| 序号 | 专利名 | 申请号 | 申请日 | 公开（公告）号 | 公开（公告）日 | 发明人 |
|---|---|---|---|---|---|---|
| 41 | 予め位置合わせされたノズル/スキマー | JP2010077765 | 2010-03-30 | JP5713576B2 | 2015-05-07 | ロバート ケイ ベッカー; アヴラム フレイトシス |
| 42 | Ion recovery apparatus and method in Euv light generating apparatus | JP2008106907 | 2008-04-16 | JP5246916B2 | 2013-07-24 | 能史 植野; 理 若林; 保 阿部; 明 住谷; 秀往 星野; 彰 遠藤; ゲオルグ スマン |
| An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions. | ||||||
| 43 | Particle beam irradiation apparatus and particle beam therapy system | JP2010284520 | 2010-12-21 | JP2011224342A | 2011-11-10 | IWATA TAKAAKI |
| PROBLEM TO BE SOLVED: To solve problems of excess irradiation in IMRT by a particle beam therapy system, because when IMRT technology for a radiation therapy system utilizing an X-ray or the like is applied as it is to the particle beam therapy system having a conventional wobbler system, there is posed a problem that it is required to utilize two or more boluses, and more specifically, to solve the problems of excess irradiation in IMRT by the particle beam therapy system by raising irradiation flexibility in a depth direction without utilizing the boluses.SOLUTION: There is provided a particle beam irradiation apparatus 58 having a scanning irradiation system 34 that performs scanning with a charged particle beam 1 accelerated by an accelerator and being mounted in a rotating gantry for rotating an irradiation direction of the charged particle beam 1. The particle beam irradiation apparatus 58 comprises a columnar-irradiation-field generation apparatus 4 that generates a columnar irradiation field by enlarging a Bragg peak of the charged particle beam 1. | ||||||
| 44 | Pre-aligned nozzle/skimmer | JP2010077765 | 2010-03-30 | JP2010245043A | 2010-10-28 | BECKER ROBERT K; FREYTSIS AVRUM |
| <P>PROBLEM TO BE SOLVED: To provide a method and a device for improving beam stability in a high-current GCIB sample processing system. <P>SOLUTION: A pre-aligned nozzle/skimmer module (20) includes an internal pre-aligned nozzle assembly (30) and an internal pre-aligned skimmer cartridge assembly (35) to more accurately control the formation of the Gas Cluster Ion Beam (GCIB). The nozzle/skimmer module (20) can be pre-aligned to more accurately position the GCIB. The pre-aligned nozzle/skimmer module (20) more accurately controls the formation of the gas clusters of a pre-aligned GCIB (263). <P>COPYRIGHT: (C)2011,JPO&INPIT | ||||||
| 45 | Charged particle beam drawing apparatus, and method of manufacturing apparatus | JP2009262074 | 2009-11-17 | JP2010183062A | 2010-08-19 | SETO ISAMU; SUZAKI YOSHIO; KUWABARA MASAMICHI |
| <P>PROBLEM TO BE SOLVED: To provide a charged particle beam drawing apparatus forming a desired pattern while suppressing degradation of throughput even when an element such as a deflector has a defect. <P>SOLUTION: This charged particle beam drawing apparatus includes: an aperture array configured to form a plurality of charged particle beams using a plurality of openings; an element array including a plurality of main elements and a plurality of auxiliary elements different from the main elements; and a control part configured to obtain information associated with a defect of the plurality of main elements and control the element array based on the information. The control part controls the element array such that only the main elements are used when there is no defect, while, when there is a defect, the auxiliary element is used without using the main element having the defect. <P>COPYRIGHT: (C)2010,JPO&INPIT | ||||||
| 46 | METHOD OF MODULATING PROTONS FOR RADIATION THERAPY | PCT/US2004040724 | 2004-12-02 | WO2005057738A3 | 2006-12-14 | MA CHANG-MING; FOURKAL EUGENE S |
| Methods of optimizing a laser-accelerated proton radiation dose to a targeted region are disclosed. Disclosed methods include providing a plurality of modulated polyenergetic proton beamlets and irradiating the targeted region with the plurality of modulated beamlets. | ||||||
| 47 | CHANNEL CELL SYSTEM | PCT/US2008064149 | 2008-05-19 | WO2009023338A3 | 2009-04-30 | MCBRIDE STERLING EDUARDO; LIPP STEVEN ALAN; MICHALCHUK JOEY JOHN; ANDERSON DANA Z; SALIM EVAN; SQUIRES MATTHEW |
| A cold-atom system has multiple vacuum chambers. One vacuum chamber includes an atom source. A fluidic connection is provided between that vacuum chamber and another vacuum chamber. The fluidic connection includes a microchannel formed as a groove in a substantially flat surface and covered by a layer of material. | ||||||
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