Fungicidal composition having residual effect
专利汇可以提供Fungicidal composition having residual effect专利检索，专利查询，专利分析的服务。并且PURPOSE: A fungicidal composition having residual effect capable of controlling the volatilization and scattering of an active ingredient, showing residual effect quickly for a long time, obtained by blending a specific fungicidal compound having relatively high vapor pressure at room temperature at the active ingredient with a coumarone-indene resin.
CONSTITUTION: A fungicidal compound such as compunds shown by the formula III, formula IV, formula V, etc. shown by the formula I (A is O, S, -CH
2 -, -CH
2 CH
2 -, -CH=CH-, or group shown by the formula II; X is O or S; R
1 is CH
3 , F, Cl, or Br; R
2 is CH
3 ; or R
1 and R
2 form ethylene or trimethylene) having a relatively high vapor pressure of 1×10
-3 W1×10
-5 mmHg (25°C) as an active ingredient is blended with a coumarone-indene resin having compatibility with it in an amount to give ≥0.1 as much as the active ingredient, properly 1W40 times as much as the active ingredient with respect to biological effect and economic efficiency. The mixture is blended with a carrier, auxiliary, etc., manufactured into a preparation, and can be applied to plants to control pathogenic fungi.
COPYRIGHT: (C)1983,JPO&Japio，下面是Fungicidal composition having residual effect专利的具体信息内容。
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