| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 61 | 岩石表面静态接触角的测试方法及利用其的岩石表面润湿性动态变化测试方法 | CN201611203555.1 | 2016-12-23 | CN106596348A | 2017-04-26 | 华朝; 张健 |
| 本发明具体涉及一种岩石表面静态接触角的测试方法及利用其的岩石表面润湿性动态变化测试方法。岩石表面静态接触角的测试方法，包括：将岩石片的表面清洗、干燥，备用；采用表面/张力仪，在可升降的样品池中盛装待测液体，夹好备用的岩石片，并悬挂在微量天平下；采用“Interfacial tension”模式进行测试，测试时样品池缓慢上升，直到液面刚好接触岩石片下表面，记录微量天平显示读数，计算岩石片的受力大小(F)；根据岩石片的受力大小(F)推导求解待测液体在岩石表面上的接触角(θ)；本发明测试方法灵敏度高，微量天平能捕捉岩石片表面受力的微量变化，能测试出较小的接触角和接触角的微量改变；可连续测试时间长，能记录岩石表面润湿性动态变化规律。 | ||||||
| 62 | 一种用于润湿角测定的双层可调样品放置水平台 | CN201621396543.0 | 2016-12-20 | CN207036614U | 2018-02-23 | 马启睿; 李海涛; 方申文 |
| 本实用新型专利是在常规润湿角测定装置中的样品放置水平台的基础上设计的一种用于润湿角测定的双层可调样品放置水平台，其包括了水平气泡槽，上层平台，伸缩支撑杆，下层平台，铁质座台，海绵垫，上部滑槽，支撑杆螺栓松紧调节器，开口槽，伸缩支撑杆上杆，伸缩支撑杆下杆，螺栓固定器。上层平台上表面中心有水平气泡槽，水平气泡槽的上表面与上层平台上表面重合，上层平台下表面通过上部滑槽槽口与伸缩支撑杆上杆相连接，伸缩支撑杆上杆和下杆通过螺栓固定器固定，伸缩支撑杆下杆通过支撑杆螺栓松紧调节器固定在下层平台的铁质座台上,铁质座台含有四个开口槽，通过螺栓固定在实验仪器的水平面上，并通在铁质座台底部有海绵垫，使铁质座台在水平面稳固。从而提供一种高效、易操作、精度高的样品放置水平台。 | ||||||
| 63 | 测定电磁场下钛合金熔体与氧化物陶瓷润湿角的装置 | CN201120371173.6 | 2011-09-28 | CN202256104U | 2012-05-30 | 刘爱辉; 李邦盛; 隋艳伟; 郭景杰 |
| 本实用新型公开了测定电磁场下钛合金熔体与氧化物陶瓷润湿角的装置，包括炉壳（1），炉壳（1）上设有前观察窗（2）、后观察窗（3）和抽充气口（4），在前观察窗（2）的前方安装照片拍摄处理系统，在后观察窗（3）的后方安装定向投光装置（5），炉壳（1）的内部从上到下依次安装抽拉机构、感应加热线圈（6）和电阻加热体。本实用新型采用抽拉机构调整钛合金试样在感应加热线圈中的位置，精确控制钛合金的熔化量，避免钛合金熔体与其他材料的直接接触，保证钛合金熔体的纯净度，感应加热线圈既加热钛合金试样又对滴落在氧化物陶瓷上的钛合金液滴进行保温，为整个润湿过程提供稳恒电磁场，适用测定电磁场作用下钛合金熔体与氧化物陶瓷间的润湿角。 | ||||||
| 64 | 一种基于电润湿像素的角膜接触式近眼显示装置 | CN202121089754.0 | 2021-05-20 | CN216485795U | 2022-05-10 | 汪勇; 汪越天 |
| 本实用新型公开了一种基于电润湿像素的角膜接触式近眼显示装置，属于近眼显示领域，一种基于电润湿像素的角膜接触式近眼显示装置，利用若干透射型EW单元构成角膜接触式近眼显示器，采用自然光作为EW单元的光源，利用电磁传导技术为角膜接触式显示系统提供电源，利用角膜显示器接触角膜的显示方法，通过透明显示器的显示配合着环绕显示器内部电磁感应线圈控制方法，能够的避免了现有的近眼显示的镜片，基于电润湿像素的方式，在使用中导致侧后方的杂散光照射在折射结构上会造成明显的光晕和“彩虹”斑，能够有效的保证消费者的视野、体验和行动安全。(ESM)同样的发明创造已同日申请发明专利 | ||||||
| 65 | 一种实时同步监测钎料熔化过程中三相线移动和动态润湿角的设备 | CN201721119738.5 | 2017-09-04 | CN207300799U | 2018-05-01 | 李玉龙; 杨泓; 胡小武; 付艳恕; 胡瑢华 |
| 一种实时同步监测钎料熔化过程中三相线移动和动态润湿角的设备，包括加热台、玻璃罩、升降台、温度控制器、光源、导轨、侧拍高速摄像头、正拍高速摄像头、夹具、计算机；其中，加热台置于升降台台面上，玻璃罩罩在加热台上，玻璃罩左右侧面分别设有进气孔和出气孔，加热台与温度控制器连接；侧拍高速摄像头放置于导轨上，侧拍高速摄像头与光源分别位于加热台的两侧，侧拍高速摄像头、加热台和光源位于同一轴线上；正拍高速摄像头被专用夹具固定于加热台正上方，两个摄像头与计算机连接。本实用新型可实时同步监测钎料熔化润湿铺展过程的三相线和润湿角的动态变化，可以得到三相线、润湿角随时间和温度变化的实时数据，可以大大的节约实验时间。 | ||||||
| 66 | 전기습윤에서 액적의 접촉각 변위 및 변화속도 증가방법 및상기 방법에 의해 형성된 액적을 적용한 액적제어장치 | KR1020050090486 | 2005-09-28 | KR100781739B1 | 2007-12-03 | 이정건; 조혜정; 허남; 김성재 |
| 본 발명은 전기습윤(electrowetting) 원리를 이용한 친수성액적의 제어방법에 대한 것으로, 보다 구체적으로는 상기 친수성액적에 2원 또는 3원 전해질을 일정 농도로 더 포함하게 함으로써 상기 액적의 계면 접촉각 변위 및 변화속도를 증가시킬 수 있는 친수성 액적과 비극성 유체가 형성하는 계면의 접촉각 변위와 변화속도 증가방법 및 상기 방법에 의해 형성된 액적을 적용한 장치에 대한 것이다. 본 발명에 따르면, 친수성 액적과 비극성 유체가 형성하는 계면의 접촉각 변위와 변화속도를 증가시킬 수 있게 되며, 이와 같이 접촉각 변위 및 변화속도가 넓어진 액적을 사용하게 되면 상기 액적의 습윤운동을 빠르고 효과적으로 제어할 수 있고 가역적으로 유체의 이송 및 제어가 가능하므로, 동작성이 보다 향상된 액적제어장치를 제공하는 것이 가능하다. | ||||||
| 67 | 細孔径を低減し、保湿し且つ／又はケラチン表面の欠陥の外観をぼかすための方法及び組成物 | JP2015524398 | 2013-07-23 | JP2015524433A | 2015-08-24 | モハンマディ，ファテマー; ク，リサ; ツァールノタ，アンナ; ロバート モウ，ツン−ウェイ |
| 複数の利点がある組成物を用いて、同時に保湿し、且つ/又は、皮膚欠陥の外観をぼかす、又は細孔径を低減する、又は皮膚を処置するための方法。【選択図】なし | ||||||
| 68 | Method and apparatus for dynamic wetting angle measurement | US81089 | 1979-10-01 | US4275587A | 1981-06-30 | Edgar B. Gutoff |
| A method of measuring the dynamic wetting angle between a liquid and a solid surface moving into the liquid as a function of the speed of the solid surface relative to the liquid comprising the steps of moving the solid surface into the liquid at a constant speed, adjusting the angle of the surface entering the liquid until the wetting angle is equal to the angle between the solid surface and the quiescent surface of the surrounding liquid, and measuring said adjusted angle. In another embodiment, the speed of the solid surface entering at a selected angle is adjusted until the meniscus adjacent the surface becomes level, and the speed is measured. | ||||||
| 69 | Weld bead wetting angle detection and control | US351000 | 1989-05-08 | US4920249A | 1990-04-24 | Michael H. McLaughlin; Carl M. Penney; Robert E. Sundell |
| The wetting angle of a bead, such as a welding bead, is detected and controlled by a feedback operation. In particular, one or more optical profiler heads are used to detect the wetting angle along the edge of a bead. If the wetting angles differ from a preferred value, a feedback control system adjusts one or more weld parameters in order to bring the wetting angles to a desired value. If the wetting angle obtains a value which makes the weld joint completely unacceptable, an alarm condition may be activated. The detection of the bead wetting angles may be provided by two optical profiler heads, each head tracking a corresponding one of the edges or sides of the bead so as to provide information from which a corresponding wetting angle may be obtained. | ||||||
| 70 | 아세틸렌 디올 계면활성제 용액 및 이것의 사용 방법 | KR1020030055635 | 2003-08-12 | KR1020040030252A | 2004-04-09 | 장펭; 쿠르지다니엘메간킹; 카르와키유진조지프주니어; 바르버레슬리콕스 |
| PURPOSE: A processing solution containing an acetylene diol-based surfactant, a rinsing solution before development containing the processing solution and a method for improving the wettability of the surface of a substrate by using the processing solution are provided, to improve the wettability of the surface of a substrate by reducing the contact angle of an aqueous developer. The processing solution contains a surfactant which generates no undesirable bubble and acts effectively in high rate coating. CONSTITUTION: The processing solution comprises about 10-10,000 ppm at least one kind of surfactant represented by the formula 1 or 2; a solvent selected from the group consisting of an aqueous solvent, a nonaqueous solvent and their combination; and optionally about 10-10,000 ppm of at least one kind of dispersant, wherein R1 and R4 a linear or branched C3-C10 alkyl group; R2 and R3 are H or a C1-C5 alkyl group; and m, n, p and q are a number of 0-20. A resist-coated substrate is contacted with the processing solution before or after an aqueous developer is coated on the surface of the substrate. | ||||||
| 71 | Method for reducing wettability of interconnect material at corner interface and device incorporating same | US14227807 | 2014-03-27 | US09209135B2 | 2015-12-08 | Xunyuan Zhang; Hoon Kim; Vivian W. Ryan |
| A semiconductor device includes a recess defined in a dielectric layer, the recess having an upper sidewall portion extending to an upper corner of the recess and a lower sidewall portion below the upper sidewall portion. An interconnect structure is positioned in the recess. The interconnect structure includes a continuous liner layer having upper and lower layer portions positioned laterally adjacent to the upper and lower sidewall portions, respectively. The upper layer portion includes an alloy of a first transition metal and a second transition metal and the lower layer portion includes the second transition metal but not the first transition metal. The interconnect structure also includes a fill material substantially filling the recess, wherein the second transition metal has a higher wettability for the fill material than the alloy. | ||||||
| 72 | Method for reducing wettability of interconnect material at corner interface and device incorporating same | US13561195 | 2012-07-30 | US08722534B2 | 2014-05-13 | Xunyuan Zhang; Hoon Kim; Vivian W. Ryan |
| A method for forming an interconnect structure includes forming a recess in a dielectric layer of a substrate, forming a first transition metal layer in the recess on corner portions of the recess, and forming a second transition metal layer in the recess over the first transition metal layer to line the recess. The method further includes filling the recess with a fill layer and annealing the substrate so that the first transition metal layer and the second transition metal layer form an alloy portion proximate the corner portions during the annealing, the alloy portion having a reduced wettability for a material of the fill layer than the second transition metal. Additionally, the method includes polishing the substrate to remove portions of the fill layer extending above the recess. | ||||||
| 73 | Electrophotographic recording apparatus having toner delivering member with large wetting angle | US448785 | 1995-05-24 | US5625439A | 1997-04-29 | Eisaku Murakami |
| An electrophotographic recording apparatus includes an image supporting member for supporting an electrostatic latent image on its surface, and a developing unit for supplying one-component toner to the image supporting member. The developing unit has a toner delivering member for directly delivering toner to the image supporting member. The included wetting angle to water of the surface of the toner delivering member is more than 20 degrees. | ||||||
| 74 | Method for controlling the contact angle of a droplet in electrowetting and an apparatus using the droplet formed thereby | US11536319 | 2006-09-28 | US07767069B2 | 2010-08-03 | Jeong Gun Lee; Hye Jung Cho; Nam Huh; Sung Jae Kim |
| A method for controlling the hydrophilic droplet using the electrowetting principle is disclosed. More specifically, the present invention provides a method for increasing the change of the contact angle in the interface that is formed between the hydrophilic droplet and the nonpolar fluid by adding a constant concentration of two-element electrolyte or three-element electrolyte to the hydrophilic droplet; and an apparatus for controlling the droplet having the change of the contact angle and velocity scope increased by the method. | ||||||
| 75 | Hair straightener containing a kerating reducing agent, anionic wetting agent and water-soluble soap and method of using same | US28579752 | 1952-05-02 | US2865811A | 1958-12-23 | FERNAND ROESCH |
| 76 | 一种用核磁共振技术表征非均质润湿孔隙介质润湿性的方法 | CN201810141877.0 | 2018-02-11 | CN108489864B | 2020-03-27 | 肖立志; 王杰; 崔宇诗; 廖广志 |
| 本发明涉及非均质润湿孔隙介质润湿性表征领域，具体涉及一种用核磁共振技术表征非均质润湿孔隙介质润湿性的方法。该方法包括：将孔隙介质用第一流体和第二流体饱和；利用核磁共振技术测量其D‑T2分布及T1/T2并得到有效表面驰豫率以得到润湿斑点的比例；将同质的孔隙介质经第三流体润湿后，利用核磁共振技术测量T1/T2比值后磨成片状，测量该片状的润湿角以得到T1/T2和润湿角的线性关系以得到润湿角；通过润湿角和润湿斑点比例计算出非均质润湿孔隙介质的视润湿角以表征润湿性。本发明的方法引入了视润湿角表征非均质润湿，借助核磁共振测得润湿斑点的面积比例和润湿强度得到一种准确、全面地评价孔隙介质的润湿性的方法。 | ||||||
| 77 | 一种用核磁共振技术表征非均质润湿孔隙介质润湿性的方法 | CN201810141877.0 | 2018-02-11 | CN108489864A | 2018-09-04 | 肖立志; 王杰; 崔宇诗; 廖广志 |
| 本发明涉及非均质润湿孔隙介质润湿性表征领域，具体涉及一种用核磁共振技术表征非均质润湿孔隙介质润湿性的方法。该方法包括：将孔隙介质用第一流体和第二流体饱和；利用核磁共振技术测量其D-T2分布及T1/T2并得到有效表面驰豫率以得到润湿斑点的比例；将同质的孔隙介质经第三流体润湿后，利用核磁共振技术测量T1/T2比值后磨成片状，测量该片状的润湿角以得到T1/T2和润湿角的线性关系以得到润湿角；通过润湿角和润湿斑点比例计算出非均质润湿孔隙介质的视润湿角以表征润湿性。本发明的方法引入了视润湿角表征非均质润湿，借助核磁共振测得润湿斑点的面积比例和润湿强度得到一种准确、全面地评价孔隙介质的润湿性的方法。 | ||||||
| 78 | 一种银与MAX相高温润湿性的调控方法 | CN202110314792.X | 2021-03-24 | CN113084165B | 2022-06-03 | 田无边; 刘乔丹; 杨勇 |
| 本发明公开了一种银与MAX相高温润湿性的调控方法，属于金属‑陶瓷界面润湿技术领域，本发明通过调整Mn+1AXn相组分(M、A、X位置元素)或结构(n值)改变MAX相表面性质，最终达到调控Ag与MAX润湿行为的目的，使得二者呈现从润湿(润湿角<90°)到不润湿(润湿角>90°)的状态变化。该技术对于开发高性能、无镉环保的Ag‑MAX电接触材料具有重要意义。 | ||||||
| 79 | 页岩储层润湿性测定方法、装置及终端设备 | CN202110149788.2 | 2021-02-03 | CN112784436A | 2021-05-11 | 陈世敬; 张金川; 李沛 |
| 本发明适用于石油勘探技术领域，提供了一种页岩储层润湿性测定方法、装置及终端设备，该方法包括：获取页岩样品的矿物含量；根据所述页岩样品的矿物含量和基于量热实验建立的预设水润湿模型计算所述页岩样品的水润湿热；根据所述页岩样品的矿物含量和基于量热实验建立的预设油润湿模型计算所述页岩样品的油润湿热；测量所述页岩样品的水接触角；基于所述水润湿热、所述油润湿热、所述水接触角和预设润湿分类规则，确定所述页岩样品的润湿性。本申请能够结合量热法和接触角法综合评定页岩储层的润湿性，从而提高页岩储层润湿性评定的全面性和准确性。 | ||||||
| 80 | 一种定量表征二氧化碳化学作用对砂岩润湿性影响的方法 | CN202410228686.3 | 2024-02-29 | CN117804999B | 2024-05-03 | 王香增; 杨红; 刘芳娜; 倪军; 魏登峰; 刘瑛; 梁全胜; 姚振杰; 陈芳萍; 刘凯; 王贺谊; 王苛宇; 王宏 |
| 本发明涉及一种定量表征二氧化碳化学作用对砂岩润湿性影响的方法，获得不同压力条件下岩心薄片与地层水接触后的初始润湿接触角；获得临界时间；获得不同压力条件下临界时间对应的临界润湿接触角，进而获得不同压力条件下临界润湿接触角与初始润湿接触角之差△θ1；获得不同压力条件下吸附作用润湿接触角，进而获得吸附作用润湿接触角与初始润湿接触角之差△θ2；以△θ1及△θ2之和作为受二氧化碳化学作用影响的润湿角变化△θ，根据润湿角变化△θ评价砂岩岩石润湿性影响；本发明方法简单、快捷，可高效评价并预测二氧化碳‑岩石‑地层水相互作用对储层岩石润湿性影响。 | ||||||
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