Follow-up focusing device
专利汇可以提供Follow-up focusing device专利检索，专利查询，专利分析的服务。并且PURPOSE: To enhance the positioning accuracy of the photo mask and wafer disposed in an exposure device by providing the follow-up focusing device which is capable of automatically moving the objective lens in follow-up to the movement of the wafer in the positioning of the semiconductor wafer and photo mask.
CONSTITUTION: The focus of an objective lens 8 is beforehand set at the pattern forming surface S of a photo mask 1 and a wafer 2 is contacted to the photo mask 1 by raising a chuck cylinder 4 by increasing pressure p. With this as a reference position, it is beforehand stored in a contact position memory circuit 19. After this, the vertical movement quantity of the wafer 2 for the purpose of positioning is detected by a movement, signal converting means by way of a displacement meter probe 7 and a displacement meter circuit 16 and is converted to an electric signal which is then inputted from a pulse motor driving circuit 21 to a pulse motor 14, causing the objective lens 8 to move in follow-up to the wafer 2. Hence, the focus of the objective lens 8 is matched always to the wafer 2 and the positioning accuracy of the photo mask 1 and wafer 2 is improved.
COPYRIGHT: (C)1980,JPO&Japio，下面是Follow-up focusing device专利的具体信息内容。
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