IMPRINT LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY |
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| 申请号 | PCT/IB2005002359 | 申请日 | 2005-06-30 | 公开(公告)号 | WO2006024908A2 | 公开(公告)日 | 2006-03-09 |
| 申请人 | ASML NETHERLANDS BV; TEN BERGE PETER; | 发明人 | TEN BERGE PETER; | ||||
| 摘要 | An imprint lithography apparatus comprising a template (34), a substrate table (31) and an alignment system. (35, 36, 37) arranged to align. the template (34) to a substrate alignment t mark (39; 39`) provided on a substrate (30). The substrate table (31) is arranged to support the substrate (30) having a first surface (32) to be imprinted andd a second surface (50) facing the substrate table (31). The apparatus is characterised in that the substrate alignment mark (39; 39') is provided on the second surface (50) of the substrate (30), and that the substrate table (31) further comprises a substrate table optical. system for allowing the substrate alignment mark (39; 39') to be viewed by the alignment system. (35. 36, 37). The invention further extends to a device manufacturing method and a device manufactured thereby. | ||||||
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