子分类：
| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 101 | Apparatus for decomposing halogenated aliphatic hydrocarbon compounds or aromatic compounds | US10454670 | 2003-06-05 | US06716399B2 | 2004-04-06 | Kinya Kato; Etsuko Sugawa |
| An apparatus for decomposing a target substance, which is a halogenated aliphatic hydrocarbon compound or a halogenated aromatic compound. This apparatus has a water tank for holding water containing chlorine and for contacting the target substance with the chlorine, a means for feeding the target substance to the water, a light source for irradiating the water containing the supplied target substance with light at a wavelength of 300 nm to 500 nm, and a means for reducing a chlorine concentration of a wastewater discharged from the water tank by contacting the wastewater with air. | ||||||
| 102 | Apparatus for decomposing halogenated aliphatic hydrocarbon compounds or aromatic compounds | US10454670 | 2003-06-05 | US20030196886A1 | 2003-10-23 | Kinya Kato; Etsuko Sugawa |
| An apparatus for decomposing a target substance, which is a halogenated aliphatic hydrocarbon compound or a halogenated aromatic compound. This apparatus has a water tank for holding water containing chlorine and for contacting the target substance with the chlorine, a means for feeding the target substance to the water, a light source for irradiating the water containing the supplied target substance with light at a wavelength of 300 nm to 500 nm, and a means for reducing a chlorine concentration of a wastewater discharged from the water tank by contacting the wastewater with air. | ||||||
| 103 | Method for decomposing halogenated aliphatic hydrocarbon compounds or aromatic compounds, method for cleaning medium contaminated with at least one of these compounds, and apparatus for these | US09451443 | 1999-11-30 | US06610178B2 | 2003-08-26 | Kinya Kato; Etsuko Sugawa |
| A method for decomposing an organic compound by using functional water followed by neutralization of the wastewater not to affect the environment. | ||||||
| 104 | Process and apparatus for treating dioxins | US10310144 | 2002-12-05 | US20030136659A1 | 2003-07-24 | Sataro Yamaguchi; Yasuhiro Hasegawa |
| A process and apparatus assuring low costs and high efficiency in practicing refuse incineration. A applying electromagnetic wave of a frequency band resonant with rotation or vibration of a specific substance e.g., dioxins molecule, thereby to heat the dioxins molecule selectively up to high temperature to remove the dioxins molecule by decomposition. | ||||||
| 105 | Process and apparatus for treating dioxins | US09753713 | 2001-01-04 | US06503463B2 | 2003-01-07 | Sataro Yamaguchi; Yasuhiro Hasegawa |
| A process and apparatus assuring low costs and high efficiency in practicing refuse incineration. A applying electromagnetic wave of a frequency band resonant with rotation or vibration of a specific substance e.g., dioxins molecule, thereby to heat the dioxins molecule selectively up to high temperature to remove the dioxins molecule by decomposition. | ||||||
| 106 | Process and apparatus for treating dioxins | US09753713 | 2001-01-04 | US20010025782A1 | 2001-10-04 | Sataro Yamaguchi; Yasuhiro Hasegawa |
| A process and apparatus assuring low costs and high efficiency in practicing refuse incineration. A applying electromagnetic wave of a frequency band resonant with rotation or vibration of a specific substance e.g., dioxins molecule, thereby to heat the dioxins molecule selectively up to high temperature to remove the dioxins molecule by decomposition. | ||||||
| 107 | System for photopyrolitically removing a contaminant | US748185 | 1996-11-12 | US5751897A | 1998-05-12 | David C. Van Alstyne |
| A system for safely removing even a hazardous contaminant from a substrate surface includes a light energy source whose output is controlled to selectively provide components primarily in the visible and infrared spectrum, and a power unit for energizing the light energy source at a desired energy level, pulse width and pulse repetition rate. Proper selection of these parameters permits the energy source to heat the contaminant sufficiently to cause direct carbonization without entering a melt phase, without the need for any precoat medium. Because the resultant molecular decomposition of the contaminant occurs relatively faster than heat transfer to the underlying substrate, substantially no substrate heating results. The light source energy transforms the contaminant to an ash that is removed from the substrate by a vacuum system preferably surrounding the light source. The light source is preferably a xenon flash lamp operated with a pulse repetition rate of between about 0.1 pulses/second and 12 pulses/second, an energy pulse duration of about 400 .mu.s to about 800 .mu.s, and a peak energy per pulse exceeding about 3,750 joule. The system also provides a mechanism for selectively emphasizing either the visible light or the infrared light spectrum output from the light energy source, to further customize the energy output to the contaminant being removed. A robotic mechanism preferably moves the light energy source over the substrate in applications where a long dwell time is desired to vitrify a contaminant. | ||||||
| 108 | Method and apparatus for treating waste and for obtaining usable by-product | US237372 | 1994-05-03 | US5648592A | 1997-07-15 | Charles L. Pierce |
| The present invention is directed to the art of treating waste using laser technology. Industrial and toxic waste materials are irradiated with a laser inside a reactor chamber such that they are heated to high temperatures. Organic compounds are thermally destroyed and chemical bonds are broken. Cool oxygen is pumped into the reactor to provide a refractory protective shield. Silica is added into the vessel at the high temperatures and encapsulates any heavy metals into its crystal matrix. The resulting solidified product may have a hardness of at least 8 on the Knoops scale of hardness and may be used as tooling, road material, oven lining, building materials and the like. | ||||||
| 109 | Method of treating refractory activated carbon by exposure to ionizing radiation | US158816 | 1993-11-29 | US5414204A | 1995-05-09 | Masakazu Hosono; Hidehiko Arai; Teijiro Miyata |
| The improved method of treating activated carbon having an organochlorine compound adsorbed thereon which comprises adding water to said activated carbon and then exposing said activated carbon to ionizing radiation, thereby decomposing and rendering harmless the organochlorine compound adsorbed on the activated carbon is described. The method is capable of safe and efficient decomposition of the activated carbon that has been used in adsorption treatment of organochlorine compounds such as PCBs and trichloroethylene that have heretofore been difficult to treat. The activated carbon that has hitherto simply been accumulated to date after adsorbing organochlorine compounds can be effectively treated by the method at low cost. | ||||||
| 110 | Method of decontaminating a contaminated fluid by using photocatalytic particles | US944198 | 1992-10-09 | US5294315A | 1994-03-15 | Gerald Cooper; Matthew A. Ratcliff |
| A system for decontaminating the contaminated fluid by using photocatalytic particles. The system includes a reactor tank for holding the contaminated fluid and the photocatalytic particles suspended in the contaminated fluid to form a slurry. Light irradiates the surface of the slurry, thereby activating the photocatalytic properties of the particles. The system also includes stirring blades for continuously agitating the irradiated fluid surface and for maintaining the particles in a suspended state within the fluid. The system also includes a cross flow filter for segregating the fluid (after decomposition) from the semiconductor powder. The cross flow filter is occasionally back flushed to remove any semiconductor powder that might have caked on the filter. The semiconductor powder may be recirculated back to the tank for reuse, or may be stored for future use. A series of such systems may be used to gradually decompose a chemical in the fluid. Preferably, the fluid is pretreated to remove certain metal ions which interfere with the photocatalytic process. Such pretreatment may be accomplished by dispersing semiconductor particles within the fluid, which adsorb ions or photodeposit the metal as the free metal or its insoluble oxide or hydroxide, and then removing the semiconductor particles together with the adsorbed metal ions/oxides/hydroxide/free metal from the fluid. A method of decontaminating a contaminated fluid is also disclosed. | ||||||
| 111 | Tunable plasma method and apparatus using radio frequency heating and electron beam irradiation | US629424 | 1990-12-18 | US5256854A | 1993-10-26 | Leslie Bromberg; Daniel R. Cohn; William C. Guss; Barton G. Lane; Donna L. Smatlak |
| A method and apparatus for the pyrolytic destruction or synthesis of gases via a highly tunable combination of radio frequency heating and electron beam irradiation is disclosed. The method is appropriate for destroying toxic gases emanating from hazardous wastes and for synthesizing new molecules from the molecules of a gas. The method is also appropriate for creating scavenger gases and hot gases with large enthalpy for use in sterilization procedures, for example. Embodiments are disclosed employing inductive or direct waveguide/cavity coupling of radio frequency power to the gas. In embodiments of the invention, magnetic fields are used to modify the paths of the electrons in the beam to facilitate tuning and improve the energy efficiency of the system. In a two-stage system, solid and/or liquid wastes are first heated in order to vaporize the toxic materials. Then, the gases produced in the first stage are destroyed by the combination of radio frequency heating and electron beam irradiation of the invention. | ||||||
| 112 | Apparatus for photocatalytic treatment of liquids | US451375 | 1989-12-15 | US5174877A | 1992-12-29 | Gerald Cooper; Matthew A. Ratcliff |
| Apparatus for decontaminating a contaminated fluid by using photocatalytic particles. The apparatus includes a reactor tank for holding a slurry of the contaminated fluid and the photocatalytic particles ultraviolet light irradiates the surface of the slurry, thereby activating the photocatalytic properties of the particles. Stirring blades for continuously agitate the irradiated fluid surface maintaining the particles in a suspended state within the fluid. A cross flow filter is used for separating the fluid from the semiconductor powder after the decomposition reaction is ended. The cross flow filter is occasionally back flushed to remove any caked semiconductor powder. The semiconductor powder may be recirculated back to the tank for reuse, or may be stored for future use. A series of reactor tanks may be used to gradually decompose a chemical in the fluid. The fluid may be pretreated to remove certain metal ions which interfere with the photocatalytic process. Such pretreatment may be accomplished by dispersing semiconductor particles within the fluid, which particles adsorb ions or photodeposit the metal as the free metal or its insoluble oxide or hydroxide, and then removing the semiconductor particles together with the adsorbed metal ions/oxides/hydroxide/free metal from the fluid. | ||||||
| 113 | Fluid purification | US403943 | 1989-09-07 | US4966759A | 1990-10-30 | Michael K. Robertson; Robert B. Henderson |
| A purifier for water or air removes, reduces or detoxifies organic pollutants therefrom by causing the fluid to contact a matrix having surfaces with which a fixed anatase (TiO.sub.2) or other photoreactive metal semiconductor material is bonded, in the presence of light of a wavelength that will activate the material. | ||||||
| 114 | Photodecontamination of surfaces | US96064 | 1987-09-08 | US4867796A | 1989-09-19 | John Asmus; Keith Boyer |
| As a method of decontaminating a surface covered with a chemical contaminant, a light-absorption agent providing a relatively high neutral density is applied to the surface in intimate contact with the contaminant. Then one or more flashes of high intensity, broad-band frequency, incoherent light is applied to the surface, whereupon, the light-absorption agent converts the absorbed light energy to heat, resulting in vaporization and/or decomposition of the contaminant. The heat generated by the short duration flash is localized at the material on the surface and at a very thin surface layer, and vaporization of the surface material dissipates the heat that is generated, whereby, the surface is substantially unaffected by the process. | ||||||
| 115 | Laser photochemical decomposition of compounds containing R--O--P moiety (chemical agents) | US588489 | 1984-03-12 | US4529489A | 1985-07-16 | Joseph K. McDonald; James A. Merritt; Ann E. Stanley |
| A CW tunable laser is employed in a laser photochemical decomposition met to achieve decomposition of a compound of high toxicity to relatively non-toxic decomposition products.Organophosphorus chemical agents containing a characteristic C--O--P group are irradiated with a predetermined power level from about 10 to about 150 W/cm.sup.2 for a predetermined time period to effect cleavage of the C--O bond. The infrared laser excitation level of radiation in the range of 10.4 .mu.m or 9.4 .mu.m is resonant with the absorption band of the C--O--P group contained in the organophosphorus chemical agent. The absorbed radiation effects cleavage of the C--O bond and thereby achieves decomposition of the organophosphorus chemical agent.The disclosed method is highly selective for cleavage of the C--O bond rather then cleavage of the P--O bond, and in the presence of air, the method requires low power levels of the CO.sub.2 laser for rapid and complete dissociation of the organophosphorus chemical agent. | ||||||
| 116 | Method and apparatus for solar destruction of toxic and hazardous materials | US283642 | 1981-07-15 | US4432344A | 1984-02-21 | James E. Bennington; Gerald E. Bennington; Frederick E. Bernardin, Jr.; Donald J. Patterson; Walter J. Weber, Jr. |
| Toxic and hazardous organic materials are photochemically and thermally changed into innocuous and environmentally acceptable products through the proper application of solar energy. The present invention is especially well-suited for the destruction of polychlorinated biphenyls (PCB's) which are resistant to conventional incineration The method and apparatus described herein are also capable of handling liquids, solids or vapors, with only minor operating modifications. | ||||||
| 117 | フッ素系有機化合物の分解方法、及びフッ素系有機化合物の分解装置 | JP2014083193 | 2014-04-14 | JP6284188B2 | 2018-02-28 | 堀 久男; 加藤 昌明 |
| 118 | 還元性有機物を利用した光触媒 | JP2013176411 | 2013-08-28 | JP2015044154A | 2015-03-12 | MORIKAWA CLAUDIO KENJI; SHINOHARA MAKOTO |
| 【課題】有機物分解又は殺菌に利用可能であって、利用場面の限定を受けない安全性の高い光触媒であり、可視光を含む幅広い波長の光を吸収して活性を示す光触媒を、安価に提供することを目的とする。【解決手段】鉄還元能を有する還元性有機物と鉄供給原料とを、水存在下にて混合し、得られた反応生成物を活性成分としてなる光触媒、;詳しくは、前記光触媒であって、紫外線、可視光、又は赤外線に属する波長の光を照射したときに光触媒活性を発揮する光触媒、;前記光触媒と分解対象物を接触させ、紫外線、可視光、又は赤外線に属する波長の光を照射することを特徴とする有機物分解方法、;前記光触媒と殺菌対象物を接触させ、紫外線、可視光、又は赤外線に属する波長の光を照射することを特徴とする殺菌方法、;を提供する。【選択図】図1 | ||||||
| 119 | Method for detoxifying toxic compound | JP2007246470 | 2007-09-25 | JP2009072507A | 2009-04-09 | NAKAMURA KOICHIRO; HISHINUMA AKIMITSU |
| PROBLEM TO BE SOLVED: To provide a method for detoxifying a toxic compound, which is useful for efficiently detoxifying a toxic compound containing arsenic or the like. SOLUTION: The method for detoxifying a toxic compound is characterized in that a toxic compound containing at least one element selected from the group consisting of arsenic, antimony, and selenium is detoxified in the presence of a cobalt complexe by light irradiation and/or heating. In a preferable mode of the method for detoxifying a toxic compound, detoxification is performed by alkylating arsenic, antimony or selenium. COPYRIGHT: (C)2009,JPO&INPIT | ||||||
| 120 | Pollutant decomposition method and apparatus | JP2001185306 | 2001-06-19 | JP3825993B2 | 2006-09-27 | 欽也 加藤; 正浩 川口; 朗 栗山 |
QQ群二维码
意见反馈
意见反馈