专利汇可以提供Processing apparatus with precisely controlled agitation专利检索,专利查询,专利分析的服务。并且Apparatus for processing semiconductor wafers while providing precise control over the rate of agitation of processing solution in contact with the wafers. The invention has utility in several processing operations on semiconductor wafers such as developing, photolithographic etching and bubble cleaning. The apparatus includes a tank for holding a quantity of processing solution. A sparger, placed in the tank, has a plurality of apertures for releasing a precisely controlled amount of an inert gas such as nitrogen into the processing solution. A carrier loaded with a plurality of semiconductor wafers is placed on top of the sparger. During processing a precisely controlled amount of gas is released through the apertures in the sparger and bubbles up through the processing solution in intimate contact with the semiconductor wafers. This bubbling action provides precisely controlled agitation of the processing solution in intimate contact with the wafers.,下面是Processing apparatus with precisely controlled agitation专利的具体信息内容。
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