METHOD FOR CONVERTING FEATURES IN AN INTEGRATED CIRCUIT DESIGN AND APPARATUS FOR DOING THE SAME
专利汇可以提供METHOD FOR CONVERTING FEATURES IN AN INTEGRATED CIRCUIT DESIGN AND APPARATUS FOR DOING THE SAME专利检索，专利查询，专利分析的服务。并且A method for converting physical features of an integrated circuit design to a uniform micron technology is provided. The integrated circuit design is defined by a plurality of cells with each cell being defined by one or more micron technologies. A user is prompted to provide key design rules that define desired features associated with one or more micron technologies. The method includes examining a layout database for the integrated circuit design with the layout database having a hierarchical structure. A top cell is identified from the layout database of the integrated circuit design. The method then descends through a first branch of the hierarchical structure of the layout database to a lowest cell in the first branch. Afterwards, a determination is made whether or not physical data of the user desired features have been previously processed for the lowest cell. Once that determination is made, the method decides if the physical data of the user desired features for the lowest cell complies with the uniform micron technology. If the features do not comply with the uniform technology, the physical data of the user desired features of the lowest cell is processed. A design rule check is also performed once the conversion is complete for all branches of the top cell to ensure that the processed physical data of the user selected features comply with the design rules chosen by the user. In addition, once one subcell is processed, all other instances of that subcell are also instantly considered processed. Therefore, the method will skip those subcells and only process non-processed subcells. The layout data of the IC design can now be converted into reticles for IC fabrication.，下面是METHOD FOR CONVERTING FEATURES IN AN INTEGRATED CIRCUIT DESIGN AND APPARATUS FOR DOING THE SAME专利的具体信息内容。
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