a diffraction light in a spatial layout. CONSTITUTION:A focusing section 6 is provided above a circuit board 5. Scattered luminous fluxes from a foreign matter on the circuit board 5 is corrected to be focused to the point PG through a mirror 7 and introduced to a light receiving surface 9 with a lens 8. The focusing section 6, the mirror 7 and the lens 8 compose a part of a light receiving means. Then, with the rotation of polygon mirror 2, the luminous flux emitted at the reflection point PG are scattered by the foreign matter on the circuit board 5 to be focused 6. Here, the focusing section 6 is so arranged that a crossed line on the circuit board 5 by an incident luminous flux almost coincide with a corresponding crossed line for focusing to introduce the scattered luminous fluxes generated from the foreign matter on the circuit board 5 to the light receiving surface 9 efficiently. This can achieve a higher separation detection rate of a foreign matter for a circuit pattern.,下面是Surface condition measuring apparatus专利的具体信息内容。

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