首页 / 专利库 / 电子零件及设备 / 晶片卡盘 / Manufacture of surface-wave filter element

Manufacture of surface-wave filter element

阅读:447发布:2023-04-05

专利汇可以提供Manufacture of surface-wave filter element专利检索,专利查询,专利分析的服务。并且PURPOSE:To increase greatly the formation precision of a transducer, upon which curvature of a wafer due to the roughening of the reverse depends, by roughening the reverse after forming the transducer on the top of the piezoelectric wafer. CONSTITUTION:On previously mirror-finished surface 2 of wafer 1, a transducer is formed. With reverse 3 outside, wafer 1 is equipped to chuck board 11 by rubber chuck 12 and rubber chuck holder 13 and corpuscles are jetted to the reverse surface 3 by nozzle 14 for fine-surface work. Consequently, since a wafer whose reverse surface has not been roughened has a little curvature, wafer cracking lessenes in a photoetching process and at the same time, photoetching precision is improved, so that characteristics and yield of a surface-wave filter can both be improved.,下面是Manufacture of surface-wave filter element专利的具体信息内容。

高效检索全球专利

专利汇是专利免费检索,专利查询,专利分析-国家发明专利查询检索分析平台,是提供专利分析,专利查询,专利检索等数据服务功能的知识产权数据服务商。

我们的产品包含105个国家的1.26亿组数据,免费查、免费专利分析。

申请试用

分析报告

专利汇分析报告产品可以对行业情报数据进行梳理分析,涉及维度包括行业专利基本状况分析、地域分析、技术分析、发明人分析、申请人分析、专利权人分析、失效分析、核心专利分析、法律分析、研发重点分析、企业专利处境分析、技术处境分析、专利寿命分析、企业定位分析、引证分析等超过60个分析角度,系统通过AI智能系统对图表进行解读,只需1分钟,一键生成行业专利分析报告。

申请试用

QQ群二维码
意见反馈