序号 专利名 申请号 申请日 公开(公告)号 公开(公告)日 发明人
21 CONTAMINATION PREVENTION AGENT COMPOSITION EP11818906.7 2011-06-10 EP2557226B1 2015-03-25 SEKIYA, Hiroshi; SAWADA, Hiraku
22 Verfahren zum Entfernen von Klebemitteln von einer Oberfläche eines Fahrzeugkarrosseriebauteils EP00102189.8 2000-02-09 EP1029602B1 2003-05-07 Krumrey, Dieter; Parr, Michael; Müller-Rogait, Jochen
23 CLEANING OF A SURFACE IN A PRINTING DEVICE EP15899861.7 2015-07-29 EP3325173A1 2018-05-30 LU, Kai-Kong; FEYGELMAN, Alex; ARENSON, Mordechai; LEVINTANT, Oran; MAMAN, Roy; PETACHIA HALELY, Shunit; RAHAMIM, Shai
The present disclosure relates to cleaning a surface in a printing device, wherein a steam guiding member directs a steam flow towards the surface; wherein the steam flow interacts with a substance on said surface to clean a portion of the surface.
24 DEVICE FOR CLEANING ROLLERS EP14845714 2014-09-22 EP3050642A4 2016-10-12 FUENTES HERAS ÁNGEL; MORENO GARCÍA GASPAR
25 CONTAMINATION PREVENTION AGENT COMPOSITION EP11818906.7 2011-06-10 EP2557226A1 2013-02-13 SEKIYA, Hiroshi; SAWADA, Hiraku

[Object] To provide an anti-soiling agent compound that can sufficiently prevents adhesion of pitch to a dry part region.

[Solution] The present invention provides an anti-soiling agent composition for preventing pitch contamination in a dry part of a paper-making process, and the composition has a polysiloxane compound represented by the following formula (1), wherein the number of amino-modified groups per molecule of the polysiloxane compound is in a range from 0.5 to 5.

[wherein, a substituent R1 represents a methyl group or an amino-modified group represented by the following formula (2), and the number n of repeating siloxane units represents an integer in a range from 50 to 1000, and

wherein, each of a substituent R2 and a substituent R3 independently represents an alkylene group having carbon atoms of 1 to 6, and the number m of repeating amino-alkylene units represents an integer in a range from 0 to 2].

26 VERFAHREN ZUM ENTFERNEN VON ÜBERSCHÜSSIGEM KLEBSTOFF EP10795321.8 2010-12-15 EP2512697A1 2012-10-24 STRAUSS, Kurt; SCHWEINFURTH, Michael; MÜLLER, Martin; WANNER, Reiner
The invention relates to a method for removing excess adhesive upon bonding two components (10, 12), in particular an inner part and an outer part of a door, flap or the like for a motor vehicle, wherein an adhesive (18) is applied to a bonding region (14) of at least one of the components (10, 12) and the components (10, 12) are bonded in the bonding region (14), wherein excess adhesive (24) is removed by means of a suction device (30, 32) after bonding.
27 Verfahren zum Entfernen von Klebemitteln von einer Oberfläche eines Fahrzeugskarrosseriebauteils EP00102189.8 2000-02-09 EP1029602A3 2000-11-08 Krumrey, Dieter; Parr, Michael; Müller-Regait, Jochen

Die Erfindung betrifft ein Verfahren zum Entfernen von Klebemitteln (20) von einer Oberfläche eines Fahrzeugkarosseriebauteils im Bereich eines Falzflansches (34), wobei der Falzflansch (34) durch ein ein Innenblech (24) umfassendes Außenblech (10) gebildet wird, zwischen denen eine Schicht des Klebemittels (20) aufgebracht ist, und der zu bearbeitende Bereich auf dem Innenblech (24) oberhalb des Falzflansches liegt, wobei das Klebemittel (20) in dem zu bearbeitenden Bereich durch einen Laser (36) verdampft wird.

28 Device, system and method for automated detaching of an adhesive element from a carrier element US15895195 2018-02-13 US20180339666A1 2018-11-29 Wolf-Peter Sander
A device for the automated removal of an adhesive element from a support element extending along a main extension plane, including a deposition device to deposit the support element and a fixing device to fix the support element to the deposition device, wherein the fixing device and/or the deposition device are configured such that the fixed support element, at least in certain areas, especially in an area with one or more adhesive elements, is stretchable spaced apart from the deposition device along the main extension plane.
29 Heating Systems for Film Growth Inhibition for Cold Flow US15953893 2018-04-16 US20180328541A1 2018-11-15 Jason W. Lachance; Larry D. Talley; Charles J. Mart
A method of transporting a mixed phase fluid in a conduit. A hydrate and/or wax film is permitted to deposit on an inner wall of the conduit in a conversion zone, the conversion zone being less than a length of the conduit. A quantity of heat is applied to the conduit in the conversion zone until the hydrate and/or wax deposited on the inner wall in the conversion zone separates therefrom, thereby inhibiting the continual formation of hydrates and/or wax on the inner wall. The separated hydrates and/or wax are flowed in the mixed phase fluid.
30 Compositions for Engine Carbon Removal and Methods and Apparatus for Removing Carbon US15619223 2017-06-09 US20180238230A1 2018-08-23 Bernie C. Thompson; Steven G. Thoma
This invention relates to cleaning the induction systems, the combustion chambers and exhaust systems of internal combustion engines. And, more particularly, to chemicals and mixtures of chemicals for removing the different types of carbon deposits encountered in internal combustion engines used in “road vehicles”. Carbon deposits were taken from the induction systems of these road vehicles for the purpose of bench testing such carbon and product development. More specifically, chemicals (i.e., solvents) and chemical mixes (i.e., solutions) have been accurately tested on such harvested carbon deposits for their ability to remove the various types of carbon deposits that accumulate within road vehicle internal combustion engines. Additionally this invention also relates to apparatus for delivering chemicals and chemical mixes. Which includes those developed by applicant, as well as those prior art products marketed for carbon removal, to the induction system of vehicles to maximize the effectiveness of the chemical delivery.
31 Self-locking mechanism and photovoltaic panel cleaning equipment having same US15444347 2017-02-28 US10008976B2 2018-06-26 Guanyu Wang; Jinggong Zhang; Zhihong Qian
A self-locking mechanism which is mounted in a moving mechanism of a photovoltaic panel cleaning equipment is disclosed. The moving mechanism includes driving wheels driven by driving motors, and the driving wheels being diagonally and detachably mounted. The self-locking mechanism includes self-locking units arranged between the driving motor and the driving wheel of the moving mechanism, and is used for realizing self-locking of the respective driving wheel. By adopting the self-locking mechanism and the photovoltaic panel cleaning equipment having the self-locking mechanism, when the body of the photovoltaic panel cleaning equipment stops on the photovoltaic panel with a gradient, the body can be prevented from falling off due to the effect of gravity.
32 Obstacle crossing mechanism and photovoltaic panel cleaning equipment having same US15449999 2017-03-05 US09831823B1 2017-11-28 Guanyu Wang; Jinggong Zhang; Zhihong Qian
An obstacle crossing mechanism, adapted and arranged on a cleaning rack of a photovoltaic panel cleaning equipment configured to clean photovoltaic panel arrays is disclosed. The cleaning rack includes connecting rods detachably-connected, and fixed rods arranged on respective connecting rods. The obstacle crossing mechanism includes a moving rack and a fixed rack, in which moving rack is used for temporarily stopping photovoltaic panel cleaning equipment; and the fixed rack is located below the moving rack and the moving rack ascends or descends on the fixed rack. A telescopic mechanism is further provided with the obstacle crossing mechanism so that the two mechanisms together facilitates the photovoltaic panel cleaning equipment to travel from a photovoltaic panel array to reach another photovoltaic panel array during cleaning process of photovoltaic panels without requiring any human assistance, thus achieve total automation.
33 Correction mechanism and photovoltaic panel cleaning equipment having same US15445920 2017-02-28 US09831821B1 2017-11-28 Guanyu Wang; Jinggong Zhang; Zhihong Qian
A correction mechanism, mounted on a cleaning rack of a photovoltaic panel cleaning equipment, for cleaning photovoltaic panels is disclosed. Cleaning rack includes four connecting rods which are detachably connected; the correction mechanism includes a first correction guide wheel and a second correction guide wheel, the first correction guide wheel and second correction guide wheel are both detachably mounted on the third connecting rod, and when the cleaning rack stably moves on photovoltaic panel, the first correction guide wheel and the second correction guide wheel are not in contact with side surfaces of lower edges of the photovoltaic panel. By adopting the correction mechanism and the photovoltaic panel cleaning equipment having the correction mechanism provided by the present invention, the body of the photovoltaic panel cleaning equipment can be enabled to stably move on the photovoltaic panels when the photovoltaic panels are inclined, thus preventing shaking from occurring.
34 ANTI-FALLING MECHANISM AND PHOTOVOLTAIC PANEL CLEANING EQUIPMENT HAVING SAME US15445994 2017-03-01 US20170326390A1 2017-11-16 Guanyu Wang; Jinggong Zhang; Zhihong Qian
An anti-falling mechanism, configured and adapted on a photovoltaic panel cleaning equipment for cleaning photovoltaic panels, is provided. The photovoltaic panel cleaning equipment includes a body and a cleaning rack, in which the anti-falling mechanism is being mounted on. The cleaning rack includes several connecting rods which are detachably connected. The anti-falling mechanism includes a first hook and a second hook, each of the first hook and the second hook comprises a fixed part and an anti-falling part, the fixed part is fixedly connected with the anti-falling part and the fixed part is detachably mounted on the first connecting rod. By adopting the anti-falling mechanism, the body of the photovoltaic panel cleaning equipment can be prevented from falling off from the photovoltaic panels during cleaning process of the photovoltaic panels.
35 PHOTOMASK CLEANING APPARATUS, METHOD OF CLEANING A PHOTOMASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE US15210872 2016-07-14 US20170059984A1 2017-03-02 Jin-su KIM; Jae-hyuck CHOI; Byung-gook KIM; Soo-wan KOH
Disclosed is a method. The method includes placing a photomask on a receiver of a cleaning apparatus, removing adhesive residue from the photomask by irradiating laser on the adhesive residue, attaching a pellicle to the photomask, and exposing a semiconductor substrate to a light using the photomask, wherein the irradiating laser repeatedly pauses and restarts during the removing of the adhesive residue.
36 Anti-soiling agent composition US13497577 2011-06-10 US09005394B2 2015-04-14 Hiroshi Sekiya; Hiraku Sawada
[Object] To provide an anti-soiling agent compound that can sufficiently prevents adhesion of pitch to a dry part region.[Solution] The present invention provides an anti-soiling agent composition for preventing pitch contamination in a dry part of a paper-making process, and the composition has a polysiloxane compound represented by the following formula (1), wherein the number of amino-modified groups per molecule of the polysiloxane compound is in a range from 0.5 to 5.[wherein, a substituent R1 represents a methyl group or an amino-modified group represented by the following formula (2), and the number n of repeating siloxane units represents an integer in a range from 50 to 1000, andwherein, each of a substituent R2 and a substituent R3 independently represents an alkylene group having carbon atoms of 1 to 6, and the number m of repeating amino-alkylene units represents an integer in a range from 0 to 2].
37 Method and system for removal of contaminates from phaseshift photomasks US11945658 2007-11-27 US08627836B2 2014-01-14 Shad Hedges; James Baugh
A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
38 Method and system for removal of contaminates from phaseshift photomasks US11368895 2006-03-06 US20060144425A1 2006-07-06 Shad Hedges; James Baugh
A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected from solvents used in a cleaning process. With the reticle secured to the spin chuck, the spin chuck is rotated under a pressurized spray of solvent. The solvent, which is caustic to the photomasks, removes the contaminants from the adhesive ring. After the exposed areas are cleaned, the cover is removed and foreign material from photomasks are removed using less invasive solvents and methods.
39 Method and apparatus for producing a multilayer storage media US11128891 2005-05-13 US20050269028A1 2005-12-08 Thomas Eisenhammer; Bernd Heinz; Roger Loow; Cem Yavaser
A method and device for manufacturing a disc-shaped workpiece comprises the steps of producing a first and second disc-shaped substrate, applying an adhesive on at least one of the flat sides of said first and second substrates, bonding said substrates to form said disc-shaped workpiece and removing an excess of adhesive at the outer rim of the disc shaped workpiece by means of a liquid while rotating the workpiece on a rotating table. The liquid is being dispensed by a supply system comprising one or severeal nozzles, used liquid is collected by a suction device.
40 Cleaning system, device and method US09624750 2000-07-24 US06777966B1 2004-08-17 Alan E. Humphrey; Billie Jean Freeze
The cleaning device may clean probe elements. The probe elements may be the probe elements of a probe card testing apparatus for testing semiconductor wafers or semiconductor dies on a semiconductor wafer or the probe elements of a handling/testing apparatus for testing the leads of a packaged integrated circuit. During the cleaning of the probe elements, the probe card or the handler/tester is cleaned during the normal operation of the testing machine without removing the probe card from the prober. The cleaning device may be placed within the prober or tester/handler similar to a wafer containing semiconductor dies to be tested so that the probe elements of the testing machine contact the cleaning medium periodically to remove debris and/or reshape the tips of the probe elements. The cleaning device may include a substrate, that may be shaped and sized like a typical semiconductor wafer that typically fits into the testing machine, and a pad attached to the upper surface of the substrate that cleans and/or reshapes the probe element tips without removing the testing head with the probe elements from the testing machine. The cleaning medium may chemically clean the probe elements and trap the environmentally hazardous material within and on the pad.
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