Rotatable coating method and device therefor
专利汇可以提供Rotatable coating method and device therefor专利检索，专利查询，专利分析的服务。并且PURPOSE:To enable uniform coating of a photoresist including no foreign material in resin by directing downwardly the surface to be coated of a semiconductor substrate, bringing the substrate into contact with the resin liquid surface within a container to which supersonic vibration is applied, isolating both and rotating the substrate. CONSTITUTION:The semiconductor substrate 21 is so set at a wafer chuck 23 connected to a motor 24 that the surface to be coated becomes downside, the chuck is lowered, and is brought more than once into contact with the liquid surface 28 of the photoresist liquid 25 being uneven by a supersonic vibration generator 27 mounted on the lower surface of the tank 26. Subsequently, the substrate 21 is isolated from the photoresist 25, the motor 24 is rotated, and a photoresist film is coated thereon. Since foreign material adhered onto the wafer can be thus removed and the liquid is sufficiently filled via the uneven surface of the liquid even in the recess on the surface of the wafer, the photoresist can be uniformly coated thereon.，下面是Rotatable coating method and device therefor专利的具体信息内容。
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