Pattern forming method
专利汇可以提供Pattern forming method专利检索，专利查询，专利分析的服务。并且PURPOSE: To produce a micropattern by providing the positive resist layer composed of a kind of the bridging methacrylic resin and having the exposure and development after process under the temperature less than the bridging temperature to perform bridging.
CONSTITUTION: The equi-molar polymer of methyl methacrylate and methacryloyl chloride plus the equi-molar polymer of methyl methacrylate and methacrylic acid are dissolved into the Cellosolve acetate. And these polymers are mixed together in the same quantity and then coated to the oxide film on the subsrate to undergo a 15-minute process in N
2 and at 80°C to form the gel film. A high Sensitivity is obtained to the radiant rays since the polymer is not hardened. Then the electron beam is irradiated with the quantity of 1/10 conventional PMMA (poly methyl methacrylate). The substrate is then soaked three minutes into the water solution of ethyl alcohol and then dried to obtain a micropattern. Then the heat bridging is given after the 15-minute process at 180°C. The bridged and hardened resin features the 3-dimensional mesh structure, and the etching speed is reduced down 1/5 PMMA at the CF
4 plasma etching. Thus, a micropattern can be obtained with a high heat resistance.
COPYRIGHT: (C)1979,JPO&Japio，下面是Pattern forming method专利的具体信息内容。
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