Line tracing systems using laser energy for exposing photo-sensitive substrates专利检索-计算机集成制造制造过程专利检索查询-专利查询网

Line tracing systems using laser energy for exposing photo-sensitive substrates

阅读：519发布：2021-12-21

专利汇可以提供Line tracing systems using laser energy for exposing photo-sensitive substrates专利检索，专利查询，专利分析的服务。并且The invention relates to systems for automatically tracing onto a photo-sensitive substrate various patterns such as used in the manufacture of integrated circuits. The system according to the invention comprise means for displacing the substrate along two mutually perpendicular directions, means for controlling said displacements in relation to a program supplied from a computer and as a function of monitoring signals supplied from position detection means; the laser tracing beam is digitally deviated along a line parallel to one of said directions and under the control of the substrate motion along said other direction.，下面是Line tracing systems using laser energy for exposing photo-sensitive substrates专利的具体信息内容。

权利要求

1. Line tracing system using a beam of laser energy for exposing a photo-sensitive substrate comprising : a source of coherent radiant energy emitting said beam, supporting means for allowing displacements of said substrate in two mutually perpendicular directions, deflection control means having at least two control inputs, first and second motor means for respectively positioning said substrate along said directions, first and second monitoring means respectively evaluating the displacements of said substrate along said directions, and a digital optical positioned on the path of said beam between said source and said substrate ; said motor means being connected to and controlled by data derived from said deflection control means ; said digital optical deflector being connected to and controlled by data from said deflection control means ; said two control inputs being respectively controlled by data supplied from said first and second monitoring means ; said deflection control means including a computer comprising a binary counter having N outputs and a pulse counting input ; said digital optical deflector having N successive cells respectively controlled by said N outputs to provide 2N directions of deviation of said beam ; said directions of deviation lying within a plane intersecting the upper face of said substrate along a straight line of scan ; said pulse counting input being controlled by data supplied from said first monitoring means ; the displacement of said substrate along one of said directions of displacement being evaluated by said first monitoring means.

2. Line tracing system as claimed in claim 1, wherein said line of scan is at an angle with said other direction of displacement of said substrate.

3. Line tracing system as claimed in claim 2, wherein said beam exposes a substantially square area of said upper face, the width of said area being substantially 2N times smaller than the length of said line of scan ; the tangent of aid angle being substantially equal to 2 N.

4. Line tracing system as claimed in claim 3, wherein said first monitoring means compriSe interferometric measuring means for supplying a pulse to the input of said binary counter each time said substrate undergoes a displacement quantum 2N times smaller than the width of said area.

5. Line tracing system as claimed in claim 1, further comprising an optical projection device for projecting patterns ; said patterns being optically stored within said optical projection device.

6. Line tracing system as claimed in claim 5, wherein said optical projection device comprises : a flashlamp, a semireflective mirror positioned above said substrate, and projector means positioned for receiving the luminous energy supplied from said flash lamp, and projecting upon the upper face of said substrate images of said patterns.

7. Line tracing system as claimed in claim 6, wherein said projector means comprise beam splitting means, a plurality of optical storage elements carrying said patterns and positioned for receiving luminous energy from said beam splitting means, and lens means for forming onto said upper face an image of said patterns.

8. Line tracing system as claimed in claim 7, wherein said beam splitting means comprise a plurality of fixed semireflective mirrors ; said projection means further comprising shutter means positioned between said mirrors and said optical storage elements.

9. Line tracing system as claimed in claim 7, wherein said beam splitting means comprise a plurality of moving mirrors ; said projection means further comprising means for selectively positioning said moving mirrors on the path of the luminous beam emerging from said flashlamp.

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Line tracing systems using laser energy for exposing photo-sensitive substrates

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