Maskless lithography for web based processing |
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| 申请号 | US15026810 | 申请日 | 2014-09-25 | 公开(公告)号 | US10073350B2 | 公开(公告)日 | 2018-09-11 |
| 申请人 | Applied Materials, Inc.; | 发明人 | Christopher Dennis Bencher; | ||||
| 摘要 | The present disclosure generally relates to a method and apparatus for processing a web-based substrate. As the substrate travels between rollers, the substrate may be stretched and thus distorted. Once the substrate reaches the roller, the substrate distortion is fixed. By adjusting the processing parameters, the distorted substrate is processed without correcting the distortion. | ||||||
| 权利要求 | |||||||
| 说明书全文 | |||||||
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