Electron beam drawing method and device therefor
专利汇可以提供Electron beam drawing method and device therefor专利检索，专利查询，专利分析的服务。并且PURPOSE:To correct drawing pattern data as they are compressed without using a computer and to perform the electron beam drawing effectively, by using a proximity effect correcting circuit in combination with a hardware provided in the electron beam drawing device. CONSTITUTION:The drawing pattern data read in a disk 2 are temporarily stored in a buffer memory 3. Each proximity effect data area of the data thus stored is sent out to be developed to a shot data by a compressed data developing circuit 4, and delivered to a correcting system through a mode switching switch 5. The shot data is sent to a bit map memory 6 (11) which has been cleared to zero, where it is converted to a shot image 12 and recorded. Among the data written in the memory 6, only the data used actually are again developed by the developing circuit 4 to shot data 13 and the address of a proximity effect affecting range 14 is calculated by an irradiation quantity computing circuit 7 and sent to the memory 6. The memory 6 reads out these data successively in a work line unit 15 and convert them into bit number data. Simultaneously, the bit number data is multiplied by a proximity effect coefficient to obtain a quantity of proximity effect on the subject word line, and an appropriate irradiation is recorded in the disk 2. When all the necessary processing operation is finished, the switch 5 is changed over to the printing mode so that the pattern data in the memory 3 are developed by the developing circuit 4. The data are sent to a stage control system and electron beam deflecting system 9, and blanked by a blanking system 10 according to the data from the irradiation memory 8, so that the electron beam drawing is performed effectively.，下面是Electron beam drawing method and device therefor专利的具体信息内容。
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