Quartz crystal resonator and a method for fabrication thereof
阅读：1000发布：2021-03-26
专利汇可以提供Quartz crystal resonator and a method for fabrication thereof专利检索，专利查询，专利分析的服务。并且A quartz crystal resonator resonating in a thickness shear mode of vibration at an increased frequency is disclosed, the resonator including a quartz crystal plate which is formed with recesses on both sides thereof for receiving therein central and lead electrodes so that the spurious response of the plate can be suppressed.，下面是Quartz crystal resonator and a method for fabrication thereof专利的具体信息内容。
1. A quartz crystal resonator comprising, in combination, a quartz crystal plate having a density Rho 1 and a thickness t1, said quartz crystal plate having a first major surface formed with a recess of depth delta t, said first recess having a central portion and an elongated portion extending from said central portion and terminating at the perimeter of said first major surface, said quartz crystal plate further having a second major surface parallel to said first major surface and formed with a second recess having a depth substantially equal to the depth of said first recess, said second recess having a central portion in registry with said central portion of said first recess and an elongated portion extending from said central portions in a direction opposite to the direction of said elongated portion of said first recess, said second recess terminating at the perimeter of said second major surface; and first and second electrode layers respectively placed in said first and second recesses and having substantially the same thickness t2 and the same density Rho 2, said depth of said first and second recesses, said thickness of said electrode layers, and said densities satisfying the inequality: delta t> Rho 2/ Rho 1 t2.
2. A quartz crystal resonator a set forth in claim 1, wherein said electrode layers are conformingly received in said elongated portions of said first and second recesses.
3. A quartz crystal resonator as set forth in claim 1, wherein said first and second recesses are photo-etched recesses.
4. Method of manufacturing a quartz crystal resonator consisting of a quartz crystal plate formed with recesses and electrode layer s mounted in said recesses, comprising, in combination, the steps of first manufacturing a partially processed quartz crystal plate having a first and second major surface each having exposed portions of a determined shape for receiving said electrode layers and additional portions carrying a coating; immersing said partially processed quartz crystal plate in an etchant for etching Recesses of a predetermined depth in said exposed portions, said predetermined depths exceeding the product of the thickness of said electrode layers multiplied by the ratio of the density of said electrode layers to the density of said quartz crystal plate; removing said quartz crystal plate from said etchant and removing said coating from said additional portions; and mounting said electrode layers in said recesses.
5. Method as set forth in claim 4, wherein said step of first manufacturing a partially processed quartz crystal plate comprises the steps of preparing a quartz crystal plate having a cut angle providing a determined mode of vibration; coating opposite major surfaces of said quartz crystal plate with a photo-resist material, thereby creating coatings; masking predetermined portions of said coatings to create masked portions having said determined shape for receiving said electrode layers, and unmasked portions; irradiating said unmasked portions until said unmasked portions are cured; immersing said quartz crystal plate carrying said coatings in a selective solvent for dissolving uncured photo-resist material, thereby creating said exposed portions; and post-baking said quartz crystal plate having said exposed portions.
6. Method as set forth in claim 5, wherein said step of masking predetermined portions comprises the step of superposing a substantially transparent thin film carrying thereon an opaque pattern having said determined shapr for receiving said electrode layers upon at least one of said coatings; and wherein said step of irradiating said unmasked portions comprises the step of irradiating said coatings through said film.
7. Method as set forth in claim 5, wherein said determined mode of vibration is the thickness shear mode.
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