1 |
放电等离子加工装置以及放电等离子加工品的制造方法 |
CN201380033580.8 |
2013-03-19 |
CN104396350A |
2015-03-04 |
八户启; 酒井道 |
放电等离子加工装置(101)具备:作为对被加工物(5)加压的加压部的冲头(2a、2b);作为用于对被加工物(5)施加脉冲电流的脉冲电流施加部的直流脉冲电流发生器(6);作为用于检测通过脉冲电流的施加而产生的等离子的光的光谱的检测部的分光器(10);和用于根据检测部的检测结果来控制脉冲电流的控制部(12)。 |
2 |
放电等离子加工装置以及放电等离子加工品的制造方法 |
CN201380033580.8 |
2013-03-19 |
CN104396350B |
2017-09-15 |
八户启; 酒井道 |
放电等离子加工装置(101)具备:作为对被加工物(5)加压的加压部的冲头(2a、2b);作为用于对被加工物(5)施加脉冲电流的脉冲电流施加部的直流脉冲电流发生器(6);作为用于检测通过脉冲电流的施加而产生的等离子的光的光谱的检测部的分光器(10);和用于根据检测部的检测结果来控制脉冲电流的控制部(12)。 |
3 |
HIGH FREQUENCY COMPACT LOW-ENERGY LINEAR ACCELERATOR DESIGN |
US15503895 |
2014-08-15 |
US20170238408A1 |
2017-08-17 |
Alessandra Lombardi; Maurizio Vretenar; Serge Mathot; Alexej Grudiev |
A compact radio-frequency quadrupole ‘RFQ’ accelerator for accelerating charged particles, the RFQ accelerator comprising: a bunching section configured to have a narrow radio-frequency ‘rf’ acceptance such that only a portion of a particle beam incident on the bunching section is captured, and wherein the bunching section bunches the portion of the particle beam; an accelerating section for accelerating the bunched portion of the particle beam to an output energy; and, a means for supplying radio-frequency power. |
4 |
High frequency compact low-energy linear accelerator design |
US15503895 |
2014-08-15 |
US10051721B2 |
2018-08-14 |
Alessandra Lombardi; Maurizio Vretenar; Serge Mathot; Alexej Grudiev |
A compact radio-frequency quadrupole ‘RFQ’ accelerator for accelerating charged particles, the RFQ accelerator comprising: a bunching section configured to have a narrow radio-frequency ‘rf’ acceptance such that only a portion of a particle beam incident on the bunching section is captured, and wherein the bunching section bunches the portion of the particle beam; an accelerating section for accelerating the bunched portion of the particle beam to an output energy; and, a means for supplying radio-frequency power. |
5 |
ELECTROMAGNETIC PULSE PROTECTION METHOD AND ELECTROMAGNETIC PULSE PROTECTION SYSTEM |
US15562642 |
2016-04-14 |
US20180092195A1 |
2018-03-29 |
Shingo NISHIKATA; Yoshikatsu KURODA; Hiroshi IKEBUCHI; Koichi HAMAMOTO; Tomoya MORIOKA; Atsushi OCHIAI |
An electromagnetic pulse protecting method includes: searching a threat 2 that generates an electromagnetic pulse 2a; and generating plasma 6 in a light-condensed point 4 by condensing a laser beam 5 on a light-condensed point 4 in response to detection of the threat 2. Thus, various protection objects which contain a protection object having an electric opening indispensably can be protected from an attack by the electromagnetic pulse. |
6 |
DISCHARGE PLASMA MACHINING DEVICE AND METHOD FOR MANUFACTURING DISCHARGE PLASMA MACHINED PRODUCT |
US14596517 |
2015-01-14 |
US20150145173A1 |
2015-05-28 |
Satoru Hachinohe; Osamu Sakai |
A discharge plasma machining device that includes punches as a pressing unit for applying a pressure with respect to a machined item, a direct current pulse current generator as a pulse current applying unit for applying a pulse current with respect to the machined item, a spectroscope as a detection unit for detecting a spectrum of light of plasma generated by application of a pulse current, and a control unit for controlling a pulse current in accordance with a detection result of the detection unit. |
7 |
放電プラズマ加工装置および放電プラズマ加工品の製造方法 |
JP2014528012 |
2013-03-19 |
JPWO2014020935A1 |
2016-07-21 |
啓 八戸; 道 酒井 |
放電プラズマ加工装置(101)は、被加工物(5)を加圧する加圧部としてのパンチ(2a,2b)と、被加工物(5)にパルス電流を印加するためのパルス電流印加部としての直流パルス電流発生器(6)と、パルス電流の印加によって発生するプラズマの光のスペクトルを検出するための検出部としての分光器(10)と、検出部の検出結果によってパルス電流を制御するための制御部(12)とを備える。 |
8 |
電磁パルス防護方法及び電磁パルス防護システム |
JP2015131626 |
2015-06-30 |
JP6376408B2 |
2018-08-22 |
西方 伸吾; 黒田 能克; 池淵 博; 濱本 浩一; 森岡 朋也; 落合 敦司 |
|
9 |
ELECTROMAGNETIC PULSE PROTECTION METHOD AND ELECTROMAGNETIC PULSE PROTECTION SYSTEM |
EP16817538 |
2016-04-14 |
EP3267142A4 |
2018-04-11 |
NISHIKATA SHINGO; KURODA YOSHIKATSU; IKEBUCHI HIROSHI; HAMAMOTO KOICHI; MORIOKA TOMOYA; OCHIAI ATSUSHI |
An electromagnetic pulse protection method comprising: a search step in which searches are conducted for threats 2 that generate an electromagnetic pulse 2a; and a generation step in which laser light 5 is focused on a focal point 4 and plasma 6 is generated at the focal point 4, if a threat 2 is found in the search step. As a result, a variety of objects to be protected, including objects to be protected for which electrical openings are indispensable can be protected from electromagnetic pulse attacks. |