Projection exposing device
专利汇可以提供Projection exposing device专利检索，专利查询，专利分析的服务。并且PURPOSE:To make a wafer surface coincide with a surface of a projection image-formation of a mask pattern, by securing the height of plural positions of the wafer surface by disposing a noncontacting displacement meter at the part positioning the wafer surface and controlling so that the approximate plain surface calculated by this data is made to coincide with the desired virtual-plain surface. CONSTITUTION:The height of plural positions on the surface of a wafer 1 placed on a table 13 is measured without contacting by making a reciprocal scanning on a noncontacting displacement meter 21. The table 13 on which the wafer 1 is placed, is provided on 3 layered electrostriction elements 20, and the elements 20 and the displacement meter 21 are interlocked by a controlling circuit of the table consisting of an A/D transducer 28, a computer 29, a D/A transducer 30 and an electrostriction element driver 31, and the degree of balance of the table 13 is adjusted. While, the extent of shift between the wafer surface and the surface of a projection image-formation of a mask pattern is detected optically and is fed back to the meter 21, and further the degree of balance of the table 13 is adjusted.，下面是Projection exposing device专利的具体信息内容。
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