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Electron beam exposure device

阅读:391发布:2023-06-25

专利汇可以提供Electron beam exposure device专利检索,专利查询,专利分析的服务。并且PURPOSE:To remove the unclean water in a slit, reduce slit replacements, and increase the precision for the shaped beam image, by providing a separate electron gun in the neighborhood of the slit for shaping an electron beam. CONSTITUTION:The electron beam produced by electron gun 1 is shaped into a square in cross section by No. 1 slit 4 and then it is shaped into a desired form and size by No. 2 slit 7; and it illuminates object 11 to be processed. No. 2 electron gun 30 is provided in the neighborhood of No. 2 slit 7. Particularly, the edges of the square hole of No. 2 slit 7 are illuminated by the electron beam and heated at all times, and thereby attached organic substances, such as vacuum pump oil, are scattered and removed. By this, stains on No. 2 slit are almost comletely removed, and the life of the slit can be lengthened, and at the same time, slit replacements can be reduced. Further, shaking and blurring of the beam on the object being processed are eliminated, and thereby the precision of the shaped beam image is improved.,下面是Electron beam exposure device专利的具体信息内容。

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