专利汇可以提供LOW TEMPERATURE SELF-ALIGNED COLLAR FORMATION专利检索,专利查询,专利分析的服务。并且A method for fabricating a semiconductor device, in accordance with the present invention, includes the steps of providing a semiconductor wafer having exposed p-doped silicon regions and placing the wafer in an electrochemical cell such that a solution including electrolytes interacts with the exposed p-doped silicon regions to form an oxide on the exposed p-doped silicon regions when a potential difference is provided between the wafer and the solution.,下面是LOW TEMPERATURE SELF-ALIGNED COLLAR FORMATION专利的具体信息内容。
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