Method and device for preparation of editing pattern figure
专利汇可以提供Method and device for preparation of editing pattern figure专利检索，专利查询，专利分析的服务。并且PURPOSE:To obtain an editing pattern figure, by forming on a reversal film a somewhat thick pattern figure being in a state that only a somewhat thick pattern part except an original pattern part has been exposed, and overprinting other pattern figure form placed on said figure. CONSTITUTION:A parts pattern figure 12 is placed on a reversal film 20, and the reversal film 20 is exposed as to only a part corresponding to a somewhat thick pattern which has increased the line width of the parts pattern by a prescribed extent. As a result, a somewhat thick pattern figure 21 whose constant width part only is exposed, leaving the parts pattern is prepared. Subsequently, a wiring pattern figure 11 is placed on the somewhat thick pattern figure 21 and the parts pattern figure 12, and is exposed. Since the somewhat thick pattern part against the parts pattern is exposed already, when the exposed somewhat thick pattern figure is developed, the exposed part becomes transparent, that is to say, white, and the unexposed part becomes black, therefore, a desired editing pattern figure, that is to say, a parts mounting wiring diagram 17 is obtained.，下面是Method and device for preparation of editing pattern figure专利的具体信息内容。
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10 三維疊印裝置
