Infrared radiator

申请号 JP10162780 申请日 1980-07-23 公开(公告)号 JPS5726168A 公开(公告)日 1982-02-12
申请人 Matsushita Electric Ind Co Ltd; 发明人 NISHINO ATSUSHI; IKEDA MASAKI; SUZUKI TADASHI;
摘要 PURPOSE:To obtain an infrared radiator having a superior infrared radiation rate, a long corrosion resistant life and superior stability by forming an infrared radiating material on an enamelted and worked substrate having unevenness on the surface by spraying. CONSTITUTION:An enameled and worked substrate having unevenness on the surface in the form of arranged plates, a lath wire net, a coil or the like is prepared. The surface roughness of the enamel layer is regulated to >=1mum average roughness Ra on the surface central line. On the surface of the substrate an infrared radiating material is formed by plasma spraying to manufacture an infrared radiator. As the infrared radiating material >=1 kinds of metallic oxides of Al, Ti, Si, Zr, Mg, Ca, Ni, Co, etc., composite oxide, carbide or nitride thereof, graphite or eckel corrad graphite is used.
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