Two-dimensional micropattern measuring apparatus
专利汇可以提供Two-dimensional micropattern measuring apparatus专利检索，专利查询，专利分析的服务。并且PURPOSE: To perform highly accurate measurement by detecting the edge voltage of a material to be measured based on the voltage values of first and second electric signals when the maximum and minimum differentiated strengths are obtained, and measuring the two-dimensional micropattern based on the edge voltage pattern.
CONSTITUTION: Laser light 100 from a laser light source 1 is deflected with an acoustooptic element 110 which is driven by the first electric signal from a two-dimensional scanning driver 3. The light is further deflected in the perpendicular direction with the direction of the first deflected light with a special prism 120 which is driven by the second electric signal from the driver 3. The light is projected on a material to be measured 4. The intensity of the reflected light from the material to be measured 4 is detected with a reflected light detecting part 5. The differentiated intensity pattern which is obtained by differentiating the reflected light intensity pattern is formed in a reflected-light-intensity-pattern forming part 6. The maximum and minimum differentiated intensities of the differentiated intensity pattern are detected in a differentiated-intensity-pattern forming part 7. The edge voltage of the material to be measured 4 is detected in an edge detecting part 8 based on the voltage values of the first and second electric signal when the maximum and minimum differentiated intensities are obtained. The two-dimensional micropattern of the material to be measured 4 is measured based on the edge voltage pattern in a micropattern judging part 9.
COPYRIGHT: (C)1990,JPO&Japio，下面是Two-dimensional micropattern measuring apparatus专利的具体信息内容。
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